Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Response to Arguments
1. Applicant’s arguments, see page 8, line 12, filed 09 July 2026, with respect to the rejection of Claims 1, 4-8, 10-11, 13, 15, and 19-20 under 35 U.S.C. 102(a)(1) as being anticipated by Gronheid et al. (United States Patent Publication no. US 2014/0231968 A1), hereinafter Gronheid; Claims 2-3, 12, 14, and 16 under 35 U.S.C. 102(a)(1) as being anticipated by Gronheid et al. (United States Patent Publication no. US 2014/0231968 A1), hereinafter Gronheid; utilizing Nakagawa et al. (United States Patent Publication no. US 2020/0004144 A1), hereinafter Nakagawa as a teaching reference; Claim 9 under 35 U.S.C. 103 as being unpatentable over Gronheid et al. (United States Patent Publication no. US 2014/0231968 A1), hereinafter Gronheid; Claim 12 under 35 U.S.C. 103 as being unpatentable over Gronheid et al. (United States Patent Publication no. US 2014/0231968 A1), hereinafter Gronheid, in view of Brink et al. (United States Patent Publication no. US 2016/0244581 A1), hereinafter Brink; have been fully considered and, in light of the claim amendments made, are persuasive. Therefore, the rejections have been withdrawn. However, upon further consideration, a new ground(s) of rejection is made in view of Hansen et al. (World Intellectual Property Organization (WIPO) Publication No. WO 2022/016128 A1), hereinafter Hansen.
Claim Rejections - 35 USC § 102
2. In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
3. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
4. A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
5. Claims 1-16 and 19-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Hansen et al. (World Intellectual Property Organization (WIPO) Publication No. WO 2022/016128 A1), hereinafter Hansen.
6. Regarding Claims 1-16 and 19-20, Hansen teaches (Claim 35, Fig. 2A & 2B) a forming a multilayer molecular film photoresist including plurality of molecular lines extending upwards above a substrate arranged in the horizontal direction. Hansen teaches (Claim 35, Fig. 2A & 2B) wherein each of the molecular lines includes a plurality of inorganic single molecules and an organic single molecule sandwiched between at least some of the inorganic single molecules. Hansen teaches (Paragraph [0138], Fig. 3B) these single molecules are connected by bonds. Hansen teaches (Claim 46) exposing a portion of the multilayer molecular film photoresist to radiation. Hansen teaches (Claim 47) developing the exposed multilayer molecular film photoresist to form a multilayer molecular film photoresist pattern. Hansen teaches (Paragraph [0138], Fig. 3B) Van der Waals interaction occurs between the organic single molecules in horizontally adjacent molecular lines among the molecular lines and the van der Waals interaction is a van der Waals interaction between the alkylene groups. That said, Gronheid teaches (Paragraphs [0087-0102]) organic single molecules are ethylene glycol in working experimental examples and ethylene glycol comprises a linear alkylene group. Hansen teaches (Paragraph [0138], Fig. 3B) each of the organic single molecules has a linear alkylene group, and the van der Waals interaction is a π-π bond between the alkylene groups, therein diacetylene. Hansen teaches (Paragraph [0138], Fig. 3B) wherein each of the organic single molecules has a linear alkylene group. Hansen teaches (Paragraph [0138], Fig. 3B) wherein, within each of the molecular lines, the inorganic single molecules and the organic single molecules are alternately stacked. Hansen teaches (Paragraph [0037]) wherein the inorganic single molecule is an organometallic single molecule containing tin, bismuth, tellurium, cesium antimony, indium, molybdenum, hafnium, iodine, zirconium, iron, cobalt, nickel, copper, zinc, silver, platinum, or lead as a central metal. Hansen teaches (Claim 17) wherein some of identical inorganic single molecules among the inorganic single molecules provided in the molecular lines are located at the same level to form an inorganic monomolecular layer in the horizontal direction, and wherein some of identical organic single molecules among the organic single molecules provided in the molecular lines are located at the same level to form an organic monomolecular layer in the horizontal direction. Hansen teaches (Claim 17) the multilayer molecular film photoresist includes at least one layer of a light-absorbing layer including a light-absorbing inorganic single molecule, a photoreactive layer including a photoreactive inorganic single molecule, and an etch-resistant layer including an etch-resistant inorganic single molecule. Hansen teaches (Claim 17) wherein the light-absorbing inorganic single molecule is an inorganic single molecule having a metal element having a d orbital. Hansen teaches (Paragraph [0037]) wherein the photoreactive inorganic molecule has a metal element of tin, antimony, tellurium, or bismuth. Hansen teaches (Paragraph [0037]) wherein the etch-resistant inorganic single molecule has a metal element of hafnium, zinc, or lead. Hansen teaches (Claim 37) the multilayer molecular film photoresist is a photoresist for EUV. Hansen teaches (Claim 35, Fig. 2A & 2B) a forming a multilayer molecular film photoresist including plurality of molecular lines extending upwards above a substrate arranged in the horizontal direction. Hansen teaches (Claim 46) exposing a portion of the multilayer molecular film photoresist to radiation. Hansen teaches (Claim 47) developing the exposed multilayer molecular film photoresist to form a multilayer molecular film photoresist pattern. Hansen teaches (Fig. 3B) wherein each of the molecular lines has a portion represented by Formula 1 of the present application. Hansen teaches (Paragraph [0198]) wherein the organic single molecule is represented by Formula 3 of the present application. Hansen teaches (Paragraph [0198]) wherein the organic single molecule is represented by Formula 2 of the present application. Hansen teaches (Paragraph [0198]) wherein both of na and nb Formula 2 of the present application are 0.
Conclusion
7. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
8. A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
9. Any inquiry concerning this communication should be directed to RICHARD D CHAMPION at telephone number (571) 272-0750. The examiner can normally be reached on 8 a.m. - 5 p.m. Mon-Fri EST.
10. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, KEITH D HENDRICKS can be reached at (571) 272-1401. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
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12. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
/Keith D. Hendricks/Supervisory Patent Examiner, Art Unit 1733
/R.D.C./Examiner, Art Unit 1737
