Listed by the USPTO as LOUIE, MANDY C
Tech Center 3700 • Art Units: 1715 1718 1724 1731 1759 1792 2893 3752
This examiner grants 48% of resolved cases
LOUIE, MANDY C is assigned to tech center 3700 and art unit 1715. The record contains 546 resolved cases and a 48.0% allowance rate. The median time to allowance is 1,397 days, giving practitioners a substantial timing benchmark for applications handled in this record.
The interview lift is 29.1%, showing a meaningful interview-associated change alongside an allowance rate below one-half of resolved cases. The listed companies are Applied Materials Inc., ASM IP Holding B.V., and Tokyo Electron Limited. The listed firms are Goodhue, Coleman & Owens, P.C., Snell & Wilmer (ASM IP Holding B.V.), and Ascenda Law Group, PC. This profile supports deliberate interview preparation and careful claim development, especially where applicants need to distinguish the invention while managing an extended prosecution timeline.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19075175 | METHOD OF DEPOSITING SILICON NITRIDE THIN FILM IN TRENCH OF SUBSTRATE | Final Rejection | ASM IP Holding B.V. |
| 18755620 | MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS, AND COMPUTER PROGRAM PRODUCTS FOR CONTROLLING THICKNESS OF PRECOAT MATERIAL LAYERS IN SEMICONDUCTOR PROCESSING SYSTEMS | Final Rejection | ASM IP Holding B.V. |
| 19092114 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM | Non-Final OA | Tokyo Electron Limited |
| 19082337 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18263920 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18946807 | MULTILAYER COATING FOR CORROSION RESISTANCE | Final Rejection | Applied Materials, Inc. |
| 17903892 | CONTROLLED DELIVERY OF LOW-VAPOR-PRESSURE PRECURSOR INTO A CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 17891753 | CONFORMAL MOLYBDENUM DEPOSITION | Final Rejection | Applied Materials, Inc. |
| 17050906 | METHOD FOR PREPARING SILVER NANOPARTICLES STABILIZED WITH TETRAOCTYLAMMONIUM, AND METHOD FOR PRODUCING ELECTRICALLY CONDUCTIVE THIN FILM BY USING SILVER NANOPARTICLES PREPARED BY SAME | Final Rejection | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
| 18794561 | ION IMPLANTATION METHOD AND RELATED SYSTEMS | Non-Final OA | ENTEGRIS, INC. |
| 18529482 | PASSIVATION METHOD AND HEAT TREATMENT APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18721192 | VAPOR DEPOSITION SYSTEMS AND METHODS, AND NANOMATERIALS FORMED BY VAPOR DEPOSITION | Non-Final OA | UNIVERSITY OF MARYLAND, COLLEGE PARK |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy48.0% of resolved applications examined by Mandy C Louie were allowed (546 resolved cases), compared with 51.6% across Art Unit 1715 over the last five years.
This examiner's interview lift is +29.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Mandy C Louie took 1,397 days on average from filing to allowance.
Mandy C Louie examines applications in Art Unit 1715 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
