Prosecution Insights
Last updated: October 25, 2026
Application No. 18/288,502

METHOD FOR PRODUCING COPPER COMPOSITE STRUCTURE, AND ENERGY STORAGE DEVICE AND SUBSTRATE STRUCTURE FOR RAMAN SCATTERING INCLUDING COPPER COMPOSITE STRUCTURE PRODUCED THEREBY

Non-Final OA §102§103
Filed
Oct 26, 2023
Priority
May 12, 2021 — RE 10-2021-0061126 +1 more
Examiner
LOUIE, MANDY C
Art Unit
Tech Center
Assignee
Ajou University Industry-Academic Cooperation Foundation
OA Round
1 (Non-Final)
48%
Grant Probability
Moderate
1-2
OA Rounds
10m
Est. Remaining
77%
With Interview

Examiner Intelligence

Grants 48% of resolved cases
48%
Career Allowance Rate
262 granted / 546 resolved
-12.0% vs TC avg
Strong +29% interview lift
Without
With
+29.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 10m
Avg Prosecution
25 currently pending
Career history
574
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
50.0%
+10.0% vs TC avg
§102
9.4%
-30.6% vs TC avg
§112
23.4%
-16.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 546 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, claims 1-6 in the reply filed on 07/20/26 is acknowledged. Claim Rejections - 35 USC § 102/103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 1-4 is/are rejected under 35 U.S.C. 102(a1) as anticipated by or, in the alternative, under 35 U.S.C. 103 as obvious over Kohl [US 20080073795]. Claim 1: Kohl teaches a method for forming an integrated circuit [abstract] where the method comprises producing a copper composite structure [0006], and the first step of forming a pillar copper structure [0011], and a second step of annealing the copper pillar structure under a nitrogen atmosphere [0011]. Claim 2: Kohl teaches the copper pillar structure is made of copper [0006]. Claim 3: Kohl teaches the copper pillar structure is formed by forming a template having a hole defined there, and plating copper so as to fill the hold via electroplating (molds) [0038; 0043] or electroless plating [0010-0011]. Claim 4: Kohl teaches annealing temperatures can be low temperatures that are appropriate for epoxy boards [0024], but also teaches the annealing can occur in other environments and other temperatures [0052] such as about 400 degrees C [0058]. Claim(s) 5 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kohl as applied to claim 4 above, and further in view of Chen [US 20070003698]. Teaching of the prior art is aforementioned, but does not appear to teach the limitations of claim 5. Chen is provided. Claim 5: Chen teaches a method of forming a copper growth for interconnects [title] wherein a copper pillar can be annealed at a temperature of 100-400 degrees C [0087] and 10 minutes to 1 hours or about 30 minutes [0087] and under the pressure of 2-10 Torr [0087] where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. (See MPEP 2144.05.I). It would have been obvious to one of ordinary skill in the art to anneal under the claimed annealing conditions since Chen teaches these are operable and known ranges for annealing post copper deposition interconnects. Claim(s) 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kohl as applied to claim 1 above, and further in view of Chandler [Rationally 3D-textured copper surfaces for Laplace pressure imbalance-induced enhancement in dropwise condensation]. Teaching of the prior art is aforementioned, but does not appear to teach the limitations of claim 6. Chandler is provided. Claim 6: Chander teaches 3-D texture comprising a copper surfaces having a hybrid structure of microscale size and fine protrusions of nanoscale size formed on the copper surfaces [abstract; Fig. 1]. It would have been obvious to one of ordinary skill in the art to provide a hybrid structure for the taught copper pillar structure because Chander teaches this 3-D textured structure allows for enhanced heat transfer [abstract]. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MANDY C LOUIE whose telephone number is (571)270-5353. The examiner can normally be reached Monday to Friday 1:00PM to 4:00PM PT. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Timothy Meeks can be reached at (571)272-1423. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MANDY C LOUIE/Primary Examiner, Art Unit 1718
Read full office action

Prosecution Timeline

Oct 26, 2023
Application Filed
Oct 06, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12760424
LASER CLEAN AFTER DIFFUSION HEAT TREAT AND PRIOR TO SHOT PEEN
2y 3m to grant Granted Oct 13, 2026
Patent 12753510
CALORIMETRY METHOD TO MEASURE CHEMICAL REACTION HEAT IN ALD/ALE PROCESSES USING TEMPERATURE-SENSITIVE RESISTANCE COATINGS
4y 0m to grant Granted Oct 06, 2026
Patent 12753497
METHOD OF FORMING A LAYER BY ALD
2y 3m to grant Granted Oct 06, 2026
Patent 12729433
PRECOAT METHOD FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
2y 9m to grant Granted Sep 08, 2026
Patent 12729428
SUBSTRATE TREATMENT METHOD
2y 1m to grant Granted Sep 08, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
48%
Grant Probability
77%
With Interview (+29.1%)
3y 10m (~10m remaining)
Median Time to Grant
Low
PTA Risk
Based on 546 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month