Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2897
This examiner grants 93% of resolved cases
Marshall Mu-Nuo Hatfield is a patent examiner in Tech Center 2800, specifically Art Unit 2897. The examiner has 96 resolved cases and a high allowance rate of 92.7 percent. This rate suggests a very favorable environment for applicants, with the vast majority of cases resulting in a grant. The 96 resolved cases provide a clear picture of the examiner's receptive approach in Tech Center 2800.
The interview lift for this examiner is 4.4 percent. This relatively low lift indicates that interviews do not significantly change the already high probability of allowance. Since the baseline allowance rate is 92.7 percent, most applications are likely to reach a grant without the need for the additional 4.4 percent lift provided by an interview in Art Unit 2897.
The median days to allowance for this examiner is 1237. This pendency figure shows that while the probability of success is high, the process still takes a considerable amount of time. Practitioners in Art Unit 2897 can expect a 92.7 percent chance of success, but should plan for a median timeline of 1237 days to reach that outcome.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18637650 | SEMICONDUCTOR DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18694526 | SWITCH STRUCTURE, METHOD FOR PREPARING SAME, AND RF CHIP | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18669814 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE, METHOD OF MANUFACTURING DISPLAY DEVICE USING APPARATUS FOR MANUFACTURING DISPLAY DEVICE, AND DISPLAY DEVICE MANUFACTURED BY METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18520673 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 17676045 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 17594547 | DISPLAY PANEL AND ELECTRONIC DEVICE | Non-Final OA | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. |
| 18341644 | DEVICE, SYSTEM, AND MOVING BODY | Final Rejection | CANON KABUSHIKI KAISHA |
| 17935647 | INTEGRATED CIRCUIT DEVICES WITH CONTACTS USING NITRIDIZED MOLYBDENUM | Non-Final OA | Intel Corporation |
| 18440444 | SUBSTRATES WITH DOWNSET | Non-Final OA | Micron Technology, Inc. |
| 18789164 | METAL FUSE STRUCTURE BY VIA LANDING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18782515 | TUNING GATE LENGTHS IN MULTI-GATE FIELD EFFECT TRANSISTORS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
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