Prosecution Insights
Last updated: April 19, 2026
Application No. 18/345,134

FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS

Non-Final OA §102
Filed
Jun 30, 2023
Examiner
BOWMAN, ANDREW J
Art Unit
1717
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
66%
Grant Probability
Favorable
1-2
OA Rounds
3y 6m
To Grant
78%
With Interview

Examiner Intelligence

Grants 66% — above average
66%
Career Allow Rate
576 granted / 879 resolved
+0.5% vs TC avg
Moderate +13% lift
Without
With
+12.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 6m
Avg Prosecution
76 currently pending
Career history
955
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
56.8%
+16.8% vs TC avg
§102
20.4%
-19.6% vs TC avg
§112
18.5%
-21.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 879 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA. Election/Restrictions Claim 9 was withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected FILLIN "Enter the appropriate information" \* MERGEFORMAT invention , there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 12/26/2025. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis ( i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale , or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-8 is/are rejected under 35 U.S.C. 102 FILLIN "Insert either \“(a)(1)\” or \“(a)(2)\” or both. If paragraph (a)(2) of 35 U.S.C. 102 is applicable, use form paragraph 7.15.01.aia, 7.15.02.aia or 7.15.03.aia where applicable." \d "[ 2 ]" (a)(1) as being anticipated by FILLIN "Insert the prior art relied upon." \d "[ 4 ]" Kadonaga et al. (JP2009-260151) . Regarding claim s 1 -2 , Kadonaga teaches depositing a silicon nitride film doped with metal (claim 1 and abstract) by supplying (a) dichlorosilane (Fig. 6A) followed by providing (b) trimethylaluminum (Fig. 6B) followed by providing ammonia gas (Fig. 6B) wherein the process may be repeated numerous times so as to provide a structure such as the one shown in Figs. 5A or 5B referred to as “the metal doped layer” (items 100 and 110). Regarding claim 3, during the repetition of the steps of Kadonaga as described above, the process steps would occur in the order claimed. Regarding claim 4, during the repetition of the steps of Kadonaga as described above, the process steps would occur in the order claimed. Regarding claim 5, for clarity it is noted that as relates to Fig. 5A for example, Kadonaga refers to 102 as an insulating layer, 104 as a metal layer and the combination of two insulating layers sandwiching a metal layer as a metal doped layer collectively (100), wherein the insulating layer of Kadonaga would read upon the undoped layer of the current claims. As such, when referring to Fig. 5B, 114 is deposited in step 1 (S1) and is an undoped layer reading upon the first step of the current claim and steps 3-5 performed thereafter and in order would form what is referred to by Kadonaga as a metal doped layer. Further “n” is referred to in essence as the number of times that an insulating layer or metal layer are formed wherein they are always formed successively on top of one another through the process shown in Figs. 6A and 6B wherein “n” may be “a positive integer of 3 or more” (see description of Fig.3). Therefore the process of Kadonaga reasonably reads upon performing the claimed steps of forming an undoped layer followed by the formation of a metal doped layer as well as forming a stacked structure thereon by repeating the process “n” times within the range provided for “n” by Kadonaga. Regarding claim 6, the formation of the undoped layer of Kadonaga requires providing dichlorosilane and ammonia gas as shown in Fig.6A. Regarding claim 7, it is noted that Kadonaga refers to a stack of layers provided is specifically referred to in Kadonaga as a singular “metal doped layer”. Therefore the structure of Kadonaga can reasonably be viewed as a single layer structure. Regarding claim 8, the desired metal shown in Fig. 6A is aluminum derived from the provided trimethylaluminum. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to FILLIN "Examiner name" \* MERGEFORMAT ANDREW J BOWMAN whose telephone number is FILLIN "Phone number" \* MERGEFORMAT (571)270-5342 . The examiner can normally be reached FILLIN "Work Schedule?" \* MERGEFORMAT Mon-Sat 5:00AM-11:00AM . Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, FILLIN "SPE Name?" \* MERGEFORMAT Dah-Wei Yuan can be reached at FILLIN "SPE Phone?" \* MERGEFORMAT 571-272-1295 . The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ANDREW J BOWMAN/ Examiner, Art Unit 1717
Read full office action

Prosecution Timeline

Jun 30, 2023
Application Filed
Mar 21, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
66%
Grant Probability
78%
With Interview (+12.6%)
3y 6m
Median Time to Grant
Low
PTA Risk
Based on 879 resolved cases by this examiner. Grant probability derived from career allow rate.

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