Prosecution Insights
Last updated: October 02, 2026
Application No. 18/348,374

PHOTOSENSITIVE COMPOSITION, AND CURED FILM

Final Rejection §103
Filed
Jul 07, 2023
Priority
Oct 31, 2022 — JP 2022-174462
Examiner
CHAMPION, RICHARD DAVID
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
JNC Corporation
OA Round
2 (Final)
46%
Grant Probability
Moderate
3-4
OA Rounds
7m
Est. Remaining
58%
With Interview

Examiner Intelligence

Grants 46% of resolved cases
46%
Career Allowance Rate
58 granted / 127 resolved
-19.3% vs TC avg
Moderate +12% lift
Without
With
+11.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 10m
Avg Prosecution
37 currently pending
Career history
174
Total Applications
across all art units

Statute-Specific Performance

§103
62.9%
+22.9% vs TC avg
§102
26.6%
-13.4% vs TC avg
§112
8.8%
-31.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 127 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 1. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: 2. A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 3. Claims 1-10 are rejected under 35 U.S.C. 103 as being unpatentable over Zheng et al. (Chinese Patent Publication no. CN 105694045 B), hereinafter Zheng, in view of Miyashita et al. (Japanese Patent Publication no. JP 2007-298841 A), hereinafter Miyashita. 4. Regarding Claims 1-10, Zheng teaches (Page 3, Line 38 to Page 4, Line 38) a double-decker silsesquioxane. Zheng teaches (Page 3, Line 38 to Page 4, Line 38) a polythiol. Zheng teaches (Page 3, Line 38 to Page 4, Line 38) a content of the polythiol is 6 parts by mass or more and 12 parts by mass or less with respect to 100 parts by mass of the double-decker silsesquioxane. Zheng teaches (Page 3, Line 38 to Page 4, Line 38) an organic solvent. 5. However, Zheng fails to explicitly teach the double-decker silsesquioxane having two or more polymerizable double bonds. Furthermore, Zheng fails to explicitly teach the double-decker silsesquioxane (A) having two or more polymerizable double bonds is a silsesquioxane represented by formula (1) of the present application. Furthermore, Zheng fails to explicitly teach the double-decker silsesquioxane (A) having two or more polymerizable double bonds is a silsesquioxane represented by formula (1a) of the present application. Furthermore, Zheng fails to explicitly teach a cured film obtained by curing the photosensitive composition. 6. Miyashita teaches (Paragraph [0041]) the double-decker silsesquioxane having two or more polymerizable double bonds. Miyashita teaches (Paragraph [0041]) the double-decker silsesquioxane having two or more polymerizable double bonds is a silsesquioxane represented by formula (1) of the present application. Miyashita teaches (Paragraph [0041]) the double-decker silsesquioxane having two or more polymerizable double bonds is a silsesquioxane represented by formula (1a) of the present application. Miyashita teaches (Paragraph [0039]) a cured film obtained by curing the photosensitive composition. Miyashita teaches (Paragraph [0007]) said limitations have the effect of good storage stability and allowing for microfabrication on the order of several microns. 7. A person having ordinary skill in the art would understand that Zheng in view of Miyashita teaches the double-decker silsesquioxane having two or more polymerizable double bonds; the double-decker silsesquioxane having two or more polymerizable double bonds is a silsesquioxane represented by formula (1) of the present application; the double-decker silsesquioxane having two or more polymerizable double bonds is a silsesquioxane represented by formula (1a) of the present application; and a cured film obtained by curing the photosensitive composition. Doing so would result in good storage stability and allow for microfabrication on the order of several microns, as recognized by Miyashita. Conclusion 8. Any inquiry concerning this communication should be directed to RICHARD D CHAMPION at telephone number (571) 272-0750. The examiner can normally be reached on 8 a.m. - 5 p.m. Mon-Fri EST. 9. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, MARK F HUFF can be reached at (571) 272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. 10. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). 11. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /R.D.C./Examiner, Art Unit 1737 /MARK F. HUFF/Supervisory Patent Examiner, Art Unit 1737
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Prosecution Timeline

Jul 07, 2023
Application Filed
Apr 15, 2026
Non-Final Rejection mailed — §103
Jul 02, 2026
Response Filed
Sep 30, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12717234
PHOTOSENSITIVE COMPOSITION
4y 9m to grant Granted Aug 25, 2026
Patent 12717231
PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
4y 4m to grant Granted Aug 25, 2026
Patent 12715828
TRICYCLODECANE DIMETHANOL COMPOSITION, ULTRAVIOLET CURABLE COMPOSITION, POLYMER COMPOSITION, AND METHOD FOR PRODUCING TRICYCLODECANE DIMETHANOL COMPOSITION
1y 11m to grant Granted Aug 25, 2026
Patent 12704778
RESIST UNDERLAYER COMPOSITIONS AND PATTERN FORMATION METHODS USING SUCH COMPOSITIONS
7y 2m to grant Granted Aug 11, 2026
Patent 12704783
METHOD FOR PREPARING PIXEL DEFINE LAYER
2y 9m to grant Granted Aug 11, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
46%
Grant Probability
58%
With Interview (+11.9%)
3y 10m (~7m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 127 resolved cases by this examiner. Grant probability derived from career allowance rate.

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