Office Action Predictor
Last updated: April 15, 2026
Application No. 18/232,510

VTFET WITH BURIED POWER RAILS

Non-Final OA §112
Filed
Aug 10, 2023
Examiner
BODNAR, JOHN A
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
International Business Machines Corporation
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2y 6m
To Grant
95%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allow Rate
482 granted / 579 resolved
+15.2% vs TC avg
Moderate +12% lift
Without
With
+12.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
25 currently pending
Career history
604
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
46.9%
+6.9% vs TC avg
§102
26.3%
-13.7% vs TC avg
§112
24.9%
-15.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 579 resolved cases

Office Action

§112
DETAILED ACTION This application, 18/232,510 attorney docket P201911703US02, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . This application is assigned to IBM, is a Divisional of 17/477,532, filed 09/17/2021, now U.S. Patent # 11764298. Claims 1-10 are pending and are considered below. Note that examiner will use numbers in parentheses to indicate numbered elements in prior art figures, and brackets to point to paragraph numbers where quoted material or specific teachings can be found. Specification The disclosure is objected to because of the following informalities: paragraph [0001] has a typographical error: VVFET instead of VTFET. Appropriate correction is required. Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. Claims 1-10 are rejected under 35 U.S.C. 112(a) as failing to comply with the enablement requirement. The claims contains subject matter which was not described in the specification in such a way as to enable one skilled in the art to which it pertains, or with which it is most nearly connected, to make and/or use the invention. The method claimed requires forming the buried power rail before forming the buried oxide (BOX) and transistors, but the disclosure and drawings only support forming the power rail (as shown as 132 in figure 15A [0101]) after the BOX and transistors are completed, and the support substrate is removed from the backside of the BOX. Examiner notes that paragraph [0007] of the specification describes a structure, not the method of forming the structure and cannot be used to support enablement of a method. One skilled is a semiconductor process engineer who designs a process sequence for manufacturing VFET devices. The method requires forming a metal/conductive layer before forming the device and it is not clear how the metals will survive the process of forming and diffusing the semiconductor regions. Allowable Subject Matter Claims 1-10 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(a) set forth in this Office action. The following is a statement of reasons for the indication of allowable subject matter: The prior art does not teach or make obvious the method of claim 1 which includes forming a buried power rail and forming a BOX on the power rail, then forming VTFETs over the BOX. Claims 2-10 depend from claim 1 and include the same novel feature. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. U.S. 2019/0280120 to Kim et al. teaches forming a VFET, but forms the back contact after the device is formed. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN A BODNAR whose telephone number is (571)272-4660. The examiner can normally be reached M-Th and every other Friday 7:30-5:30 Central time. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Yara Green can be reached at 571-270-3035. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JOHN A BODNAR/ Primary Examiner, Art Unit 2893
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Prosecution Timeline

Aug 10, 2023
Application Filed
Nov 10, 2025
Non-Final Rejection — §112
Mar 23, 2026
Examiner Interview Summary
Mar 23, 2026
Applicant Interview (Telephonic)
Mar 24, 2026
Response Filed

Precedent Cases

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Patent 12588209
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
95%
With Interview (+12.1%)
2y 6m
Median Time to Grant
Low
PTA Risk
Based on 579 resolved cases by this examiner. Grant probability derived from career allow rate.

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