Prosecution Insights
Last updated: April 19, 2026
Application No. 18/352,177

SEMICONDUCTOR PACKAGE

Non-Final OA §102
Filed
Jul 13, 2023
Examiner
DOAN, THERESA T
Art Unit
2814
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
2y 1m
To Grant
93%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allow Rate
791 granted / 896 resolved
+20.3% vs TC avg
Moderate +5% lift
Without
With
+5.1%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
24 currently pending
Career history
920
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
42.2%
+2.2% vs TC avg
§102
38.4%
-1.6% vs TC avg
§112
3.3%
-36.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 896 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-2 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lee et al. (2021/0289629). Regarding claim 1, Lee (Figs. 15) discloses a semiconductor package 800B, comprising: a lower substrate 200 comprising a contact region (around #300) and a non-contact region (on the right and the left side of #300), wherein the contact region extends around the non-contact region (Fig. 15, [0080]); a first upper substrate 100 on the lower substrate 200 ([0046]); a lower device 400 on the first upper substrate 100 ([0066]); a plurality of first solder balls 180 between the first upper substrate 100 and the lower substrate 200 contact region ([0054]); a plurality of capacitors 300 between the first upper substrate 200 and the lower substrate 200 non-contact region ([0046]); and a plurality of support blocks 350b between the plurality of capacitors 300 and the lower substrate non-contact region 200 (see Fig. 20, [0100]). Regarding claim 2, Lee (Fig. 15) discloses wherein the non-contact region (on the right and the left side of #300) comprises: a first non-contact region (on the right of #300); and a second non-contact region (on the left side of #300) adjacent to the first non-contact region. Allowable Subject Matter Claims 3-10 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The prior art of record fails to disclose all the limitations recited in the claims 3, 6 and 8. Specifically, the prior art of record fails to disclose wherein the plurality of support blocks comprise: a first support block between the lower substrate first non-contact region and one of the plurality of capacitors, wherein the first support block comprises a recess that receives the one of the plurality of capacitors; and a second support block between the lower substrate second non-contact region and another one of the plurality of capacitors, wherein the second support block comprises a recess that receives the another one of the plurality of capacitors (claim 3); or wherein the lower device comprises: a low-temperature region on the first non-contact region; and a high-temperature region on the second non-contact region (claim 6); or further comprising a first underfill layer between the plurality of first solder balls and the plurality of support blocks, wherein the plurality of support blocks have a thermal expansion coefficient less than a thermal expansion coefficient of the first underfill layer (claim 8). Claims 11-20 are allowed. The following is an examiner's statement of reasons for allowance: The prior art of record neither anticipates nor renders obvious all the limitations in the base claims 11 and 16. Specifically, the combination of a semiconductor package, comprising: a plurality of passive devices between the first upper substrate and the lower substrate non-contact region; a first underfill layer between the plurality of first solder balls; and a plurality of support blocks between the lower substrate non-contact region and the plurality of passive devices, wherein the plurality of support blocks have a thermal expansion coefficient less than a thermal expansion coefficient of the first underfill layer (claim 11); or the combination of the semiconductor package, comprising: a second upper substrate on the lower device and the first upper substrate; a plurality of second solder balls between the first and second upper substrates; and a second underfill layer between the lower device and the plurality of second solder balls, wherein the second underfill layer has a thermal expansion coefficient less than the thermal expansion coefficient of the first underfill layer (in claim 16). The dependent claims being further limiting and definite are also allowable. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to THERESA T DOAN whose telephone number is (571)272-1704. The examiner can normally be reached on Monday, Tuesday, Wednesday and Thursday from 7:00AM - 3:00PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, WAEL FAHMY can be reached on (571) 272-1705. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see https://ppair-my.uspto.gov/pair/PrivatePair. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /THERESA T DOAN/ Primary Examiner, Art Unit 2814
Read full office action

Prosecution Timeline

Jul 13, 2023
Application Filed
Jan 19, 2026
Non-Final Rejection — §102
Feb 10, 2026
Interview Requested
Feb 19, 2026
Examiner Interview Summary
Feb 19, 2026
Applicant Interview (Telephonic)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12598750
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
2y 5m to grant Granted Apr 07, 2026
Patent 12593718
MEMORY SYSTEM PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF
2y 5m to grant Granted Mar 31, 2026
Patent 12593636
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
2y 5m to grant Granted Mar 31, 2026
Patent 12588511
SHIELDING ASSEMBLY FOR SEMICONDUCTOR PACKAGES
2y 5m to grant Granted Mar 24, 2026
Patent 12588527
DIELECTRIC INTERPOSER WITH ELECTRICAL-CONNECTION CUT-IN
2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
93%
With Interview (+5.1%)
2y 1m
Median Time to Grant
Low
PTA Risk
Based on 896 resolved cases by this examiner. Grant probability derived from career allow rate.

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