DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
The applicant's election of Group I, claims 1-15, in their reply dated 3/2/2026 is acknowledged. Claims 16-21 have been withdrawn. Claims 1-15 are considered on the merits below.
Because applicant did not distinctly and specifically point out the supposed errors in the restriction requirement, the election has been treated as an election without traverse (MPEP § 818.01(a)).
Information Disclosure Statement
The Information Disclosure Statements filed on 6/29/2023 and 11/2/2023 are in compliance with the provisions of 37 CFR 1.97 and have been considered. An initialed copy of the Form 1449 is enclosed herewith.
Claim Rejections - 35 USC § 102
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
Claim(s) 1, 3-11, and 13-15 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Merkel et al. (US 2020/0025670 A1).
Regarding claim 1, Merkel describes a nanoimprint lithography (NIL) resin composition (figure 3 and [0138] “nanoimprint lithography”), comprising:
a total of three monomers ([0095] “one or more different cage or
core structures as monomeric units.”), wherein:
two of the three monomers are selected from the group consisting of: two different epoxy substituted silsesquioxane monomers; two different epoxy substituted cyclosiloxane monomers; and two different non-organosilicon epoxy monomers ([0010] “the epoxy resin matrix includes a combination of two epoxy functionalized polyhedral oligomeric silsesquioxanes,”); and
a third of the three monomers is a fluorinated monomer that is present in an amount ranging from about from 0.5 mass% to about 4 mass%, based on a total solids content of the NIL resin composition ([0105] “the resin composition also include a photoacid generator (PAG)” and [0106] “…hexafluorophosphate salts…hexafluoroantimonate salts… triflate…” and [0107] “Examples of the first resin composition may be made by mixing the epoxy resin matrix with the free radical photoinitiator and the photoacid generator. In an example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 99.8:0.2 to 90:10. In another example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 98:2 to 95:5”);
a photoinitiator ([0011] “free radical photoinitiator”); and
a solvent ([0109] “the photoinitiator and the photoacid generator) may be diluted in a suitable solvent”).
Regarding claim 3, Merkel describes the NIL resin composition as defined in claim 1, wherein: the two of the three monomers are the two different epoxy substituted silsesquioxane monomers; and the two different epoxy substituted silsesquioxane monomers consist of epoxycyclohexylethyl polysilsesquioxane and glycidyl polysilsesquioxane ([0009] “the epoxy resin matrix comprises an epoxy material selected from the group consisting of an epoxy functionalized polyhedral oligomeric silsesquioxane; trimethylolpropane triglycidyl ether; tetrakis ( epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof.”).
Regarding claim 4, Merkel describes the NIL resin composition as defined in claim 3, wherein the two different epoxy substituted silsesquioxane monomers are present at a mass ratio ranging from about 3:7 to about 7:3 ([0097] “In other examples, R1 through Rs or R10 or R12 are the same, and thus each of R1 through Rs or R10 or R12 comprises an epoxy group. In still other examples, R1 through Rs or R10 or R12 are not the same, and thus at least one of R1 through Rs or R10 or R12 comprises epoxy and at least one other of R1 through Rs or R10 or R1 1s a non-epoxy functional group, which m some cases is selected from the group consisting of an azide/azido, a thiol, a poly(ethylene glycol), a norbornene, and a tetrazine, or further, for example, alkyl, aryl, alkoxy, and haloalkyl groups. In some aspects, the non-epoxy functional group is selected to increase the surface energy of the resin. In these other examples, the ratio of epoxy groups to non-epoxy groups ranges from 7:1 to 1:7, or 9:1 to 1:9, or 11: 1 to 1: 11. In any of the examples, disubstituted or monosubstituted (terminal) epoxy group(s) allow the monomeric unit to polymerize into a cross-linked matrix upon initiation using ultraviolet (UV) light and an acid. In some aspects, the epoxy POSS comprises terminal epoxy groups.”).
Regarding claim 5, Merkel describes the NIL resin composition as defined in claim 1, wherein: the two of the three monomers are the two different epoxy substituted cyclosiloxane monomers; and the two different epoxy substituted cyclosiloxane monomers consist of epoxycyclohexyl tetramethylcyclotetrasiloxane and glycidyl cyclotetrasiloxane ([0009] “the epoxy resin matrix comprises an epoxy material selected from the group consisting of an epoxy functionalized polyhedral oligomeric silsesquioxane; trimethylolpropane triglycidyl ether; tetrakis ( epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof.”).
Regarding claim 6, Merkel describes the NIL resin composition as defined in claim 5, wherein the two different epoxy substituted cyclosiloxane monomers are present at a mass ratio ranging from about 3:7 to about 7:3 ([0097] “In other examples, R1 through Rs or R10 or R12 are the same, and thus each of R1 through Rs or R10 or R12 comprises an epoxy group. In still other examples, R1 through Rs or R10 or R12 are not the same, and thus at least one of R1 through Rs or R10 or R12 comprises epoxy and at least one other of R1 through Rs or R10 or R1 1s a non-epoxy functional group, which m some cases is selected from the group consisting of an azide/azido, a thiol, a poly(ethylene glycol), a norbornene, and a tetrazine, or further, for example, alkyl, aryl, alkoxy, and haloalkyl groups. In some aspects, the non-epoxy functional group is selected to increase the surface energy of the resin. In these other examples, the ratio of epoxy groups to non-epoxy groups ranges from 7:1 to 1:7, or 9:1 to 1:9, or 11: 1 to 1: 11. In any of the examples, disubstituted or monosubstituted (terminal) epoxy group(s) allow the monomeric unit to polymerize into a cross-linked matrix upon initiation using ultraviolet (UV) light and an acid. In some aspects, the epoxy POSS comprises terminal epoxy groups.”).
Regarding claim 7, Merkel describes the NIL resin composition as defined in claim 1, wherein: the two of the three monomers are the two different non-organosilicon epoxy monomers; and the two different non-organosilicon epoxy monomers are independently selected from the group consisting of trimethylolpropane triglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclo-hexanecarboxylate, bis((3,4-epoxycyclohexyl)methyl) adipate, 4-vinyl-1-cyclohexene 1,2-epoxide, vinylcyclohexene dioxide, 4,5-epoxytetrahydrophthalic acid diglycidylester, 1,2-epoxy-3-phenoxypropane, glycidyl methacrylate, 1,2-epoxyhexadecane, poly(ethylene glycol) diglycidylether, pentaerythritol glycidyl ether, diglycidyl 1,2-cyclohexanedicarboxylate, tetrahydrophthalic acid diglycidyl ester, 1,2-epoxy-3-phenoxypropane, and glycidyl methacrylate ([0208] “Seven examples of the resin compositions were prepared. Each example included a different epoxy resin matrix, which included glycidyl functionalized POSS; epoxycyclohexyl ethyl functionalized POSS; trimethylolpropane triglycidyl ether; tetrakis( epoxycyclohexyl ethyl) tetramethyl cyclotetrasiloxane; a copolymer of ( epoxycyclohexylethyl) methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; or 1,3-bis(glycidoxypropyl)tetramethyl disiloxane”).
Regarding claim 8, Merkel describes The NIL resin composition as defined in claim 7, wherein the two different non-organosilicon epoxy monomers are present at a mass ratio ranging from about 4:1 to about 1:4 ([0097] “In other examples, R1 through Rs or R10 or R12 are the same, and thus each of R1 through Rs or R10 or R12 comprises an epoxy group. In still other examples, R1 through Rs or R10 or R12 are not the same, and thus at least one of R1 through Rs or R10 or R12 comprises epoxy and at least one other of R1 through Rs or R10 or R1 1s a non-epoxy functional group, which m some cases is selected from the group consisting of an azide/azido, a thiol, a poly(ethylene glycol), a norbornene, and a tetrazine, or further, for example, alkyl, aryl, alkoxy, and haloalkyl groups. In some aspects, the non-epoxy functional group is selected to increase the surface energy of the resin. In these other examples, the ratio of epoxy groups to non-epoxy groups ranges from 7:1 to 1:7, or 9:1 to 1:9, or 11: 1 to 1: 11. In any of the examples, disubstituted or monosubstituted (terminal) epoxy group(s) allow the monomeric unit to polymerize into a cross-linked matrix upon initiation using ultraviolet (UV) light and an acid. In some aspects, the epoxy POSS comprises terminal epoxy groups.”)..
Regarding claim 9, Merkel describes the NIL resin composition as defined in claim 1, wherein the photoinitiator is selected from the group consisting of a free radical photoinitiator, a cationic photoinitiator, and combinations thereof ([0105] “the resin composition also include a photoacid generator (PAG)” and [0106] “…hexafluorophosphate salts…hexafluoroantimonate salts… triflate…” and [0107] “Examples of the first resin composition may be made by mixing the epoxy resin matrix with the free radical photoinitiator and the photoacid generator. In an example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 99.8:0.2 to 90:10. In another example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 98:2 to 95:5”);.
Regarding claim 10, Merkel describes a flow cell (figure 1 and [0128] “Flow Cell”), comprising:
a substrate ([0130] “a substrate”);
a cured, patterned resin positioned over the substrate, the cured, patterned resin including imprinted depressions separated by interstitial regions, ([0130] “working stamp”),
the cured, patterned resin including a cured form of a nanoimprint lithography (NIL) resin composition including:
a total of three monomers ([0095] “one or more different cage or core structures as monomeric units.”), wherein:
two of the three monomers are selected from the group consisting of: two different epoxy silsesquioxane monomers; two different epoxy cyclosiloxane monomers; and two different non-organosilicon epoxy monomers ([0010] “the epoxy resin matrix includes a combination of two epoxy functionalized polyhedral oligomeric silsesquioxanes,”);; and
a third of the three monomers is a fluorinated monomer that is present in an amount ranging from about from 0.5 mass% to about 4 mass%, based on a total solids content of the NIL resin composition ([0105] “the resin composition also include a photoacid generator (PAG)” and [0106] “…hexafluorophosphate salts…hexafluoroantimonate salts… triflate…” and [0107] “Examples of the first resin composition may be made by mixing the epoxy resin matrix with the free radical photoinitiator and the photoacid generator. In an example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 99.8:0.2 to 90:10. In another example, a weight % ratio of the epoxy resin matrix to the free radical photoinitiator/photoacid generator combination ranges from about 98:2 to 95:5”); and
a photoinitiator ([0011] “free radical photoinitiator”);
a solvent ([0109] “the photoinitiator and the photoacid generator) may be diluted in a suitable solvent”);
a polymeric hydrogel positioned within each of the depressions ([0141] “polymer coating 18”); and
a primer set attached to the polymeric hydrogel ([0141] “primers 24”).
Regarding claim 11, Merkel describes the flow cell as defined in claim 10, wherein the substrate is silanized glass or silanized silicon ([0134] “ The substrate 12 may also be glass or silicon,”).
Regarding claim 13, Merkel describes the flow cell as defined in claim 10, wherein: the two of the three monomers are the two different epoxy substituted silsesquioxane monomers; the two different epoxy substituted silsesquioxane monomers consist of epoxycyclohexylethyl polysilsesquioxane and glycidyl polysilsesquioxane; and the two different epoxy substituted silsesquioxane monomers are present at a mass ratio ranging from about 3:7 to about 7:3 ([0009] “the epoxy resin matrix comprises an epoxy material selected from the group consisting of an epoxy functionalized polyhedral oligomeric silsesquioxane; trimethylolpropane triglycidyl ether; tetrakis ( epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof.” And [0097] “In other examples, R1 through Rs or R10 or R12 are the same, and thus each of R1 through Rs or R10 or R12 comprises an epoxy group. In still other examples, R1 through Rs or R10 or R12 are not the same, and thus at least one of R1 through Rs or R10 or R12 comprises epoxy and at least one other of R1 through Rs or R10 or R1 1s a non-epoxy functional group, which m some cases is selected from the group consisting of an azide/azido, a thiol, a poly(ethylene glycol), a norbornene, and a tetrazine, or further, for example, alkyl, aryl, alkoxy, and haloalkyl groups. In some aspects, the non-epoxy functional group is selected to increase the surface energy of the resin. In these other examples, the ratio of epoxy groups to non-epoxy groups ranges from 7:1 to 1:7, or 9:1 to 1:9, or 11: 1 to 1: 11. In any of the examples, disubstituted or monosubstituted (terminal) epoxy group(s) allow the monomeric unit to polymerize into a cross-linked matrix upon initiation using ultraviolet (UV) light and an acid. In some aspects, the epoxy POSS comprises terminal epoxy groups.”).
Regarding claim 14, Merkel describes the flow cell as defined in claim 10, wherein: the two of the three monomers are the two different epoxy substituted cyclosiloxane monomers; the two different epoxy substituted cyclosiloxane monomers consist of epoxycyclohexyl tetramethylcyclotetrasiloxane and glycidyl cyclotetrasiloxane; and the two different epoxy substituted cyclosiloxane monomers are present at a mass ratio ranging from about 3:7 to about 7:3 ([0009] “the epoxy resin matrix comprises an epoxy material selected from the group consisting of an epoxy functionalized polyhedral oligomeric silsesquioxane; trimethylolpropane triglycidyl ether; tetrakis ( epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof.” and ([0097] “In other examples, R1 through Rs or R10 or R12 are the same, and thus each of R1 through Rs or R10 or R12 comprises an epoxy group. In still other examples, R1 through Rs or R10 or R12 are not the same, and thus at least one of R1 through Rs or R10 or R12 comprises epoxy and at least one other of R1 through Rs or R10 or R1 1s a non-epoxy functional group, which m some cases is selected from the group consisting of an azide/azido, a thiol, a poly(ethylene glycol), a norbornene, and a tetrazine, or further, for example, alkyl, aryl, alkoxy, and haloalkyl groups. In some aspects, the non-epoxy functional group is selected to increase the surface energy of the resin. In these other examples, the ratio of epoxy groups to non-epoxy groups ranges from 7:1 to 1:7, or 9:1 to 1:9, or 11: 1 to 1: 11. In any of the examples, disubstituted or monosubstituted (terminal) epoxy group(s) allow the monomeric unit to polymerize into a cross-linked matrix upon initiation using ultraviolet (UV) light and an acid. In some aspects, the epoxy POSS comprises terminal epoxy groups.”).
Regarding claim 15, Merkel describes the flow cell as defined in claim 10, wherein: the two of the three monomers are the two different non-organosilicon epoxy monomers; the two different non-organosilicon epoxy monomers are independently selected from the group consisting of trimethylolpropane triglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclo-hexanecarboxylate, bis((3,4-epoxycyclohexyl)methyl) adipate, 4-vinyl-1-cyclohexene 1,2-epoxide, vinylcyclohexene dioxide, 4,5-epoxytetrahydrophthalic acid diglycidylester, 1,2-epoxy-3-phenoxypropane, glycidyl methacrylate, 1,2-epoxyhexadecane, poly(ethylene glycol) diglycidylether, pentaerythritol glycidyl ether, diglycidyl 1,2-cyclohexanedicarboxylate, tetrahydrophthalic acid diglycidyl ester, 1,2-epoxy-3-phenoxypropane, and glycidyl methacrylate; and the two different non-organosilicon epoxy monomers are present at a mass ratio ranging from about 4:1 to about 1:4 ([0208] “Seven examples of the resin compositions were prepared. Each example included a different epoxy resin matrix, which included glycidyl functionalized POSS; epoxycyclohexyl ethyl functionalized POSS; trimethylolpropane triglycidyl ether; tetrakis( epoxycyclohexyl ethyl) tetramethyl cyclotetrasiloxane; a copolymer of ( epoxycyclohexylethyl) methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; or 1,3-bis(glycidoxypropyl)tetramethyl disiloxane”).
Claim Rejections - 35 USC § 103
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action:
A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made.
The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows:
1. Determining the scope and contents of the prior art.
2. Ascertaining the differences between the prior art and the claims at issue.
3. Resolving the level of ordinary skill in the pertinent art.
4. Considering objective evidence present in the application indicating obviousness or nonobviousness.
This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention.
Claim(s) 2 and 12 is/are rejected under 35 U.S.C. 103 as being unpatentable over Merkel et al. (US 2020/0025670 A1) and Lee et al. (Nanotechnology 30 (2019) 505301, provided on the IDS on 6/29/2023).
Regarding claim 2, Merkel describes the limitations of claim 1, however is silent to the NIL resin composition as defined in claim 1, wherein the fluorinated monomer is selected from the group consisting of 2,2’-(2,2,3,3,4,4,5,5-octafluorohexane-1,6-diyl)bis(oxirane), glycidyl 2,2,3,3,4,4,5,5-octafluoropentyl ether, glycidyl 2,2,3,3-tetrafluoropropyl ether, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane, (2,2,3,3,4,4,5,5,6,6,7,7,7-tridecafluoroheptyl)oxirane, 2,2,3,3,4,4,5,5,6,7,7,7- dodeca-fluoro-6-(trifluoromethyl)heptyl]oxirane, 2,2,3,3,4,4,5,5,6,6,7,7,8,9,9,9-hexadecafluoro-8-(trifluoromethyl)nonyl]oxirane, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10, 11,11,11-heneicosafluoroundecyl)oxirane, and combinations thereof.
Lee describes a fluorinated monomer of (2,2,3,3,4,4,5, 5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl) oxirane (EP-F8) (page 2). Furthermore Lee described “resin is versatile in transferring high-density nanostructure patterns without requiring additional surface treatment for the demolding process.” (page 8). This suggests motivation to incorporate (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane as a fluorinated monomer because it would allow for improved qualities of the NIL.
Therefore it would have been obvious for one skilled in the art at the time the invention as filed to use (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane as a fluorinated monomer in the NIL of Merkel as suggested by Lee because this would allow for improved qualities of the NIL in transferring high-density nanostructure patterns.
Regarding claim 12, Merkel describes the limitations the flow cell as defined in claim 10, however is silent to wherein the fluorinated monomer is selected from the group consisting of 2,2’-(2,2,3,3,4,4,5,5-octafluorohexane-1,6-diyl)bis(oxirane), glycidyl 2,2,3,3,4,4,5,5-octafluoropentyl ether, glycidyl 2,2,3,3-tetrafluoropropyl ether, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane, (2,2,3,3,4,4,5,5,6,6,7,7,7-tridecafluoroheptyl)oxirane, 2,2,3,3,4,4,5,5,6,7,7,7- dodeca-fluoro-6-(trifluoromethyl)heptyl]oxirane, 2,2,3,3,4,4,5,5,6,6,7,7,8,9,9,9-hexadecafluoro-8-(trifluoromethyl)nonyl]oxirane, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10, 11,11,11-heneicosafluoroundecyl)oxirane, and combinations thereof.
Lee describes a fluorinated monomer of (2,2,3,3,4,4,5, 5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl) oxirane (EP-F8) (page 2). Furthermore Lee described “resin is versatile in transferring high-density nanostructure patterns without requiring additional surface treatment for the demolding process.” (page 8). This suggests motivation to incorporate (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane as a fluorinated monomer because it would allow for improved qualities of the NIL.
Therefore it would have been obvious for one skilled in the art at the time the invention as filed to use (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxirane as a fluorinated monomer in the NIL of Merkel as suggested by Lee because this would allow for improved qualities of the NIL in transferring high-density nanostructure patterns.
Conclusion
Any inquiry concerning this communication or earlier communications from the examiner should be directed to EMILY R BERKELEY whose telephone number is (571)272-9831. The examiner can normally be reached M-Th 9-6.
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/LYLE ALEXANDER/Supervisory Patent Examiner, Art Unit 1797
/EMILY R. BERKELEY/
Examiner
Art Unit 1796
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