Prosecution Insights
Last updated: July 17, 2026
Application No. 18/189,991

PACKAGE SUBSTRATE COMPRISING AT LEAST TWO CORE LAYERS

Final Rejection §102
Filed
Mar 24, 2023
Examiner
PHAM, LONG
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Qualcomm Incorporated
OA Round
2 (Final)
92%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 92% — above average
92%
Career Allowance Rate
1515 granted / 1655 resolved
+23.5% vs TC avg
Moderate +6% lift
Without
With
+5.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
38 currently pending
Career history
1688
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
56.5%
+16.5% vs TC avg
§102
24.1%
-15.9% vs TC avg
§112
9.4%
-30.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1655 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 14-26 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Marimuthu et al. (US pat 8263439). With respect to claim 14, Marimuthu et al. teach a package comprising (see figs. 1-9i, particularly fig. 8i and associated text): a substrate comprising: (i) a first cored substrate portion comprising: a first core layer 440 comprising a first cavity (space where 434 occupies); a first integrated device 434 located in the first cavity of the first core layer, wherein the first integrated device comprises a first front side (bottom) and a first back side (top); and a first dielectric layer 454 at least partially encapsulating the first integrated device; and (ii) a second cored substrate portion comprising: a second core layer 404 comprising a second cavity (space where 402 occupies); a second integrated device 402 located in the second cavity of the second core layer, wherein the second integrated device comprises a second front side (top) and a second back side (bottom); and wherein the second back side of the second integrated device faces in a direction toward the first back side of the first integrated device; and a second dielectric layer 418 at least partially encapsulating the second integrated device; and a third integrated device 460 coupled to the substrate through a plurality of solder interconnects 464. With respect to claim 15, Marimuthu et al. teach a plurality of through substrate vias 444, 414 (outer) extending through the first cored substrate portion and the second cored substrate portion. See fig. 8i and associated text. With respect to claim 16, Marimuthu et al. teach the first cored substrate portion comprises a first plurality of interconnects 444 (inner),436, and wherein the second cored substrate portion comprises a second plurality of interconnects 414 (inner), 430. See fig. 8i and associated text. With respect to claim 17, Marimuthu et al. teach the first plurality of interconnects comprises: a first plurality of core interconnects 444 (inner) located in the first core layer; and a third plurality of interconnects 436 located at least in the first dielectric layer, and wherein the second plurality of interconnects comprises: a second plurality of core interconnects 414 (inner) located in the second core layer; and a fourth plurality of interconnects 410 located at least in the second dielectric layer. See fig. 8i and associated text. With respect to claim 18, Marimuthu et al. teach the first plurality of interconnects are configured to be electrically coupled to the second plurality of interconnects through the plurality of through substrate vias 444,414 (outer), wherein the first back side of the first integrated device faces in a first direction, and wherein the second back side of the second integrated device faces in a second direction that is opposite to the first direction. See fig. 8i and associated text. With respect to claim 19, Marimuthu et al. teach a first metallization portion 458 coupled to the first cored substrate portion; and a second metallization portion 422 coupled to the second cored substrate portion. See fig. 8i and associated text. With respect to claim 20, Marimuthu et al. teach the first cored substrate portion is coupled to the second cored substrate portion through a third dielectric layer, wherein the first back side of the first integrated device faces in a direction toward the second back side of the second integrated device. See fig. 8i and associated text and col. 15, lines 15-20. With respect to claim 21, Marimuthu et al. teach a third core layer located between the first core layer and the second core layer. See fig. 8i and associated text and col. 5, lines 40-55 (col. 5, lines 40-455 teaches multiple cored substrates). With respect to claim 22, Marimuthu et al. teach the first cored substrate portion is coupled to the third core layer through a first dielectric layer, and wherein the second cored substrate portion is coupled to the third core layer through a second dielectric layer. See fig. 8i and associated text and col. 5, lines 40-55 and col. 15, lines 15-20. With respect to claim 23, Marimuthu et al. teach a plurality of through substrate vias extending through the first cored substrate portion, the third core layer and the second cored substrate portion (fig. 8i teaches each cored substate having through via and col. 5, lines 40-455 teaches multiple cored substrates). See fig. 8i and associated text and col. 5, lines 40-55. With respect to claim 24, Marimuthu et al. teach the first cored substrate portion comprises a first plurality of interconnects, and wherein the second cored substrate portion comprises a second plurality of interconnects. See fig. 8i and associated text. With respect to claim 25, Marimuthu et al. teach a third plurality of interconnects 452 located between the first cored substrate portion and the second cored substrate portion. See fig. 8i and associated text. With respect to claim 26, Marimuthu et al. teach a fourth integrated device coupled to the substrate through a second plurality of solder interconnects, wherein the first integrated device is a first chiplet, wherein the second integrated device is a second chiplet, wherein the third integrated device is a third chiplet, and wherein the fourth integrated device is a fourth chiplet. See fig. 8i and associated text and col. 5, lines 40-55 (col. 5, lines 40-455 teaches multiple cored substrates). Response to Arguments Applicant's arguments filed 2/26/26 have been fully considered but they are not persuasive. See the above rejections. In response to the applicant’s arguments on pages 10-12 of the amendment dated 2/26/26, it is submitted that there are no structural differences in arbitrarily calling the back and front sides of a device, they’re merely opposite sides of the device. Further, claim language is to be given broadest interpretation during examination. Further, limitations from outside of claims are not given patentable weight in patentability determination of claims. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to LONG PHAM whose telephone number is (571)272-1714. The examiner can normally be reached Mon-Friday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jacob Choi can be reached at 469-295-9060. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. LONG . PHAM Examiner Art Unit 2823 /LONG PHAM/Primary Examiner, Art Unit 2897
Read full office action

Prosecution Timeline

Mar 24, 2023
Application Filed
Dec 02, 2025
Non-Final Rejection mailed — §102
Feb 26, 2026
Response Filed
May 29, 2026
Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12685219
PACKAGE COMPRISING A CHIPLET LOCATED BETWEEN AN INTEGRATED DEVICE AND A METALLIZATION PORTION
3y 10m to grant Granted Jul 14, 2026
Patent 12685214
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
3y 7m to grant Granted Jul 14, 2026
Patent 12685213
SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR PACKAGE
3y 2m to grant Granted Jul 14, 2026
Patent 12685233
THREE-DIMENSIONAL STACKING SEMICONDUCTOR ASSEMBLIES WITH NEAR ZERO BOND LINE THICKNESS
2y 0m to grant Granted Jul 14, 2026
Patent 12677686
Electronic Package with Components Mounted at Two Sides of a Layer Stack
3y 9m to grant Granted Jul 07, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
92%
Grant Probability
97%
With Interview (+5.5%)
2y 3m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 1655 resolved cases by this examiner. Grant probability derived from career allowance rate.

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