Prosecution Insights
Last updated: October 02, 2026
Application No. 18/342,103

MANUFACTURING METHOD OF SUBSTRATE

Non-Final OA §102
Filed
Jun 27, 2023
Priority
Jul 05, 2022 — JP 2022-108098
Examiner
COLLINS, DANIEL S.
Art Unit
3745
Tech Center
3700 — Mechanical Engineering & Manufacturing
Assignee
DISCO Corporation
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
524 granted / 615 resolved
+15.2% vs TC avg
Moderate +9% lift
Without
With
+9.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
29 currently pending
Career history
653
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
44.1%
+4.1% vs TC avg
§102
30.6%
-9.4% vs TC avg
§112
19.9%
-20.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 615 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Information Disclosure Statement The information disclosure statements filed 6/7/24 and 6/15/26 are in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statements are being considered by the examiner. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Hirata, Taiwanese Patent Publication TW201705258A. In Reference to Claim 1: Hirata discloses A manufacturing method (See, Paragraphs [0020-0056]) of a substrate (27) by which the substrate is manufactured from an ingot (11) composed of a single-crystal material, the manufacturing method comprising: a separation layer forming step (9) of forming separation layers including modified parts and cracks (23) that extend from the modified parts inside the ingot by executing irradiation with a laser beam with such a wavelength as to be transmitted through the single-crystal material from a side of a front surface (11a See, Figure 3-6); and a splitting-off step of splitting (Step 10) off the substrate from the ingot with use of the separation layers as a point of origin, wherein, in the separation layer forming step, the separation layers are formed by relatively moving the ingot and a plurality of focal points along a second direction parallel to each of the front surface and a specific crystal plane of the single-crystal material in a state in which the laser beam is split in such a manner that the plurality of focal points (P) that line up along a first direction that is non-parallel to the front surface and is parallel (second direction X) to the specific crystal plane are formed. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. CN11986986 discloses a method of manufacturing a wafer from an ingot. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DANIEL S. COLLINS whose telephone number is (313)446-6535. The examiner can normally be reached M-TH 8:00-5:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Nathaniel Wiehe can be reached at (571) 272-4648. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DANIEL S COLLINS/Examiner, Art Unit 3745 /NATHANIEL E WIEHE/Supervisory Patent Examiner, Art Unit 3745
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Prosecution Timeline

Jun 27, 2023
Application Filed
Sep 11, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+9.4%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 615 resolved cases by this examiner. Grant probability derived from career allowance rate.

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