Office Action Predictor
Last updated: April 15, 2026
Application No. 18/336,207

DEPOSITION APPARATUS AND DEPOSITION METHOD USING SAME

Non-Final OA §112
Filed
Jun 16, 2023
Examiner
PROCTOR, CACHET I
Art Unit
1712
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Samsung Display Co., LTD.
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
3y 0m
To Grant
78%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
814 granted / 1058 resolved
+11.9% vs TC avg
Minimal +1% lift
Without
With
+0.7%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
25 currently pending
Career history
1083
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
47.7%
+7.7% vs TC avg
§102
24.4%
-15.6% vs TC avg
§112
20.5%
-19.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1058 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 13-20 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 13 recites “moving the frame with a measurement value.” The phrase “measurement value” fails to clearly identify what physical quantity is being measured (e.g. displacement, tilt, curvature),because the claim does not specify what is being measured or how the value relates to the movement of the frame, the scope of the claim cannot be determined with reasonable certainty. Claim 14 recited “pushing the frame in a first direction that is parallel with the ground according to a value.” The term “a value” is vague and does not specify what the value represents or how the value controls the direction or magnitude of the pushing. As a result, the metes and bounds of claim 14 are unclear. Claim 20 recites the limitation “a deposition pixel position accuracy (PPA) distortion is induced in a direction that is opposite a direction in which the deposition PPA is distorted” fails to specify the physical basis for the direction of the distortion. The meaning of “opposite direction” cannot be determined with reasonable certainty. Claim 20 does not define PPA distortion, it is unclear whether the distortion refers to substrate motion, mask sagging, substrate warpage, or deposition misalignment. Claims 15-18 are included in the rejection since they depend from claim 13. Allowable Subject Matter Claims 1-12 are allowed. Claim 13 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action. Claims 14 and 20 would be allowable if rewritten to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action and to include all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Kim et al. (KR 20130009601) discloses a deposition apparatus comprising a deposition source (390 of Fig. 2); a deposition portion that faces the deposition source (see 10, 20, 310, 311, 320, 330, and 340 of Fig. 2) that is disposed at an angle of 1 to 10 degrees with respect to a reference line perpendicular to the ground; see 0089 of the translation). The deposition portion comprises a frame (20-substrate tray of Fig. 2) comprising a frame (20, substrate tray of Fig. 2) and rollers (311) which support the substrate that is connected to a tilting unit which tilts the deposition portion (see Fig. 2). PNG media_image1.png 448 794 media_image1.png Greyscale Kim fails to teach or suggest a deposition apparatus that comprises a deposition portion having a frame with an opening; a substrate disposed on the first side of the frame and a plurality of back stages disposed on a second side opposite of the first side of the fame, and the frame moves by movement of the plurality of back stages. Ogata et al. (US 2020/0220114) discloses a film forming apparatus comprising a deposition source (3- supply unit of Fig. 1) and a deposition portion facing the deposition source (see 2 of Fig 1). The deposition portion comprising a frame (substrate frame 2 of Fig. 1) where the substrate is placed on a first side and a back stage (14b) form moving the substrate holder (see 0048). PNG media_image2.png 558 530 media_image2.png Greyscale Ogata et al. fails to teach a deposition apparatus that comprises a deposition portion having a frame with an opening; a substrate disposed on the first side of the frame and a plurality of back stages disposed on a second side opposite of the first side of the fame, and the frame moves by movement of the plurality of back stages. White et al. (US 2016/0043319) discloses a fine metal mask with local actuators used to adjust mask deformation by stretching or repositioning the mask to maintain the position and size of the mask relative to the substrate. Kawato et al. (WO2013183374) discloses a vapor deposition device comprising a deposition source, and a substrate support having pins (see 101 of Fig. 9) which holds the substrate with a slight bend allowing the substrate holder to attract to the substrate without any distortion or stress. As to claims 1 and 13, the cited prior art fails to teach or suggest the combination of a deposition apparatus comprising a deposition source and a deposition portion where the deposition portion is disposed at an angle of 4 to 14 degrees with respect to a vertical reference line perpendicular to the ground where the deposition portion includes a frame having an opening and an outer portion around the opening; a substrate disposed on one side of the frame and back stages disposed on a second side of the frame and the frame moves by movement of the plurality of back stages. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Cachet I Proctor whose telephone number is (571)272-0691. The examiner can normally be reached Monday-Friday 8-4:30 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at 571-272-5166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CACHET I. PROCTOR/ Examiner Art Unit 1715 /CACHET I PROCTOR/ Primary Examiner, Art Unit 1715
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Prosecution Timeline

Jun 16, 2023
Application Filed
Nov 15, 2025
Non-Final Rejection — §112
Feb 10, 2026
Applicant Interview (Telephonic)
Feb 11, 2026
Examiner Interview Summary
Feb 23, 2026
Response Filed

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
78%
With Interview (+0.7%)
3y 0m
Median Time to Grant
Low
PTA Risk
Based on 1058 resolved cases by this examiner. Grant probability derived from career allow rate.

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