Listed by the USPTO as PHAM, LONG
Tech Center 2800 • Art Units: 2814 2823 2892 2897
This examiner grants 92% of resolved cases
Long Pham is an experienced examiner in Art Unit 2814 of Tech Center 2800, having resolved 1671 cases. The allowance rate is 91.6 percent, representing a high success rate for applicants. Furthermore, the median time to allowance is 852 days, indicating an efficient prosecution timeline. These figures demonstrate a predictable and favorable environment for patent applicants in this art unit.
The interview lift is 5.5 percent. Given that the base allowance rate is already 91.6 percent, the small lift suggests that interviews are rarely necessary to achieve a grant, though they still provide a slight statistical advantage. With 1671 cases on record, the data provides a reliable forecast for future prosecution. Practitioners can expect a high likelihood of success and a 852-day path to allowance when working with this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18439531 | LIGHT-EMITTING ELEMENT PACKAGE, DISPLAY DEVICE USING THE SAME, AND METHOD FOR MANUFACTURING DISPLAY DEVICE | Non-Final OA | LG ELECTRONICS INC. |
| 18764401 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18746857 | SEMICONDUCTOR APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18679410 | SYSTEMS AND METHODS FOR HIGH BANDWIDTH MEMORY CONFIGURATIONS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18419098 | SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17825350 | INTEGRATED CIRCUIT ASSEMBLIES HAVING INTERCONNECTION BRIDGES SPANNING RETICLE BOUNDARY / DICING STREETS OF MONOLITHIC STRUCTURES THEREIN | Non-Final OA | Intel Corporation |
| 18319852 | CIRCUIT BOARD DEVICE WITH INDUCTOR(S) FOR ROUTING POWER FROM A POWER MANAGEMENT INTEGRATED CIRCUIT (IC) (PMIC) TO A SECONDARY CIRCUIT BOARD, AND RELATED ASSEMBLY METHODS | Non-Final OA | QUALCOMM Incorporated |
| 18664926 | STACKED TRANSISTORS WITH VERTICALLY STAGGERED CONTACT VIAS | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18071972 | MULTILEVEL PACKAGE SUBSTRATE WITH BOX SHIELD | Final Rejection | Texas Instruments Incorporated |
| 18070708 | ELECTRONIC DEVICE PACKAGE EMI SHIELDING WITH GROUNDED MOLD INTERCONNECT | Final Rejection | Texas Instruments Incorporated |
| 18783147 | DEVICES COMPRISING CRYSTALLINE MATERIALS | Non-Final OA | Micron Technology, Inc. |
| 18441824 | STRESS INCORPORATION IN SEMICONDUCTOR DEVICES | Non-Final OA | Applied Materials, Inc. |
| 18764936 | SEMICONDUCTOR DEVICE WITH DIELECTRIC STRUCTURE IN CHANNEL REGION AND MANUFACTURING METHODS THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18764951 | GATE-ALL-AROUND DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18679046 | SINGLE PHOTON AVALANCHE DIODE FOR EXTREME ULTRAVIOLET PHOTON DETECTION AND RELATED METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18226994 | PRINTED CIRCUIT BOARD | Final Rejection | SAMSUNG ELECTRO-MECHANICS CO., LTD. |
| 18692472 | SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC EQUIPMENT | Non-Final OA | BEIJING SUPERSTRING ACADEMY OF MEMORY TECHNOLOGY |
| 18176393 | SYSTEMS AND METHODS FOR PACKAGING A SEMICONDUCTOR DEVICE | Final Rejection | Advanced Micro Devices, Inc. |
| 18746087 | MAGNETORESISTIVE RANDOM ACCESS MEMORY AND METHOD FOR FABRICATING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
| 18579934 | NITRIDE SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | SHIN-ETSU HANDOTAI CO., LTD. |
| 18569751 | QUBIT ELEMENT | Non-Final OA | Rheinisch-Westfälische Technische Hochschule (RWTH Aachen) |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy91.6% of resolved applications examined by Long Pham were allowed (1,674 resolved cases), compared with 74.1% across Art Unit 2814 over the last five years.
This examiner's interview lift is +5.5 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Long Pham took 853 days on average from filing to allowance.
Long Pham examines applications in Art Unit 2814 in Tech Center 2800 (Semiconductors, Circuits & Optics).