Prosecution Insights
Last updated: April 19, 2026
Application No. 18/186,413

Optical Device and Method of Manufacture

Non-Final OA §102
Filed
Mar 20, 2023
Examiner
ST CYR, DANIEL
Art Unit
2876
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Taiwan Semiconductor Manufacturing Co., Ltd.
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
95%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allow Rate
1131 granted / 1390 resolved
+13.4% vs TC avg
Moderate +13% lift
Without
With
+13.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
45 currently pending
Career history
1435
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
43.1%
+3.1% vs TC avg
§102
32.0%
-8.0% vs TC avg
§112
3.1%
-36.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1390 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1-20 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Chen, CN 104766903 Chen discloses an integrated mode and its forming method comprising: an integrated module, the integration module comprises a first unit (e.g. an electronic IC 300) and a second unit (e.g. a photoelectric IC (200), wherein the light emitted by the photoelectric element back surface, and the back surface is the light element 202 the position of the opposite surface. In order to achieve effective coupling, photoelectric IC comprising a OTSV (for example, FIG. 12A-12D, FIG. 13A-13E or other drawn OTSV). to direct light into a photoelectric IC is capable of polishing or grinding to thin thickness. According to some embodiments, photoelectric IC can be polished to 200um to 250um. integrated module comprises a photoelectric IC 200, an electronic IC 300 and an intermediate layer 400. The intermediate layer 400 includes the TSV 400 and be used as the photo IC 200, electronic IC 300 and base 100 between bridge plate of low cost. the intermediate layer of the smaller pitch on the IC bridging to the substrate (e.g., printed circuit board) on connection pads with larger pitch. The photoelectric IC 200 comprises a light element on a first surface 202 (e.g., light detector) and the pad 220. According to some embodiments, the photo IC 200 can further comprises setting OTSV at the second face (back face) 250, the second surface is opposite the first surface (front surface). OTSV 250 is coupled to the optical element 202. According to some embodiments, if no OTSV, and also can be the photoelectric element surface with an antireflective coating layer (ARC layer), such that the light is effectively coupled to the back. According to some embodiments, photoelectric IC 200 may be disposed on the intermediate layer 400 and electrical pads 220 electrically coupled to the TSV 400. electronic IC 300 is also disposed on the interposer 400 and electrical pad 320 electrically coupled to TSV 400. intermediate layer 400 through a bonding mechanism (e.g. solder balls or copper pillar (130) is disposed on the base plate 100. According to some embodiments, an optical fiber (not shown) can be inserted into OTSV 250 and through OTSV 250 and is aligned with the optical elements 202. ray is incident and by substantially vertical first surface direction, and is incident to the optical element 202 by the OTSV 250 or ARC layer (covering the silicon substrate back surface). According to some embodiments, the optical element may be a light detector and converting the received light into an electrical signal. This electric signal via pad 220, TSV 440 (winding) and inside electric pads 320 so as to transmit to the electronic IC 300. The optical structure of the device of Chen includes the structure and components of the claims, including the method steps for manufacturing the components (see Fig. 15A-C). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Doany et al, US Pub. 2012/0207426, disclose a flip-chip packaging for dense hybrid integration of electrical and photonic integrated circuits. Yasuda et al, US Pub. 2012/0183253, disclose a photoelectronic conversion module. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DANIEL ST CYR whose telephone number is (571)272-2407. The examiner can normally be reached M to F 8:00-8:00. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Michael G Lee can be reached at 571-272-2398. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. DANIEL ST CYR Primary Examiner Art Unit 2876 /DANIEL ST CYR/ Primary Examiner, Art Unit 2876
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Prosecution Timeline

Mar 20, 2023
Application Filed
Dec 15, 2025
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
95%
With Interview (+13.2%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 1390 resolved cases by this examiner. Grant probability derived from career allow rate.

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