Prosecution Insights
Last updated: April 19, 2026
Application No. 18/283,216

Display Panel, Display Device, and Mask

Non-Final OA §112
Filed
Sep 21, 2023
Examiner
VU, DAVID
Art Unit
2818
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
BOE TECHNOLOGY GROUP CO., LTD.
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
96%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
564 granted / 734 resolved
+8.8% vs TC avg
Strong +19% interview lift
Without
With
+18.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
21 currently pending
Career history
755
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
51.9%
+11.9% vs TC avg
§102
34.4%
-5.6% vs TC avg
§112
9.1%
-30.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 734 resolved cases

Office Action

§112
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Claim Objections Claim 1 is objected to because of the following informalities: Independent claim 1 should not be written as a long sentence. The examiner offers the following partial suggestion using semi-colons to clearly establish what is included and excluded (beginning and end) by the alternative language of the claim (as shown below): “(Currently Amended) A display panel, comprising: a base substrate; a plurality of island regions which are disposed on the base substrate and are spaced apart from each other; hole regions disposed between adjacent island regions and bridge regions connecting adjacent island regions, each of the island regions comprises a structural film layer disposed on the base substrate; a cathode disposed on a side of the structural film layer away from the base substrate, the structural film layer comprises at least one effective light emitting region and at least one lapping region, the cathode comprises at least one cathode part and at least one lapping part, wherein an orthographic projection of the at least one cathode part on the base substrate is overlapped with an orthographic projection of the at least one effective light emitting region on the base substrate; and an orthographic projection of the at least one lapping part on the base substrate is overlapped with an orthographic projection of the at least one lapping region on the base substrate”. These are examiner suggested ways to correct the language but are not limited. The applicant should make sure that the claim language is grammatically correct and to avoid antecedent basis issues. Appropriate correction is required. Claim Rejections - 35 USC §112 2. Claims 1-5, 7-9 and 13 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor, or for pre-AIA the applicant regards as the invention. Claim 1: *The limitation “island regions” (lines 3, 4) lacks antecedent basis as the claim does not previously or positively recite “island regions”. Note that Claim 1 recited the limitation “a plurality of island regions”. Claim 2 recited the limitation " the lapping part ". There is insufficient antecedent basis for this limitation in the claim. Claim 3 recited the limitations "the first cathode part", "the second cathode part", and “the lapping part”. There are insufficient antecedent basis for these limitations in the claim. *The Examiner suggests re-writing the limitation of “one first cathode part, one second cathode part and one lapping part” to “a first cathode part, a second cathode part and a lapping part”. Claim 4 recited the limitation “the lapping part”. There is insufficient antecedent basis for this limitation in the claim. Claim 5 recited the limitation “the lapping part”. There is insufficient antecedent basis for this limitation in the claim. Claim 7 recited the limitations "the first cathode part", and "the second cathode part”. There are insufficient antecedent basis for these limitations in the claim. Claim 8 recited the limitations "the first cathode part", "the second cathode part", "the third cathode part", "the fourth cathode part", and “the lapping part”. There are insufficient antecedent basis for these limitations in the claim. *The Examiner suggests re-writing the limitation of “one first cathode part, one second cathode part, one third cathode part, one fourth cathode part, and one lapping part” to “a first cathode part, a second cathode part, a third cathode part, a fourth cathode part, and a lapping part”. Claim 9 recited the limitation “the lapping part”. There is insufficient antecedent basis for this limitation in the claim. Claim 13 recited the limitations "the first cathode part", "the second cathode part", "the third cathode part", and "the fourth cathode part". There are insufficient antecedent basis for these limitations in the claim. Claims 6, 10-12 & 14-20 are also rejected based on their dependency from claim 1. Conclusion 3. Any inquiry concerning this communication or earlier communications from the examiner should be directed to David Vu whose telephone number is (571) 272-1798. The examiner can normally be reached on Monday-Friday from 8:00am to 5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempt to reach the examiner by telephone are unsuccessful, the examiner's supervisor, Steven Loke H can be reached on (571) 272-1657. The fax phone number for the organization where this application or proceeding is assigned is (571) 273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID VU/ Primary Examiner, Art Unit 2818
Read full office action

Prosecution Timeline

Sep 21, 2023
Application Filed
Feb 05, 2026
Non-Final Rejection — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12598798
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
2y 5m to grant Granted Apr 07, 2026
Patent 12588214
INTEGRATED CIRCUIT DEVICE AND METHOD FOR FABRICATING THE SAME
2y 5m to grant Granted Mar 24, 2026
Patent 12588215
NON-VOLATILE MEMORY DEVICE HAVING SCHOTTKY DIODE
2y 5m to grant Granted Mar 24, 2026
Patent 12581714
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOF
2y 5m to grant Granted Mar 17, 2026
Patent 12571123
GALLIUM NITRIDE CRYSTAL, GALLIUM NITRIDE SUBSTRATE, AND METHOD FOR PRODUCING GALLIUM NITRIDE SUBSTRATE
2y 5m to grant Granted Mar 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
96%
With Interview (+18.7%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 734 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month