Prosecution Insights
Last updated: July 15, 2026
Application No. 18/170,639

MULTILAYER SUBSTRATE AND IMAGE SENSOR UNIT

Non-Final OA §103
Filed
Feb 17, 2023
Priority
Aug 25, 2020 — JP 2020-141794 +2 more
Examiner
XU, ZHIJUN
Art Unit
2818
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Canon Inc.
OA Round
2 (Non-Final)
77%
Grant Probability
Favorable
2-3
OA Rounds
2m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
50 granted / 65 resolved
+8.9% vs TC avg
Moderate +10% lift
Without
With
+10.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 7m
Avg Prosecution
29 currently pending
Career history
103
Total Applications
across all art units

Statute-Specific Performance

§103
89.9%
+49.9% vs TC avg
§102
6.6%
-33.4% vs TC avg
§112
2.6%
-37.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 65 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Amendment The amendment filed on Jan. 23rd 2026 has been entered. Claims 1, 3-5 and 7-11 remain pending in the application. Applicant’s amendments to the Claims have overcome each and every objection previously set forth in the Non-Final Office Action mailed on Sep. 26th 2025. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1, 3, 5, 7-8 and 10-11 are rejected under 35 U.S.C. 103 as being unpatentable over Shinji et al. (JP 2012037689) in view of Sakamoto et al. (US 20190098752) and Yukihiko et al. (JP 2002280737). Regarding claim 1, Shinji teaches a multilayer substrate (fig. 13, mounting substrate 15; para. 0084) on which an image sensor (fig. 11, image sensor 1b mounted on 15; para. 0084) is mounted and which includes a plurality of conductive layers (conductive layers 155; para. 0084), the multilayer substrate (15) comprises: a light-shielding portion (light shielding member 8 and 155; para. 0084) configured to shield light (block light; para. 0084) transmitted through a non-wired region (through hole 159; para. 0084) and traveling to the image sensor (1b). Shinji fails to explicitly teach a plurality of vias piled and connected in a straight line; and the non-wired region, which insulates the vias and other wirings, wherein the light-shielding portion is a land of the via formed in a range broader than the non-wired region of another conductive layer in at least one conductive layer. However, Sakamoto teaches a plurality of vias (Sakamoto: fig. 1, first via conductors 156F, through-hole conductors 36, third via conductors 376F; para. 0013, 0014, 0018) piled and connected (electronically) in a straight line (vertical line); and the non-wired region (Sakamoto: first resin insulating layers 150F, third resin insulating layers 170F with opening for through light; para. 0014, 0018, similar to 159 of Shinji), which insulates the vias (Sakamoto: 156F, 376F) and other wirings (Sakamoto: first conductor layers 158F, third conductor layers 178F for wiring connection; para. 0014, 0018), wherein the light-shielding portion (Sakamoto: fig. 1, 158F, 178F, first via lands 156FL on fifth conductor layer 34F; para. 0015, similar to 155 of Shinji) is a land (Sakamoto: 156FL is a land; para. 0015) of the via (Sakamoto: 156F) formed in a range broader (Shinji: 155 is broader than 159, and similar to Sakamoto: bottom 156FL layer on 34F is broader than small through openings of 150F) than the non-wired region (Shinji: 159, similar to Sakamoto: small through openings of 150F) of another conductive layer (Sakamoto: another 158F layer above with small through openings) in at least one conductive layer (Sakamoto: 158F). Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to add the details of vias structure as taught by Sakamoto. Doing so would realize via structure to connect conductor layers with more connection reliability (Sakamoto: para. 0063). Shinji in view of Sakamoto fails to explicitly teach the via is a high-speed transmission wiring. However, Yukihiko teaches the via (Yukihiko: via hole; para. 0006, similar to 156F of Sakamoto) is a high-speed transmission wiring (Yukihiko: higher speed stacked via structure; para. 0006). Yukihiko, Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have modified the via as a high-speed transmission wiring. Doing so would realize a high-speed via structure for higher speed and higher density multilayer printed wiring board (Yukihiko: para. 0006). Regarding claim 3, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to claim 2, wherein the land (Sakamoto: fig. 1, 156FL on 34F) is a land (Sakamoto: 156FL is a land; para. 0015) of a via (Sakamoto: through-hole conductors 36; para. 0013) of a core layer (Sakamoto: core layer 20; para. 0013). Regarding claim 5, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to claim 1, wherein the multilayer substrate (Sakamoto: fig. 1, printed wiring board 10; para. 0010, similar to 15 of Shinji) is a build-up substrate (Sakamoto: substrate with build-up layer Bu1, Bu2; para. 0010). Regarding claim 7, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to claim 1, wherein the light-shielding portion (Shinji: fig. 11, 8, 155) is provided on a surface (Shinji: top surface) of a solder resist (Sakamoto: fig. 1, first solder resist layer 90F and second solder resist layer 90S; para. 0011, similar to surfaces of 15 of Shinji). Regarding claim 8, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to claim 7, wherein the light-shielding portion (Shinji: fig. 11, 8) is one of a printed silk layer, a light-shielding sheet (Shinji: light shielding coating; para. 0012), and an adhesive with a light-shielding property. Regarding claim 10, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to any one of claims 7, wherein the solder resist (Sakamoto: fig. 1, 90F, 90S) is a solder resist (Sakamoto: 90F, 90S are solder resist) on an image sensor side (Shinji: fig. 11, 90F, 90S of Sakamoto as part of 15 on top side of 1b). Regarding claim 11, Shinji teaches an image sensor unit (optical unit 100; para. 0083) comprising: a multilayer substrate (fig. 13, mounting substrate 15; para. 0084) including a plurality of conductive layers (conductive layers 155; para. 0084); and an image sensor (fig. 11, image sensor 1b mounted on 15; para. 0084) mounted on the multilayer substrate (15), wherein the multilayer substrate (15) comprises: a light-shielding portion (light shielding member 8 and 155; para. 0084) configured to shield light (block light; para. 0084) transmitted through a non-wired region (through hole 159; para. 0084) and traveling to the image sensor (1b). Shinji fails to explicitly teach a plurality of vias piled and connected in a straight line; and the non-wired region insulating the vias and other wirings, wherein the light-shielding portion is a land of the via formed in a range broader than the non-wired region of another conductive layer in at least one conductive layer. However, Sakamoto teaches a plurality of vias (Sakamoto: fig. 1, first via conductors 156F, through-hole conductors 36, third via conductors 376F; para. 0013, 0014, 0018) piled and connected (electronically) in a straight line (vertical line); and the non-wired region (Sakamoto: first resin insulating layers 150F, third resin insulating layers 170F with through opening for light; para. 0014, 0018, similar to 159 of Shinji) insulating the vias (Sakamoto: 156F, 376F) and other wirings (Sakamoto: first conductor layers 158F, third conductor layers 178F for wiring connection; para. 0014, 0018), wherein the light-shielding portion (Sakamoto: fig. 1, 158F, 178F, first via lands 156FL on fifth conductor layer 34F; para. 0015, similar to 155 of Shinji) is a land (Sakamoto: 156FL is a land; para. 0015) of the via (Sakamoto: 156F) formed in a range broader (Shinji: 155 is broader than 159, and similar to Sakamoto: bottom 156FL layer on 34F is broader than small through openings of 150F) than the non-wired region (Shinji: 159, similar to Sakamoto: small through openings of 150F) of another conductive layer (Sakamoto: another 158F layer above with small through openings) in at least one conductive layer (Sakamoto: 158F). Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to add the details of vias structure as taught by Sakamoto. Doing so would realize via structure to connect conductor layers with more connection reliability (Sakamoto: para. 0063). Shinji in view of Sakamoto fails to explicitly teach the via is a high-speed transmission wiring. However, Yukihiko teaches the via (Yukihiko: via hole; para. 0006, similar to 156F of Sakamoto) is a high-speed transmission wiring (Yukihiko: higher speed stacked via structure; para. 0006). Yukihiko, Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have modified the via as a high-speed transmission wiring. Doing so would realize a high-speed via structure for higher speed and higher density multilayer printed wiring board (Yukihiko: para. 0006). Claim 4 is rejected under 35 U.S.C. 103 as being unpatentable over Shinji in view of Sakamoto and Yukihiko as applied to claim 1 above, and further in view of Keiji et al. (JP 2016046270). Regarding claim 4, Shinji in view of Sakamoto and Yukihiko teaches the multilayer substrate according to claim 1 including the multilayer substrate (Shinji: fig. 11, 15). Shinji in view of Sakamoto and Yukihiko fails to explicitly teach the multilayer substrate is an any-layer substrate. However, Keiji teaches the multilayer substrate (Keiji: fig. 4, printed circuit board 10a; para. 0038, similar to 15 of Shinji) is an any-layer substrate (Keiji: so-called any-layer board; para. 0038). Keiji, Yukihiko, Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to add the multilayer substrate is an any-layer substrate. Doing so would realize an any-layer board are formed by laser via holes to reduce manufacturing costs (Keiji: para. 0038). Claim 9 is rejected under 35 U.S.C. 103 as being unpatentable over Shinji in view of Sakamoto and Yukihiko as applied to claim 1 above, and further in view of Wang et al. (US 20210384368). Regarding claim 9, Shinji in view of Sakamoto and Yukihiko further teaches the multilayer substrate according to claim 1 including the light-shielding portion (fig. 11, 8, 155). Shinji in view of Sakamoto and Yukihiko fails to explicitly teach the light-shielding portion is a black solder resist. However, Wang teaches the light-shielding portion (Wang: fig. 1, first light-shielding layer 21; para. 0039, similar to 8, 155 of Shinji) is a black solder resist (Wang: black solder resist material; para. 0039). Wang, Yukihiko, Sakamoto and Shinji are considered to be analogous to the claimed invention because they are in the same field of multilayer substrates. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to add the light-shielding portion is a black solder resist. Doing so would realize a black solder resist light-shielding to improving the quality of the image signal (Wang: para. 0004). Furthermore, it has been held to be within the general skill of a worker in the art to select a known material on the basis of its suitability for the intended use as a matter of obvious design choice. In re Leshin, 125 USPQ 416. Response to Arguments Applicant's arguments filed Jan. 23rd 2026 have been fully considered but they are not persuasive. With respect to pages 5-11 of applicant’s response of claims 1 and 11 are rejected under 35 U.S.C.103. Applicant submits "Sakamoto does not describe or suggest increasing the diameter of the land so as to shield light transmitted through the non-wired regions related to the high-speed wiring via. Moreover, the step decreases in the diameter of the via conductor in Sakamoto are identified and described for the purposes of decreasing the stress gradually; not for the purposes of shielding the non-wired regions associated with the high-speed transmission areas." The examiner respectfully disagrees. As shown in fig. 1, Sakamoto teaches increasing the diameter of the land (156FL, 34F, 376FL has larger diameter than the vias) so as to shield light (the conductor material of land is known in the art as capable of shield light, so meets BRI of 'light-shielding portion') transmitted through the non-wired regions (150F, 170F regions near/insulating the vias) related to the via (156F, 36, 376F). Because the land is broader than the vias (and some lands are broader than other lands) and then always shield/blocking some light to the non-wired regions near the vias. And Yukihiko teaches the high-speed wiring via, which will be discussed next. In addition, for the step decreases in the diameter of the via conductor from 50 to 70, also means the diameter of the via conductor increase from 70 to 50, which near core layer, similar to the case of application. Although not the same propose, the lands here are still shielding the non-wired regions because the material. Applicant submits "neither the cited paragraph nor other parts of Yukihiko describe or suggest that the via is a high-speed transition wiring." The examiner respectfully disagrees. As cited in para. 0005-0006 of Yukihiko, Yukihiko teaches the stacked via structure increase in speed and is responding to the high-speed multilayer printed wiring boards, so meets of the via is (at least a part of) a high-speed transition wiring. In addition, the via material of copper is known in the art as capable of high-speed data/signal/voltage transmission, so meets BRI of 'high-speed'. As result, given a broadest reasonable interpretation, Shinji in view of Sakamoto and Yukihiko teaches all limitations of claims 1 and 11. Details of rejections are discussed above. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. TOMOHIRO et al. (JP 2016046267) teaches the light-shielding portion is a land of the via formed in a range broader than the non-wired region of another conductive layer in at least one conductive layer, and the via is a high-speed transition wiring. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ZHIJUN XU whose telephone number is (571)270-3447. The examiner can normally be reached Monday-Thursday 9am-5pm ET. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Eva Montalvo can be reached at (571) 270-3829. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ZHIJUN XU/Examiner, Art Unit 2818 /BRIAN TURNER/Examiner, Art Unit 2818
Read full office action

Prosecution Timeline

Feb 17, 2023
Application Filed
Sep 26, 2025
Non-Final Rejection mailed — §103
Jan 23, 2026
Response Filed
Apr 15, 2026
Final Rejection mailed — §103
Jun 08, 2026
Response after Non-Final Action
Jul 07, 2026
Request for Continued Examination
Jul 14, 2026
Response after Non-Final Action

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12672282
Methods Used In Forming A Memory Array Comprising Strings Of Memory Cells Comprising Forming Undoped Semiconductive Material Into A Void-Space
4y 9m to grant Granted Jun 30, 2026
Patent 12666691
SEMICONDUCTOR DEVICE INCLUDING AN INTERNAL SPACER
5y 2m to grant Granted Jun 23, 2026
Patent 12666818
DISPLAY DEVICE
3y 7m to grant Granted Jun 23, 2026
Patent 12642015
CONFORMAL METAL DICHALCOGENIDES
4y 5m to grant Granted May 26, 2026
Patent 12635313
METHOD OF TRANSFERRING MICRO SEMICONDUCTOR CHIPS
3y 5m to grant Granted May 19, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

2-3
Expected OA Rounds
77%
Grant Probability
87%
With Interview (+10.3%)
3y 7m (~2m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 65 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month