Prosecution Insights
Last updated: April 19, 2026
Application No. 18/173,526

METHOD FOR MANUFACTURING A CARRIER SUBSTRATE ON A SEMICONDUCTOR WAFER AND DEVICE INCLUDING A SEMICONDUCTOR WAFER

Non-Final OA §103
Filed
Feb 23, 2023
Examiner
GHYKA, ALEXANDER G
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Robert Bosch GmbH
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
97%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
1067 granted / 1278 resolved
+15.5% vs TC avg
Moderate +14% lift
Without
With
+13.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
34 currently pending
Career history
1312
Total Applications
across all art units

Statute-Specific Performance

§101
1.2%
-38.8% vs TC avg
§103
55.4%
+15.4% vs TC avg
§102
15.8%
-24.2% vs TC avg
§112
12.2%
-27.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1278 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I (Claims 11-18) in the reply filed on 10/20/2025 is acknowledged. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claims 11-12 and 14-18 are rejected under 35 U.S.C. 103 as being unpatentable over von Malm (US 2018/0122990) in view of Oliver (EP 2755605). With respect to Claim 11, von Malm discloses a method for manufacturing a carrier substrate (Figure 1, 90) that includes a front side (top) and a rear side (bottom), the front side being situated opposite the rear side, the front side representing a structured semiconductor side (Figure 1, 2) including contact areas (Figure 1, 8) , the method comprising the following steps: applying at least one first layer (Figure 1, layers 3 or 5) to the front side using printing technology (paragraphs 29-30), the at least one first layer including a first material which is water-insoluble (nickel, paragraph 30); and curing the at least one first layer using UV radiation or thermally or using sintering (paragraph 30, last 3 lines). However, von Malm differs from the Claims at hand in that von Malm does not disclose that the carrier substrate is on a semiconductor wafer. Oliver et al is relied upon to disclose the use of carrier substrates (Figure 1A, 1) on wafers (Figure 1A, 5) , and their benefit in providing support during the manufacture of electronic devices. See Figure 1A and corresponding text, especially paragraphs 1-4 and 48. It would have been obvious to one of ordinary skill in the art, before the effective date of the invention, to attach a wafer below the carrier substrate of von Malm, for its known benefit in providing support as disclosed by Oliver et al. The use of a known component for its known benefit would have been prima facie obvious to one of ordinary skill in the art. With respect to Claim 12, von Malm makes obvious producing , using a laser, n openings of the at least one first layer, which partially exposes the contact areas. See paragraph 9 which discloses lasers to etch openings, and paragraph 45 which discloses forming recess 25. With respect to Claim 14, von Malm discloses applying a structured planarizing layer (Figure 1, 93) to the front side, the structured planarizing layer filling in recesses of the front side. With respect to Claim 15, von Malm discloses wherein a media-soluble layer or a thermally soluble layer or a thermally soluble layer or an optically soluble layer is applied directly to areas on the front side. See paragraph 29. With respect to Claim 16, von Malm makes obvious wherein the application of the at least one first layer takes place repeatedly, the at least one first layer having a layer thickness of at least 5 microns, as changes in size are prima facie obvious. See in re Rose, 105 USPQ 327 (CCPA 1955). Moreover, duplication of process steps for its known benefit is prima facie obvious in the absence of unobvious results. See In re Harza, 124 USPQ 378 (CCPA 1960). With respect to Claim 17, von Malm makes obvious wherein the layer thickness is between 5 and 40 microns, as changes in size are prima facie obvious. See in re Rose, 105 USPQ 327 (CCPA 1955).. With respect to Claim 18, von Malm makes obvious wherein the application of the at least one first layer takes place using inkjet technology or LIFT technology or DLP technology or stereolithography so that the at least one first layer includes a coating layer. See paragraph 30 which discloses inks. Moreover, the Examiner takes Official Notice that inkjet technology is well known in the art, and would be within the skill of one of ordinary skill in the art. Allowable Subject Matter Claim 13 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The cited prior art does not disclose or make obvious “wherein the at least one first layer includes a second material, which is applied to the front side above the contact area using printing technology, openings of the at least one first layer, which partially expose the contact areas, being produced by removing the second material”. Claim Objections Claim 12 is objected to because of the following informalities: the phrase “n openings”. Appropriate correction is required. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEXANDER G GHYKA whose telephone number is (571)272-1669. The examiner can normally be reached Monday-Friday 9-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine Kim can be reached at 571 272-8458. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. AGG December 31, 2025 /ALEXANDER G GHYKA/ Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Feb 23, 2023
Application Filed
Apr 04, 2023
Response after Non-Final Action
Dec 31, 2025
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12604609
DISPLAY APPARATUS HAVING A LIGHT-BLOCKING PATTERN
2y 5m to grant Granted Apr 14, 2026
Patent 12604398
SELF-HEALABLE, RECYCLABLE, AND RECONFIGURABLE WEARABLE ELECTRONICS DEVICE
2y 5m to grant Granted Apr 14, 2026
Patent 12598970
TOP VIA ON SUBTRACTIVELY ETCHED CONDUCTIVE LINE
2y 5m to grant Granted Apr 07, 2026
Patent 12598958
WAFER TREATMENT METHOD
2y 5m to grant Granted Apr 07, 2026
Patent 12593661
SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK, METHOD OF MANUFACTURING THE SAME, AND SYSTEM FOR MANUFACTURING THE SAME
2y 5m to grant Granted Mar 31, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
97%
With Interview (+13.8%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 1278 resolved cases by this examiner. Grant probability derived from career allow rate.

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