Prosecution Insights
Last updated: April 19, 2026
Application No. 18/268,800

RESIST UNDERLAYER FILM FORMATION COMPOSITION

Non-Final OA §102§103
Filed
Jun 21, 2023
Examiner
CHAMPION, RICHARD DAVID
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Nissan Chemical Corporation
OA Round
1 (Non-Final)
44%
Grant Probability
Moderate
1-2
OA Rounds
3y 7m
To Grant
55%
With Interview

Examiner Intelligence

Grants 44% of resolved cases
44%
Career Allow Rate
52 granted / 118 resolved
-20.9% vs TC avg
Moderate +11% lift
Without
With
+11.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 7m
Avg Prosecution
42 currently pending
Career history
160
Total Applications
across all art units

Statute-Specific Performance

§103
62.5%
+22.5% vs TC avg
§102
26.0%
-14.0% vs TC avg
§112
9.1%
-30.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 118 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 1. In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. 2. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: 3. A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. 4. Claims 1-5 and 7-12 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Endo et al. (United States Patent Publication no. US 2016/0068709 A1), hereinafter Endo. 5. Regarding Claims 1-5 and 7-12, Endo teaches (Paragraphs [0093-0116]) a reaction product between a compound of Formulae (1) or (2) of the present application and a compound of the following Formula (3) of the present application, therein phenyl-1-naphthylamine in Synthesis Examples 11-20 being a compound of Formula (2) of the present application, carbazole in Synthesis Examples 21 being a compound of Formula (1) of the present application, terephthalaldehyde in Synthesis Examples 11-19 and 21 being a compound of Formula (3) of the present application, glyoxal in Synthesis Example 20 being a compound of Formula (3) of the present application. Endo teaches (Paragraphs [0093-0116]) a solvent. Endo teaches (Paragraphs [0093-0116]) in Formulae (1) or (2), Ar1 and Ar2 are each a benzene ring, therein phenyl-1-naphthylamine in Synthesis Examples 11-20 being a compound of Formula (2) of the present application and carbazole in Synthesis Examples 21 being a compound of Formula (1) of the present application. Endo teaches (Paragraphs [0093-0116]) in Formula (1), R1 and R2 are each a hydrogen atom, therein carbazole in Synthesis Examples 21 being a compound of Formula (1) of the present application. Endo teaches (Paragraphs [0093-0116]) in Formula (3) of the present application, X is a single bond, or an unsaturated cyclic organic group having a carbon atom number of 1 to 6, therein terephthalaldehyde in Synthesis Examples 11-19 and 21 being a compound of Formula (3) of the present application and glyoxal in Synthesis Example 20 being a compound of Formula (3) of the present application. Endo teaches (Paragraphs [0093-0116]) in Formula (3) of the present application, X is a single bond, therein glyoxal in Synthesis Example 20 being a compound of Formula (3) of the present application. Endo teaches (Paragraphs [0093-0116]) a reaction product between a compound of Formulae (1) or (2) of the present application, an additional aromatic compound other than the compound of Formulae (1) or (2), and a compound of the following Formula (3) of the present application, therein phenyl-1-naphthylamine in Synthesis Examples 11-20 being a compound of Formula (2) of the present application, carbazole in Synthesis Examples 21 being a compound of Formula (1) of the present application, terephthalaldehyde in Synthesis Examples 11-19 and 21 being a compound of Formula (3) of the present application, glyoxal in Synthesis Example 20 being a compound of Formula (3) of the present application, and p-cresol in Synthesis Examples 11 and 21, 4-methylcatechol in Synthesis Example 12, 2,4-dimethylphenol in Synthesis Example 13, 2,5-dimethylphenol in Synthesis Examples 14 and 20, 2,6-dimethylphenol in Synthesis Example 15, 4-tert-butylphenyl in Synthesis Example 16, 4-phenylphenol in Synthesis Example 17, 4-benzylphenol in Synthesis Example 18, and 4-phenoxyphenol in Synthesis Example 19 being an additional aromatic compound other than the compound of Formulae (1) or (2) of the present application. Endo teaches (Paragraphs [0117-0127]) the composition further comprises a crosslinking agent, therein 3,3',5,5'-Tetrakis(methoxymethyl)-[1,1'-biphenyl]-4,4'-diol in Examples 1-11. Endo teaches (Paragraphs [0117-0127]) the composition further comprises an acid, therein pyridinium p-toluenesulfonate in Examples 1-11. Endo teaches (Paragraphs [0117-0127]) the solvent has a boiling point of 160o C or higher, therein propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate in Examples 1-11. Endo teaches (Paragraph [0136]) a resist underlayer film characterized by being a baked product of a coating film formed from the resist underlayer film-forming composition. Endo teaches (Paragraph [0136]) a step of forming, on a semiconductor substrate, a resist underlayer film from the resist underlayer film-forming composition. Endo teaches (Paragraph [0139]) a step of forming a resist film on the formed resist underlayer film. Endo teaches (Paragraph [0139]) a step of irradiating the formed resist film with light. Endo teaches (Paragraph [0139]) developing the resist film, to thereby form a resist pattern. Endo teaches (Paragraph [0139]) a step of etching the resist underlayer film with the formed resist pattern, to thereby form a pattern on the resist underlayer film. Endo teaches (Paragraph [0139]) a step of processing the semiconductor substrate with the patterned resist underlayer film. Claim Rejections - 35 USC § 103 6. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: 7. A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 8. Claim 6 is rejected under 35 U.S.C. 103 as being unpatentable by Endo et al. (United States Patent Publication no. US 2016/0068709 A1), hereinafter Endo. 9. Regarding Claim 6, Endo teaches all limitations of Claim 1 above. However, Endo fails to explicitly teach a reaction product between two or more compounds of Formulae (l) or (2) of the present application and a compound of Formula (3) of the present application. Endo teaches (Paragraphs [0093-0116]) both a reactant within the scope of Formula (2) of the present application, therein phenyl-1-naphthylamine in Synthesis Examples 11, and a reactant within the scope of Formula (1) of the present application, therein carbazole in Synthesis Example 21, wherein all other reactants and solvents are the same. It would have been prima facie obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have modified Endo to have, at minimum, a content of both phenyl-1-naphthylamine and carbazole being utilized to form a reaction product. Doing so would involve merely combining prior art elements according to known methods to yield predictable results. One of ordinary skill in the art could have combined the elements, phenyl-1-naphthylamine in Synthesis Example 11 and carbazole in Synthesis Example 21, by known methods, and that in combination, each element merely performs the same function as it does separately. One of ordinary skill in the art would have recognized that the results of the combination were predictable as both Synthesis Example 11 and Synthesis Example 21 of Endo produce functional underlayer films, See Table 3 of Endo. Conclusion 10. Any inquiry concerning this communication should be directed to RICHARD D CHAMPION at telephone number (571) 272-0750. The examiner can normally be reached on 8 a.m. - 5 p.m. Mon-Fri EST. 11. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, MARK F HUFF can be reached at (571) 272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. 12. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). 13. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /R.D.C./Examiner, Art Unit 1737 /MARK F. HUFF/Supervisory Patent Examiner, Art Unit 1737
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Prosecution Timeline

Jun 21, 2023
Application Filed
Jan 08, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
44%
Grant Probability
55%
With Interview (+11.2%)
3y 7m
Median Time to Grant
Low
PTA Risk
Based on 118 resolved cases by this examiner. Grant probability derived from career allow rate.

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