Prosecution Insights
Last updated: April 19, 2026
Application No. 18/255,975

RECESS ETCHING SOLUTION, RECESS ETCHING METHOD, AND SURFACE-TREATED SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD

Non-Final OA §102
Filed
Jun 05, 2023
Examiner
LU, JIONG-PING
Art Unit
1713
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Mitsubishi Gas Chemical Company Inc.
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2y 3m
To Grant
91%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allow Rate
779 granted / 935 resolved
+18.3% vs TC avg
Moderate +8% lift
Without
With
+7.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
54 currently pending
Career history
989
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
47.5%
+7.5% vs TC avg
§102
27.9%
-12.1% vs TC avg
§112
16.2%
-23.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 935 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Election/Restrictions Applicant’s election without traverse of claims 1-11 and 15-19 in the reply filed on January 16, 2026 is acknowledged. Claims 12-14 and 20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office Action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-11 and 15-19 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Wu et al. (US20100152086). Regarding claim 1, Wu discloses an etchant (a formulation for removing residue reads on an etchant, abstract) comprising: an organic acid (acetic acid, paragraph 0080); a nitrogen-containing heterocyclic compound and an organic solvent (1,2,4-triazole reads on a nitrogen-containing heterocyclic compound, glycerol reads on an organic solvent, paragraph 0080); and water (paragraph 0080). It is noted that claim 1 is drawn to a composition claim and the recitation of "recess etchant" in the preamble is considered as intended use of the claimed composition/function of the claimed composition. A composition claim covers what the composition is not what the composition does. See In re Spada, 911 F.2d 705, 708, 15 USPQ2d 1655, 1657 (Fed. Cir. 1990) ("The discovery of a new property or use of a previously known composition, even when that property and use are unobvious from prior art, can not impart patentability to claims to the known composition."); Titanium Metals Corp. of Am. v. Banner, 778 F.2d 775, 782, 227 USPQ 773, 778 (Fed. Cir. 1985) (intended use of an old composition does not render composition claim patentable); and In re Zierden, 56 C.C.P.A. 1223, 411 F.2d 1325, 1328, 162 USPQ 102, 104 (CCPA 1969) (" [M]ere statement of a new use for an otherwise old or obvious composition cannot render a claim to the composition patentable."). Regarding claim 2, Wu discloses both the nitrogen-containing heterocyclic compound and the organic solvent (1,2,4-triazole reads on the nitrogen-containing heterocyclic compound, glycerol reads on the organic solvent, paragraph 0080). Regarding claims 3 and 15, Wu discloses wherein the organic acid is an aliphatic carboxylic acid with 1-12 carbon atoms (acetic acid, paragraph 0080). Regarding claim 4, Wu discloses wherein the aromatic carboxylic acid is benzoic acid (paragraph 0084). Regarding claim 5, Wu discloses wherein the aliphatic carboxylic acid is acetic acid (paragraph 0080). Regarding claims 6 and 16, Wu discloses wherein the nitrogen-containing heterocyclic compound is a triazole (1,2,4-triazole, paragraph 0080). Regarding claim 7, Wu discloses wherein the nitrogen-containing heterocyclic compound is 1,2,4-triazole (paragraph 0080). Regarding claims 8 and 17, Wu discloses wherein the organic solvent is an organic solvents having an HLB (Hydrophile-Lipophile Balance) value of 3-15 (glycerol, paragraph 0080). Regarding claim 9, Wu discloses wherein the organic solvent is glycerol (paragraph 0080). Regarding claims 10 and 18, Wu discloses comprising: 1.05 mass % of the organic acid, 0.5 mass % of the nitrogen-containing heterocyclic compound, and 40 mass % of the organic solvent (paragraph 0080). Regarding claims 11 and 19, Wu discloses wherein the pH value is 4.84 (Example 30, Table 8). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JIONG-PING LU whose telephone number is (571) 270-1135. The examiner can normally be reached on M-F: 9:00am – 5:00pm. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua L Allen, can be reached at telephone number (571)270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from Patent Center. Status information for published applications may be obtained from Patent Center. Status information for unpublished applications is available through Patent Center for authorized users only. Should you have questions about access to Patent Center, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) Form at https://www.uspto.gov/patents/uspto-automated- interview-request-air-form. /JIONG-PING LU/ Primary Examiner, Art Unit 1713
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Prosecution Timeline

Jun 05, 2023
Application Filed
Feb 16, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12600909
ETCHING SOLUTION COMPOSITION
2y 5m to grant Granted Apr 14, 2026
Patent 12598929
ATOMIC LAYER ETCHING OF MOLYBDENUM
2y 5m to grant Granted Apr 07, 2026
Patent 12595413
SILICON NITRIDE ETCHING COMPOSITIONS AND METHOD
2y 5m to grant Granted Apr 07, 2026
Patent 12593637
CHEMICAL PLANARIZATION
2y 5m to grant Granted Mar 31, 2026
Patent 12578641
PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
2y 5m to grant Granted Mar 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
91%
With Interview (+7.9%)
2y 3m
Median Time to Grant
Low
PTA Risk
Based on 935 resolved cases by this examiner. Grant probability derived from career allow rate.

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