Prosecution Insights
Last updated: April 19, 2026
Application No. 18/230,626

LED ARRAY

Final Rejection §102
Filed
Aug 05, 2023
Examiner
HATFIELD, MARSHALL MU-NUO
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Meijo University
OA Round
2 (Final)
94%
Grant Probability
Favorable
3-4
OA Rounds
3y 5m
To Grant
98%
With Interview

Examiner Intelligence

Grants 94% — above average
94%
Career Allow Rate
64 granted / 68 resolved
+26.1% vs TC avg
Minimal +3% lift
Without
With
+3.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
34 currently pending
Career history
102
Total Applications
across all art units

Statute-Specific Performance

§103
50.6%
+10.6% vs TC avg
§102
33.1%
-6.9% vs TC avg
§112
16.0%
-24.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 68 resolved cases

Office Action

§102
Detailed Action Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant's arguments, See Page 8, final paragraph of applicant’s arguments, filed 12/29/2025 in regards to the rejection(s) of claim 1 and dependent claims under 35 U.S.C. 102(a)(1) in view of Inoue(US 20210193867 A1, hereafter Inoue) have been fully considered but they are not persuasive. As stated in Page 8 applicant argues that Inoue does not describe a plurality of light-emitting layers Fig. 6B 20a are formed on the same n-side semiconductor 6B 20n. This is true, but only by specifically interpreting the layer 20n as a single, continuous layer. Under the broadest reasonable interpretation of the claims, this may not necessarily be true, as well as in view of the prior art, where a layer is often described or shown as a set of non-contiguous elements which are deposited concurrently or on a same level. Therefore, it is interpreted in the current claim language that “a planarization layer” as in claim 1 is too broad to overcome the prior art of Inoue, as while the planarization in the application at hand is a continuous layer and the planarization layer in Inoue is not, this is not made clear by the present claim language. The remaining amendments do not significantly alter the scope of the claim, so the rejection under Inoue as in the non-final rejection, dated 10/15/2025 is maintained. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Kim et al.(US 20170108173 A1) discloses a substrate with protrusions on a LED device. Seo(US 20200194628 A1) discloses a substrate with protrusions and a groove. Sugano(US 8927348 B2) discloses a substrate with an array of LED elements disposed therein. THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to MARSHALL MU-NUO HATFIELD whose telephone number is (703)756-1506. The examiner can normally be reached Mon-Thus 11:00 AM-9:00PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Fernando Toledo can be reached at 571-272-1867. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /FERNANDO L TOLEDO/Supervisory Patent Examiner, Art Unit 2897 /MARSHALL MU-NUO HATFIELD/Examiner, Art Unit 2897
Read full office action

Prosecution Timeline

Aug 05, 2023
Application Filed
Oct 08, 2025
Non-Final Rejection — §102
Dec 29, 2025
Response Filed
Mar 04, 2026
Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12598778
SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS INCLUDING THE SEMICONDUCTOR DEVICE
2y 5m to grant Granted Apr 07, 2026
Patent 12593603
Display Substrate and Display Device
2y 5m to grant Granted Mar 31, 2026
Patent 12588473
DEVICE, SYSTEM AND METHOD FOR VOLTAGE GENERATING
2y 5m to grant Granted Mar 24, 2026
Patent 12575168
RC IGBT, Method of Producing an RC IGBT and Method of Controlling a Half Bridge Circuit
2y 5m to grant Granted Mar 10, 2026
Patent 12575118
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
2y 5m to grant Granted Mar 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

3-4
Expected OA Rounds
94%
Grant Probability
98%
With Interview (+3.4%)
3y 5m
Median Time to Grant
Moderate
PTA Risk
Based on 68 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month