Listed by the USPTO as CHAMPION, RICHARD DAVID
Tech Center 2800 • Art Units: 1715 1737 1746 2812
This examiner grants 46% of resolved cases
CHAMPION, RICHARD DAVID has 130 resolved cases, with a 46.2% allowance rate and a median of 1402 days to allowance. The profile is assigned to Tech Center 2800 and art unit 1715. The 11.1% interview lift indicates a positive but limited measured association.
The listed companies are Fujifilm Corporation, Tokyo Ohka Kogyo Co., Ltd., and Merck Patent GmbH. JCIPRNET, SUGHRUE MION, PLLC, and BIRCH STEWART KOLASCH & BIRCH, LLP are the listed firms with the most representation. The allowance figure and median timing support early attention to claim strategy and prosecution sequencing.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18424834 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18421987 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18475635 | LAMINATE AND MANUFACTURING METHOD OF LAMINATE | Final Rejection | FUJIFILM Corporation |
| 18337931 | LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Final Rejection | FUJIFILM Corporation |
| 17591943 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 18483911 | POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17599093 | POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME | Non-Final OA | Merck Patent GmbH |
| 16757435 | METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME | Final Rejection | Merck Patent GmbH |
| 18691307 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE | Non-Final OA | Toray Industries, Inc. |
| 18384038 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER | Final Rejection | SAMSUNG SDI CO., LTD. |
| 18473132 | SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18580803 | TEMPLATE SUBSTRATE AND MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF, SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | Non-Final OA | KYOCERA Corporation |
| 18377215 | Onium Salt, Resist Composition, And Patterning Process | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 18080981 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 16870704 | PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy46.2% of resolved applications examined by Richard David Champion were allowed (130 resolved cases), compared with 51.6% across Art Unit 1715 over the last five years.
This examiner's interview lift is +11.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Richard David Champion took 1,402 days on average from filing to allowance.
Richard David Champion examines applications in Art Unit 1715 in Tech Center 2800 (Semiconductors, Circuits & Optics).
