Prosecution Insights
Last updated: October 16, 2026
Application No. 18/316,379

RADIATION DETECTION ELEMENT, RADIATION DETECTION APPARATUS, X-RAY CT APPARATUS, AND MANUFACTURING METHOD OF RADIATION DETECTION ELEMENT

Non-Final OA §103
Filed
May 12, 2023
Priority
Mar 07, 2023 — JP 2023-034571
Examiner
ARROYO, TERESA M
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Canon Inc.
OA Round
3 (Non-Final)
72%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 72% — above average
72%
Career Allowance Rate
362 granted / 503 resolved
+4.0% vs TC avg
Strong +23% interview lift
Without
With
+23.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
53 currently pending
Career history
565
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
57.3%
+17.3% vs TC avg
§102
18.1%
-21.9% vs TC avg
§112
19.8%
-20.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 503 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 7/27/26 has been entered. Election/Restrictions Claims 8-17 is/are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 9/17/25. Response to Arguments Applicant’s arguments with respect to claim(s) 1, 2, 5-7 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 1, 2, 5, 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent No. 8,063,378 (Bolotnikov) in view of U.S. Patent No. 7,223,982 (Chen). Bolotnikov discloses (at least Fig. 3B) 1. (Currently Amended) A radiation detection element comprising: a single-crystal semiconductor substrate 310 configured to convert incident radiation into an electric charge (any substrate can be “configured” to perform this type of conversion); a first electrode 330 provided on a first main surface 332 of the single-crystal semiconductor substrate 310, the first electrode 330 having a first thickness; a second electrode 334 provided directly on and in contact with a side surface 312 / 336 of the single-crystal semiconductor substrate 310, without an insulating layer interposed between the second cathode electrode 350 and the side surface 312 / 336; and an anode electrode 350 provided on a second main surface 352 of the single-crystal semiconductor substrate 310, the second main surface 352 being on an opposite side of the first main surface 332. Bolotkinov fails to explicitly disclose the second electrode having a second thickness that is smaller than the first thickness. Chen teaches (at least Fig. 13) A radiation detection element comprising: a cathode electrode 21 on a top surface (first electrode) and a side surface (second electrode) of a single-crystal semiconductor substrate 3; and an anode electrode 23 on a bottom surface of the semiconductor substrate 3, the second electrode having a second thickness that is smaller than the first thickness (column 13, lines 21-62). It would have been obvious to a person of ordinary skill in the art before the effective filing date of the claimed invention to provide a semiconductor substrate having a cathode electrode with a side thickness smaller than the top thickness in Bolotkinov. The motivation would be to provide enhanced electric field focusing impacting both edge and next closest inner pixels, reduced surface leakage from tile edges, and also reduced pixel and device variability and improved yields as taught by Chen (column 14, lines 24-35). Chen teaches (Summary) 2. The radiation detection element according to claim 1, wherein the first cathode electrode (top) and the second cathode electrode (side) are integrated (continuous). Bolotnikov discloses (column 4, lines 36-46) 5. The radiation detection element according to claim 1, wherein the single-crystal semiconductor substrate 310 includes cadmium telluride. Bolotnikov discloses (column 4, lines 36-46) 6. The radiation detection element according to claim 1, wherein the single-crystal semiconductor substrate 310 includes cadmium zinc telluride. Claim(s) 7 is/are rejected under 35 U.S.C. 103 as being unpatentable over Bolotnikov in view of Chen as applied to claim 1 above, and further in view of U.S. Patent No. 8,344,331 (Call). The combination of references fails to teach 7. The radiation detection element according to claim 1, wherein the single-crystal semiconductor substrate includes any of cadmium tungstate, sodium iodide, and cesium iodide. Call teaches ([column 4, lines 54-63]) A radiation detection element comprising: wherein the single-crystal semiconductor substrate 14 includes any of cadmium tungstate, sodium iodide, and cesium iodide. It would have been obvious to a person of ordinary skill in the art before the effective filing date of the claimed invention to provide select the optimum material in the modified device of Bolotnikov. The motivation would be based on its suitability for the intended use as discussed in Call. See MPEP 2144.07. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. U.S. Patent Application Publication Nos. 2008/0224055 (Nariyuki), 2010/0084730 (Bui), and U.S. Patent No. 7,955,992 (Chen) teach a radiation detector element having one cathode electrode thicker than another cathode electrode. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TERESA M ARROYO whose telephone number is (703)756-1576. The examiner can normally be reached Monday - Friday (8:30 A.M. E.T. - 5:00 P.M. E.T.). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached at 571.272.1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TERESA M. ARROYO/ Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

May 12, 2023
Application Filed
Oct 28, 2025
Non-Final Rejection mailed — §103
Feb 23, 2026
Response Filed
Jun 01, 2026
Final Rejection mailed — §103
Jul 27, 2026
Response after Non-Final Action
Aug 14, 2026
Request for Continued Examination
Aug 17, 2026
Response after Non-Final Action
Aug 26, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12707619
STATIC RANDOM ACCESS MEMORY WITH PRE-CHARGE CIRCUIT
5y 7m to grant Granted Aug 11, 2026
Patent 12708058
SEMICONDUCTOR DEVICE
3y 4m to grant Granted Aug 11, 2026
Patent 12696774
SEMICONDUCTOR DEVICE AND CONTROL SYSTEM
3y 3m to grant Granted Jul 28, 2026
Patent 12690503
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
3y 7m to grant Granted Jul 21, 2026
Patent 12690484
BONDING PAD STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
3y 2m to grant Granted Jul 21, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
72%
Grant Probability
95%
With Interview (+23.2%)
3y 0m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 503 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month