Prosecution Insights
Last updated: April 19, 2026

Examiner: BODNAR, JOHN A

Tech Center 2800 • Art Units: 2893

This examiner grants 83% of resolved cases

Performance Statistics

83.2%
Allow Rate
+15.2% vs TC avg
604
Total Applications
+12.1%
Interview Lift
967
Avg Prosecution Days
Based on 579 resolved cases, 2023–2026

Rejection Statute Breakdown

0.2%
§101 Eligibility
26.3%
§102 Novelty
46.9%
§103 Obviousness
24.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18379841 SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18128490 MIM FLUX CAPACITOR WITH THIN AND THICK METAL LEVELS Non-Final OA TEXAS INSTRUMENTS INCORPORATED
18072702 INTEGRATED CIRCUIT CAPACITOR Final Rejection TEXAS INSTRUMENTS INCORPORATED
18257795 POWER MODULE FOR OPERATING AN ELECTRIC VEHICLE DRIVE HAVING OPTIMIZED COOLING AND CONTACTING Non-Final OA ZF Friedrichshafen AG
17813592 DISPLAY DEVICE HAVING LIGHT TRANSMISSIVE REGIONS Non-Final OA SAMSUNG DISPLAY CO., LTD.
18450689 LIGHT-EMITTING UNIT Non-Final OA AUO Corporation
18476310 STAGE APPARATUS, EXPOSURE APPARATUS, INSPECTION APPARATUS, AND DEVICE MANUFACTURING METHOD Non-Final OA SUMITOMO HEAVY INDUSTRIES, LTD.
18188082 STRUCTURE AND METHOD FOR DEEP TRENCH CAPACITOR Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18178406 SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17887273 SACRIFICIAL LAYER FOR SUBSTRATE ANALYSIS Non-Final OA Intel Corporation
17654530 DOPED METAL-INSULATOR-METAL (MIM) CAPACITOR OF A MEMORY ARRAY Final Rejection Intel Corporation
18046088 BIT LINES HAVING HIGH ELECTRICAL CONDUCTIVITY AND LOW MUTUAL CAPACITANCE AND RELATED APPARATUSES, COMPUTING SYSTEMS, AND METHODS Final Rejection Micron Technology, Inc.
18345001 OPENING IN STRESS-INDUCING LINER(S) BETWEEN TRANSISTORS Non-Final OA GlobalFoundries U.S. Inc.
18178333 CAPACITOR INCLUDING LATERAL PLATES AND METHOD FOR FORMING A CAPACITOR Non-Final OA STMicroelectronics (Crolles 2) SAS
18238646 Bottom Layer Metal Interconnection Line Structure Non-Final OA Shanghai Huali Integrated Circuit Corporation
18230952 METHOD FOR MANUFACTURING AN INTEGRATED CIRCUIT AND CORRESPONDING INTEGRATED CIRCUIT Non-Final OA STMicroelectronics (Rousset) SAS
18170522 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE Final Rejection CHANGXIN MEMORY TECHNOLOGIES, INC.
18232868 RESISTIVE MEMORY ELEMENTS WITH A MULTIPLE-MATERIAL ELECTRODE Non-Final OA GlobalFoundries Singapore Pte. Ltd.
18177087 CAPACITOR STRUCTURES OF SEMICONDUCTOR DEVICES Non-Final OA GlobalFoundries Singapore Pte. Ltd.
18117911 SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS OF SEMICONDUCTOR STRUCTURES Final Rejection Semiconductor Manufacturing International (Shanghai) Corporation

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