Prosecution Insights
Last updated: April 19, 2026
Application No. 18/167,379

TOLERANCE COMPENSATION ELEMENT FOR CIRCUIT CONFIGURATIONS

Non-Final OA §103
Filed
Feb 10, 2023
Examiner
DINH, TUAN T
Art Unit
2848
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Siemens Aktiengesellschaft
OA Round
4 (Non-Final)
79%
Grant Probability
Favorable
4-5
OA Rounds
3y 0m
To Grant
99%
With Interview

Examiner Intelligence

Grants 79% — above average
79%
Career Allow Rate
916 granted / 1165 resolved
+10.6% vs TC avg
Strong +23% interview lift
Without
With
+23.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
41 currently pending
Career history
1206
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
43.4%
+3.4% vs TC avg
§102
45.0%
+5.0% vs TC avg
§112
6.6%
-33.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1165 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Note: It is possible to create an alloy of silver that can be used as a melting powder. For example, silver-tin alloy powder is used in soldering and brazing due to its low melting point and good solderability. a transient liquid bonding material can indeed be a melting powder. In transient liquid phase (CP) Bonding, a low-melting-point material (often a metal powder) is used as an interlayer. This powder melts during the bonding process, forming a liquid phase that reacts with the surrounding materials, creating a bond. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-2, and 7-15 is/are rejected under 35 U.S.C. 103 as being unpatentable over Gowda et al. (U.S. 2017/0207160) cited in the record in view of Nakano et al. (U.S. 2014/0193650), hereafter Nakano. As to claim 1, Gowda discloses a method for manufacturing a circuit configuration (40) as shown in figures 2-10, the method comprising: forming a substrate (100, para-0041); providing a circuit board (42, para-0033) on the substrate (100) such that a cavity (51, figure 2 or 108, figure 9) is formed between the circuit board (42) and the substrate (100), and a first gap (space in between the circuit board and substrate) is formed between the circuit board and the substrate; and closing the first gap via a first tolerance compensation element (92 or 98) by applying a sintered silver or metallic alloys (para-0039+) to at least one of the substrate or the circuit board. Gowda does not specifically disclose the first tolerance compensation element, which is a power, and melting the powder. Nakano teaches an electroconductive material (10) as shown in figures 1a-1c comprising a pair of electrodes (11a, 11b) having the first tolerance compensation (10 have elements 1 and 2) element, which is a power, and melting the powder. It would have been obvious to one having ordinary skill in the art before the effective filling date to have a teaching of Nakano employed in the method of Gowda in order to provide high strength, excellent electrical insulation, and highly reliable connections. As to claim 2, Gowda as modified by Nakano discloses the first tolerance compensation element is an additive manufacturing layer (84, figures 7-8). As to claim 7, Gowda as modified by Nakano further comprising: positioning a semiconductor component (68, 70) in the cavity (108). As to claim 8, Gowda as modified by Nakano discloses the forming the substrate includes forming a direct copper bonded substrate (100, para-0041). As to claim 9, Gowda as modified by Nakano discloses the circuit board (42) has an undersize (where the element 92 or 98 formed on) such that the first gap is a defined distance. As to claims 10-11, Gowda as modified by Nakano discloses the forming the substrate (DCB substrate 100) includes forming the substrate in a copper-aluminum-copper or a copper-ceramic- copper arrangement (the DCB consists of alumina or aluminum oxide). As to claim 12, Gowda as modified by Nakano discloses the first tolerance compensation element (92 or 98) includes a material or alloy that is wettable for solder materials, para-0039+. As to claim 13, Gowda as modified by Nakano discloses the undersize is configured such that a second gap (the gap where the element 64 formed on) is formed between the circuit board (42) and a semiconductor element (68 or 70) in the cavity (51 or 108). As to claim 14, Gowda as modified by Nakano further comprising closing the second gap via a second tolerance compensation element (64, figure 5). As to claim 15, Gowda as modified by Nakano further comprising: determining distance of the first gap for a pairing of the substrate (100) and the circuit board (42) via a closed control loop. Claim(s) 5-6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Gowda in view of Nakano, and further in view of Bruck et al. (U.S. 2015/0033561). Regarding claims 5-6, Gowda as modified by Nakano discloses all of the limitations of claimed invention except for the melting the powder includes melting the powder in a punctiform manner or via a laser beam. Bruck teaches a laser cladding particle injection process as shown in figure 3 comprising the melting the powder (68) on a surface (70) of the substrate (66) via a laser beam (60). It would have been obvious to one having ordinary skill in the art before the effective filling date to have a teaching of Bruck employed in the circuit configuration of Gowda and Nakano in order to create complex, high-precision metal parts layer by layer by selectively melting and fusing powdered materials. This process is used for a wide range of applications, including customized medical implants, turbine blades, and specialized automotive parts. Response to Arguments Applicant’s arguments with respect to claim(s) 1-2, and 5-15 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TUAN T DINH whose telephone number is (571)272-1929. The examiner can normally be reached MON-FRI: 8AM-4:30PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Timothy Dole can be reached at 571-272-2229. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TUAN T DINH/ Primary Examiner, Art Unit 2848
Read full office action

Prosecution Timeline

Feb 10, 2023
Application Filed
Dec 01, 2023
Non-Final Rejection — §103
Jan 16, 2024
Interview Requested
Apr 08, 2024
Response Filed
Apr 23, 2024
Final Rejection — §103
Jul 24, 2024
Notice of Allowance
Sep 24, 2024
Response after Non-Final Action
Feb 28, 2025
Response after Non-Final Action
May 26, 2025
Non-Final Rejection — §103
Aug 28, 2025
Response Filed
Dec 03, 2025
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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APPARATUS AND METHOD FOR MANUFACTURING POWER MODULE
2y 5m to grant Granted Apr 07, 2026
Patent 12581591
POWER REGULATOR INTERFACES FOR INTEGRATED CIRCUITS
2y 5m to grant Granted Mar 17, 2026
Patent 12581599
PACKAGING MODULE, ELECTRONIC DEVICE, AND METHODS FOR MANUFACTURING THE SAME
2y 5m to grant Granted Mar 17, 2026
Patent 12581743
ELECTRONIC COMPONENT AND APPARATUS
2y 5m to grant Granted Mar 17, 2026
Patent 12571469
CONTROL MODULE OF A VEHICLE
2y 5m to grant Granted Mar 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

4-5
Expected OA Rounds
79%
Grant Probability
99%
With Interview (+23.1%)
3y 0m
Median Time to Grant
High
PTA Risk
Based on 1165 resolved cases by this examiner. Grant probability derived from career allow rate.

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