Prosecution Insights
Last updated: May 29, 2026
Application No. 18/366,116

SEMICONDUCTOR DEVICE

Final Rejection §102§112
Filed
Aug 07, 2023
Examiner
ANDERSON, WILLIAM H
Art Unit
2817
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Macronix International Co. Ltd.
OA Round
2 (Final)
86%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
174 granted / 203 resolved
+17.7% vs TC avg
Strong +15% interview lift
Without
With
+15.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
35 currently pending
Career history
249
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
78.1%
+38.1% vs TC avg
§102
8.8%
-31.2% vs TC avg
§112
11.9%
-28.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 203 resolved cases

Office Action

§102 §112
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 3/6/2024 is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Objections Claim 8 is objected to because of the following informalities: “and each the first circuit layer” in lines 4-5. For the sake of compact prosecution, claim 8 is interpreted in the instant Office action as follows: “and each the first circuit layer” is found to be a typographical error and is believed to be equivalent to “and each of the first circuit layers” based on line 3; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 8 is objected to because of the following informalities: “the first circuit layer” in line 6. For the sake of compact prosecution, claim 8 is interpreted in the instant Office action as follows: “the first circuit layer” is found to be a typographical error and is believed to be equivalent to “the first circuit layers” based on line 3; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 9 is objected to because of the following informalities: “a first connection one of the substrate conductive pillars” in line 9. For the sake of compact prosecution, claim 9 is interpreted in the instant Office action as follows: “a first connection one of the substrate conductive pillars” is found to be a typographical error and is believed to be equivalent to “a first connection of one of the substrate conductive pillars”; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 9 is objected to because of the following informalities: “a second connection one of the substrate conductive pillars” in lines 10-11. For the sake of compact prosecution, claim 9 is interpreted in the instant Office action as follows: “a second connection one of the substrate conductive pillars” is found to be a typographical error and is believed to be equivalent to “a second connection of one of the substrate conductive pillars”; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 10 is objected to because of the following informalities: “the first connection one of the substrate conductive pillars” in line 7. For the sake of compact prosecution, claim 10 is interpreted in the instant Office action as follows: “the first connection one of the substrate conductive pillars” is found to be a typographical error and is believed to be equivalent to “the first connection of one of the substrate conductive pillars”; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 20 is objected to because of the following informalities: “and each the first circuit layer” in lines 4-5. For the sake of compact prosecution, claim 20 is interpreted in the instant Office action as follows: “and each the first circuit layer” is found to be a typographical error and is believed to be equivalent to “and each of the first circuit layers” based on line 3; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim 20 is objected to because of the following informalities: “the first circuit layer” in line 6. For the sake of compact prosecution, claim 20 is interpreted in the instant Office action as follows: “the first circuit layer” is found to be a typographical error and is believed to be equivalent to “the first circuit layers” based on line 3; however, no actual change to the claim language has been applied during examination of the instant set of claims. Appropriate correction is required. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 5 and 13 (and dependent claim 14 dependent therefrom) are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Regarding claim 5, “the first” in line 2 is unclear what feature is being referred to, i.e., “the first chip”, “the first substrate”, or some other first feature. For the sake of compact prosecution, claim 5 is interpreted in the instant Office action as follows: “the first” in line 2 is equivalent to “the first chip” based on Fig. 3. This interpretation is to be confirmed by applicant in next office action. Regarding claim 13, “the first” in line 2 is unclear what feature is being referred to, i.e., “the first chip”, “the first substrate”, or some other first feature. For the sake of compact prosecution, claim 13 is interpreted in the instant Office action as follows: “the first” in line 2 is equivalent to “the first chip” based on Fig. 3. This interpretation is to be confirmed by applicant in next office action. Regarding claim 13, “the lower surface” in line 3 is unclear which surface is being referred to. For the sake of compact prosecution, claim 13 is interpreted in the instant Office action as follows: “the lower surface” in line 3 is equivalent to “the upper surface” based on Fig. 3 and [0042] describing an interval in relation to similar surfaces consistent with the claim. This interpretation is to be confirmed by applicant in next office action. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-6, 8-14, and 16-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lee (US 20210183817 A1). Regarding claim 1, Lee discloses a semiconductor device (Fig. 1), comprising: a first substrate (550); a first chip (420) disposed on the first substrate (vertically on) and having a first lateral surface (See annotated figure); and a second chip (320) disposed on the first chip and comprising a first protrusion (See annotated figure) protruding with respect to the first lateral surface (horizontally protruding); a first substrate conductive pillar (310) connecting the first protrusion with the first substrate. Illustrated below is a marked and annotated figure of Fig. 1 of Lee. PNG media_image1.png 512 677 media_image1.png Greyscale Regarding claim 2, Lee discloses the semiconductor device according to claim 1 (Fig. 1), wherein the second chip has a second lateral surface (See annotated figure) and the semiconductor device comprises: a third chip (220) disposed on the second chip (vertically on) and comprising a second protrusion (See annotated figure) protruding with respect to the second lateral surface (horizontally protruding); and a second substrate conductive pillar (211) connecting the second protrusion with the first substrate. Regarding claim 3, Lee discloses the semiconductor device according to claim 2 (Fig. 1), wherein the first substrate conductive pillar and the second substrate conductive pillar are different in height (different vertical heights). Regarding claim 4, Lee discloses the semiconductor device according to claim 1 (Fig. 1), wherein the first chip comprises a dummy pad (See annotated figure), the second chip comprises a dummy bump (341D; [0041]: “dummy bump”), and the dummy bump is connected to the dummy pad (directly connected). Regarding claim 5 as noted in the 112(b) rejection, Lee discloses the semiconductor device according to claim 1 (Fig. 1), wherein the second chip has a lower surface (320S1), the first has an upper surface (420S2), there is an interval (See annotated figure) between the lower surface and the upper surface (vertically between), and the semiconductor device further comprises: a molding compound (330) filling the interval. Regarding claim 6, Lee discloses the semiconductor device according to claim 1 (Fig. 1), further comprising: an interposer module (101), comprising: a second substrate ([0024]: “a core material”); and a plurality of interposer conductive pillars (111D/112D) formed on the second substrate (vertically on), wherein each interposer conductive pillar has an end surface (See annotated figure), and the end surfaces of the interposer conductive pillars are different in height (different vertical heights); wherein one of the interposer conductive pillars (112D) is connected to one of the first substrate, the first chip and the second chip (pillar 112D is connected to the first chip 420), and another of the interposer conductive pillars (111D) is connected to another of the first substrate, the first chip and the second chip (pillar 111D is connected to the second chip 320). Regarding claim 8, Lee discloses the semiconductor device according to claim 1 (Fig. 1), further comprising: an interposer module (101), comprising: a plurality of first circuit layers (one layer of a plurality; [0025]: “a plurality of wiring layers buried in the insulating layers”. Note: “a plurality of first circuit layers” is interpreted here as including both the wiring path and the insulative material burying the wiring. This interpretation is consistent with the number and arrangement of layers shown in Fig. 3 of Applicant’s disclosure); a second circuit layer (another layer of a plurality; [0025]: “a plurality of wiring layers buried in the insulating layers”. Note: “a plurality of first circuit layers” is interpreted here as including both the wiring path and the insulative material burying the wiring. This interpretation is consistent with the number and arrangement of layers shown in Fig. 3 of Applicant’s disclosure), wherein the second circuit layer and each the first circuit layer are respectively located in different heights (the circuit layers are described in plurality and therefore must be separate and distinct layers. These layers must be at different heights with respect to one another in at least some direction); a plurality of conductive vias ([0025]: “a plurality of wiring via layers”) connecting the first circuit layer with the second circuit layer ([0025]: “electrically connecting the plurality of wiring layers to one another”); and a plurality of interposer conductive pillars (111D/112D), wherein one of the interposer conductive pillars (112D) is connected with one of the first circuit layers (at least indirectly connected), and another of the interposer conductive pillars (111D) is connected with another of the first circuit layers (at least indirectly connected). Regarding independent claim 9, Lee discloses a semiconductor device (Fig. 1), comprising: a substrate module (a collection of subsequently cited features), comprising: a first substrate (550); a plurality of substrate conductive pillars (310/211) formed on the first substrate (vertically on), wherein each substrate conductive pillar has an end surface (See annotated figure), and the end surfaces of the substrate conductive pillars are different in height (different vertical heights); a chip module (the collection of 420/320/220) having a plurality of lower surfaces (420S1/320S1/220S1), wherein the lower surfaces of the chip module are different in height (different vertical heights); wherein a first connection one of the substrate conductive pillars (an electrical path using 310) is connected to a first one of the lower surfaces of the chip module (connected to 320S1), and a second connection one of the substrate conductive pillars (an electrical path using 211) is connected to a second one of the lower surfaces of the chip module (connected to 220S1). Regarding claim 10, Lee discloses the semiconductor device according to claim 9 (Fig. 1), wherein the chip module comprising: a first chip (420) having a first lateral surface (See annotated figure); a second chip (320) comprising a first protrusion (See annotated figure) protruding with respect to the first lateral surface (horizontally protruding), wherein the first protrusion has the first one of the lower surfaces (the protrusion of 320 includes a portion of surface 320S1); wherein the first connection one of the substrate conductive pillars connects the first protrusion with the first substrate (the cited first connection uses pillar 310 to connect the protrusion of 320 to substrate 550). Regarding claim 11, Lee discloses the semiconductor device according to claim 10 (Fig. 1), wherein the second chip has a second lateral surface (See annotated figure) and further comprises: a third chip (220) disposed on the second chip (vertically on) and comprising a second protrusion (See annotated figure) protruding with respect to the second lateral surface (horizontally protruding), wherein the second protrusion has the second one of the lower surfaces (the protrusion of 220 includes a portion of surface 220S1); wherein the second one of the substrate conductive pillars connects the second protrusion with the first substrate (the cited second connection uses pillar 211 to connect the protrusion of 220 to substrate 550). Regarding claim 12, Lee discloses the memory device according to claim 10 (Fig. 1), wherein the first chip comprises a dummy pad (See annotated figure), the second chip comprises a dummy bump (341D; [0041]: “dummy bump”), and the dummy bump is connected to the dummy pad (directly connected). Regarding claim 13 as noted in the 112(b) rejection, Lee discloses the semiconductor device according to claim 10 (Fig. 1), wherein the second chip has the first one of the lower surfaces (chip 320 has lower surface 320S1), the first chip has an upper surface (chip 420 has upper surface 420S2), there is an interval (See annotated figure) between the upper surface and the first one of the lower surfaces of the second chip (vertically between), and the semiconductor device further comprises: a molding compound (330) filling the interval. Regarding claim 14, Lee discloses the semiconductor device according to claim 13 (Fig. 1), further comprising: an interposer module (101), comprising: a second substrate ([0024]: “a core material”); and a plurality of interposer conductive pillars (111D/112D) formed on the second substrate (vertically on), wherein each interposer conductive pillar has an end surface (See annotated figure), and the end surfaces of the interposer conductive pillars are different in height (different vertical heights); wherein one of the interposer conductive pillars (112D) is connected to one of the first substrate, the first chip and the second chip (pillar 112D is connected to the first chip 420), and another of the interposer conductive pillars (111D) is connected to another of the first substrate, the first chip and the second chip (pillar 111D is connected to the second chip 320). Regarding independent claim 16, Lee discloses a semiconductor device (Fig. 1), comprising: a first substrate (550); a chip module (a collection of chips 420/320/220) disposed on the first substrate (vertically on) and having a plurality of upper surfaces (420S2/320S2/220S2), wherein the surfaces of the chip module are different in height (different vertical heights); an interposer module (101), comprising: a second substrate ([0024]: “a core material”); and a plurality of interposer conductive pillars (111D/112D/113D) formed on the second substrate (vertically on), wherein each interposer conductive pillar has an end surface (See annotated figure), and the end surfaces of the interposer conductive pillars are different in height (different vertical heights); wherein a first one of the interposer conductive pillars (113D) is connected to the first substrate (directly connected), and a second one of the interposer conductive pillars (112D) is connected to one of the upper surfaces of the chip module (pillar 112D is connected to upper surface 420S2). Regarding claim 17, Lee discloses the semiconductor device according to claim 16 (Fig. 1), wherein the chip module comprising: a first chip (420) comprising a protrusion (See annotated figure); a second chip (320) having a lateral surface (See annotated figure); wherein the protrusion of the first chip protrudes with respect to the lateral surface of the second chip (horizontally protruding), and the second one of the interposer conductive pillars is connected to the protrusion (pillar 112D is connected to the protrusion of chip 420). Regarding claim 18, Lee discloses the semiconductor device according to claim 17 (Fig. 1), further comprising: a first substrate conductive pillar (441) connecting the first chip with the first substrate. Regarding claim 19, Lee discloses the semiconductor device according to claim 16 (Fig. 1), further comprising: a molding compound (430/330/230/130) formed on the first substrate and encapsulating the chip module and the interposer module. Regarding claim 20, Lee discloses the semiconductor device according to claim 16 (Fig. 1), wherein the interposer module further comprises: a plurality of first circuit layers (one layer of a plurality; [0025]: “a plurality of wiring layers buried in the insulating layers”. Note: “a plurality of first circuit layers” is interpreted here as including both the wiring path and the insulative material burying the wiring. This interpretation is consistent with the number and arrangement of layers shown in Fig. 3 of Applicant’s disclosure); a second circuit layer (another layer of a plurality; [0025]: “a plurality of wiring layers buried in the insulating layers”. Note: “a plurality of first circuit layers” is interpreted here as including both the wiring path and the insulative material burying the wiring. This interpretation is consistent with the number and arrangement of layers shown in Fig. 3 of Applicant’s disclosure), wherein the second circuit layer and each the first circuit layer are respectively located in different heights (the circuit layers are described in plurality and therefore must be separate and distinct layers. These layers must be at different heights with respect to one another in at least some direction); a plurality of conductive vias ([0025]: “a plurality of wiring via layers”) connecting the first circuit layer with the second circuit layer ([0025]: “electrically connecting the plurality of wiring layers to one another”); wherein one of the interposer conductive pillars (112D) is connected with one of the first circuit layers (at least indirectly connected), and another of the interposer conductive pillars (111D) is connected with another of the first circuit layers (at least indirectly connected). Claims 1, 7, 9, and 15 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Yoo (US 20190067248 A1). Regarding claim 1, Yoo discloses a semiconductor device (Fig. 3A), comprising: a first substrate (330); a first chip (310) disposed on the first substrate (vertically on) and having a first lateral surface (See annotated figure); and a second chip (320) disposed on the first chip (vertically on) and comprising a first protrusion (324) protruding with respect to the first lateral surface (horizontally protruding); a first substrate conductive pillar (306) connecting the first protrusion with the first substrate. Illustrated below is a marked and annotated figure of Fig. 3A of Yoo. PNG media_image2.png 371 891 media_image2.png Greyscale Regarding claim 7, Yoo discloses the semiconductor device according to claim 1 (Fig. 3A), further comprising: a metal wire (304) connecting the first substrate with the first chip. Regarding independent claim 9, Yoo discloses a semiconductor device (Fig. 3A), comprising: a substrate module (a collection of subsequently cited features), comprising: a first substrate (330); a plurality of substrate conductive pillars (306/376) formed on the first substrate (vertically on), wherein each substrate conductive pillar has an end surface (See annotated figure), and the end surfaces of the substrate conductive pillars are different in height (different vertical heights); a chip module (the collection of 310/320/360/370) having a plurality of lower surfaces (313b/323b/363b/373b), wherein the lower surfaces of the chip module are different in height (different vertical heights); wherein a first connection one of the substrate conductive pillars (the connection of pillar 306) is connected to a first one of the lower surfaces of the chip module (pillar 306 is connected to lower surface 323b), and a second connection one of the substrate conductive pillars (the connection of pillar 376) is connected to a second one of the lower surfaces of the chip module (pillar 376 is connected to lower surface 373b). Regarding claim 15, Yoo discloses the semiconductor device according to claim 9 (Fig. 3A), further comprising: a metal wire (304) connecting the first substrate with the first chip. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM H ANDERSON whose telephone number is (571)272-2534. The examiner can normally be reached Monday-Friday, 8:00-5:00. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Kretelia Graham can be reached at (571) 272-5055. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM H ANDERSON/ Examiner, Art Unit 2817
Read full office action

Prosecution Timeline

Aug 07, 2023
Application Filed
Dec 23, 2025
Non-Final Rejection mailed — §102, §112
Feb 19, 2026
Response Filed
Mar 11, 2026
Final Rejection mailed — §102, §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12642063
SEMICONDUCTOR DEVICE INCLUDING ISOLATION STRUCTURE WITH IMPURITY AND METHOD FOR MANUFACTURING THE SAME
3y 1m to grant Granted May 26, 2026
Patent 12635575
SEMICONDUCTOR DEVICE COMPRISING A STACK OF CHIPS, AND CHIPS FOR SUCH A STACK
3y 1m to grant Granted May 19, 2026
Patent 12610516
Semiconductor Structure and Method Making the Same
3y 2m to grant Granted Apr 21, 2026
Patent 12568648
BACKSIDE SOURCE/DRAIN CONTACTS AND METHODS OF FORMING THE SAME
4y 2m to grant Granted Mar 03, 2026
Patent 12564081
ELECTRONIC DEVICE AND SEMICONDUCTOR DEVICE WITH WIRING GROUPS FOR PARALLEL SIGNAL TRANSMISSION
3y 2m to grant Granted Feb 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
86%
Grant Probability
99%
With Interview (+15.4%)
2y 6m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 203 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month