Office Action Predictor
Last updated: April 15, 2026
Application No. 18/217,740

METAL-OXIDE SEMICONDUCTOR TRANSISTORS

Non-Final OA §102§103
Filed
Jul 03, 2023
Examiner
TRAPANESE, WILLIAM C
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Globalfoundries Singapore Pte. LTD.
OA Round
1 (Non-Final)
76%
Grant Probability
Favorable
1-2
OA Rounds
3y 2m
To Grant
87%
With Interview

Examiner Intelligence

Grants 76% — above average
76%
Career Allow Rate
479 granted / 626 resolved
+8.5% vs TC avg
Moderate +11% lift
Without
With
+10.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
30 currently pending
Career history
656
Total Applications
across all art units

Statute-Specific Performance

§101
10.9%
-29.1% vs TC avg
§103
54.6%
+14.6% vs TC avg
§102
24.2%
-15.8% vs TC avg
§112
3.1%
-36.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 626 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Analysis for Independent Claims (Dependent Claim Analysis will follow) Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1,20 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lin (Lin, US 2023/0130955). In regards to independent claim 1, Lin teaches a structure comprising: a substrate (Lin, Fig. 4 Item 12) comprising a drift region (Lin, Fig. 4 Item 20 N well) and a body region (Lin, Fig. 4 Item 18 P Well) a gate structure between the drift region and the body region (Lin, Fig 4 Item 24, gate structure) an insulator material over the gate structure, the drift region and the body region (Lin, Fig. 4, Item 54, ILD layer); and an air gap within the insulator material and extending into the drift region (Lin, Fig. 4 Item 60, air gap, extends below the surface of the N well). In regards to independent claim 20, Lin teaches a method comprising: forming a substrate (Lin, Fig. 4 Item 12, [0016]) comprising a drift region (Lin, Fig. 4 Item 20 N well[0016]) and a body region (Lin, Fig. 4 Item 18 P Well [0016]); forming a gate structure between the drift region and the body region (Lin, Fig 4 Item 24, gate structure [0020]); forming an insulator material over the gate structure, the drift region and the body region region (Lin, Fig. 4, Item 54, ILD layer [0022]); and forming an air gap within the insulator material and extending into the body region (Lin, Fig. 4 Item 60, air gap, extends below the surface of the N well [0025]). Claim(s) 12 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Mun (Mun, US 2022/0059665). In regards to independent claim 12, Mun teaches a structure comprising: a substrate (Mun, Fig. 1A Item 105) comprising a drift region (Mun, Fig. 1A Item 150) and a body region (Mun, Fig. 1A Item 140); a gate structure between the drift region and the body region (Mun, Fig. 1A Item 122); and a field plate extending from the body region, over the gate structure and towards the drift region (Mun, Fig. 1A Item 177). Claim Analysis for Dependent Claims Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 8,9 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lin. In regards to dependent claim 8, Lin teaches a shallow trench isolation structure within the drift region (Lin, Item 22). In regards to dependent claim 9, Lin teaches wherein the air gap extends partially into the shallow trench isolation structure (Lin, Item 60, 22). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 10-11 is/are rejected under 35 U.S.C. 103 as being unpatentable over Lin in view of Mun. In regards to dependent claim 10, Lin fails to explicitly teach a field plate extending from the body region, over the gate structure and adjacent to the air gap. Mun teaches a field plate extending from the body region, over the gate structure and adjacent to the air gap (Mun, Fig. 1A Item 177). It would have been obvious to one of ordinary skill in the art, having the teachings of Lin and Mun before him before the effective filing date of the claimed invention, to modify the drift air gap taught by Lin to include the field plate of Mun in order to obtain an drift air gap covered by a field plate. One would have been motivated to make such a combination because it mitigates deleterious effects of internal electrical fields. In regards to dependent claim 11, Lin fails to explicitly teach wherein the field plate extends over the air gap. Mun teaches wherein the field plate extends over the air gap (Mun, Fig. 1A Item 177, 183). It would have been obvious to one of ordinary skill in the art, having the teachings of Lin and Mun before him before the effective filing date of the claimed invention, to modify the drift air gap taught by Lin to include the field plate of Mun in order to obtain an drift air gap covered by a field plate. One would have been motivated to make such a combination because it mitigates deleterious effects of internal electrical fields. Allowable Subject Matter Claims 2-7, 13, and 14-19 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM C TRAPANESE whose telephone number is (571)270-3304. The examiner can normally be reached Monday - Friday 7am-12pm & 8pm-10pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached at (571)272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM C TRAPANESE/Primary Examiner, Art Unit 2812
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Prosecution Timeline

Jul 03, 2023
Application Filed
Nov 29, 2025
Non-Final Rejection — §102, §103
Apr 03, 2026
Response Filed

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
76%
Grant Probability
87%
With Interview (+10.9%)
3y 2m
Median Time to Grant
Low
PTA Risk
Based on 626 resolved cases by this examiner. Grant probability derived from career allow rate.

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