Prosecution Insights
Last updated: April 19, 2026
Application No. 18/234,145

SHALLOW TRENCH ISOLATION RECESS CONTROL

Non-Final OA §102
Filed
Aug 15, 2023
Examiner
RAMIREZ, ALEXANDRE XAVIER
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Micron Technology, Inc.
OA Round
1 (Non-Final)
100%
Grant Probability
Favorable
1-2
OA Rounds
3y 6m
To Grant
99%
With Interview

Examiner Intelligence

Grants 100% — above average
100%
Career Allow Rate
18 granted / 18 resolved
+32.0% vs TC avg
Minimal +0% lift
Without
With
+0.0%
Interview Lift
resolved cases with interview
Typical timeline
3y 6m
Avg Prosecution
32 currently pending
Career history
50
Total Applications
across all art units

Statute-Specific Performance

§103
51.1%
+11.1% vs TC avg
§102
27.8%
-12.2% vs TC avg
§112
15.4%
-24.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 18 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election of claims 16-20 without traverse in the reply filed on 11/25/2025 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 16-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Hwang et al US 20150126013 A1. Hwang et al will be referenced to as Hwang henceforth. Regarding Claim 16, Hwang teaches: “A memory device comprising: a memory cell having a storage element ([0045], [0092], FIG. 3: a capacitor may be the storage element. The capacitor includes a storage node 221.) and an access device (transistor, [0046]: The transistor is not illustrated, but is connected to the first contact plug.); a data line contact coupled to the access device of the memory cell (first contact plug 207, [0043], [0088], FIG. 3); a cell contact coupled to the access device of the memory cell (first plug 210, [0089], FIG. 3: 210 is part of the second contact plug); a shallow trench isolation region adjacent to and contacting the data line contact (isolation layer 202, isolation layer 44, [0016], [0020], [0087], [0102], FIG. 3, FIG. 6D: FIG. 3 and FIG. 6D refer to the same embodiment. Therefore, 202 is the same as 44.); and a dielectric structure contacting the data line contact and the cell contact (first spacer 215, [0095], [0097]. 215 may be made of silicon nitride. Silicon nitride is a dielectric.), the dielectric structure on and contacting the shallow trench isolation region (FIG. 3) and separating the data line contact from the cell contact (FIG. 3: 215 is between 207 and 210.). ” PNG media_image1.png 696 704 media_image1.png Greyscale Regarding Claim 17, Hwang teaches: “The memory device of claim 16, wherein the dielectric structure is a non-oxide dielectric ([0097]: Silicon nitride does not include an oxide.).” Regarding Claim 18, Hwang teaches: “The memory device of claim 17, wherein the non-oxide dielectric includes one or more of a dielectric nitride or silicon carbide ([0097]: Silicon nitride is a dielectric nitride.).” Regarding Claim 19, Hwang teaches: “The memory device of claim 16, wherein the data line contact connects to a metallic data line (bit line 208, [0097], [0110], FIG. 3, FIG. 6D: 208 and 207 are in direct contact. The bit line may include a tungsten layer.).” Regarding Claim 20, Hwang teaches: “The memory device of claim 16, wherein the access device is a transistor and the storage element is a capacitor ([0045-0046], [0092], FIG. 3: a capacitor may be the storage element. The capacitor includes a storage node 221. The transistor is not illustrated, but is connected to the first contact plug.)” Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEXANDRE XAVIER RAMIREZ whose telephone number is (571)272-2715. The examiner can normally be reached Monday - Friday 8:30 AM to 6:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at (571) 270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ALEXANDRE X RAMIREZ/Examiner, Art Unit 2812 /William B Partridge/Supervisory Patent Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Aug 15, 2023
Application Filed
Jan 28, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
100%
Grant Probability
99%
With Interview (+0.0%)
3y 6m
Median Time to Grant
Low
PTA Risk
Based on 18 resolved cases by this examiner. Grant probability derived from career allow rate.

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