Prosecution Insights
Last updated: April 19, 2026
Application No. 18/370,283

SEMICONDUCTOR CHIP, SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME

Non-Final OA §102
Filed
Sep 19, 2023
Examiner
VU, VU A
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
92%
Grant Probability
Favorable
1-2
OA Rounds
2y 0m
To Grant
99%
With Interview

Examiner Intelligence

Grants 92% — above average
92%
Career Allow Rate
1208 granted / 1309 resolved
+24.3% vs TC avg
Moderate +7% lift
Without
With
+6.6%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
48 currently pending
Career history
1357
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
44.5%
+4.5% vs TC avg
§102
34.4%
-5.6% vs TC avg
§112
12.5%
-27.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1309 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-2 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lin et al. (U.S. Patent No. 8,779,599). Regarding to claim 1, Lin teaches a semiconductor device comprising: a first semiconductor chip (Fig. 1A, Fig. 6), the first semiconductor chip comprising: a first semiconductor substrate having a first surface and a second surface opposite to the first surface, and having a first active layer adjacent to the first surface, the first semiconductor substrate having a quadrangle shape from a plan view (Fig. 1A, Fig. 6, element 38, column 2, lines 33-34, the first surface is the bottom surface, the second surface is the top surface); a first through electrode penetrating at least a portion of the first semiconductor substrate and connected to the first active layer (Fig. 6, element 36, column 2, lines 33-34); a second chip connection pad on the second surface of the first semiconductor substrate and connected to the first through electrode (Fig. 6, element 32, column 2, lines 23-24); a first dummy pattern positioned outside the second chip connection pad on the second surface of the first semiconductor substrate from the plan view, the first dummy pattern comprising a line pattern extending horizontally along the second surface of the first semiconductor substrate (Fig. 1A, Fig. 6, element 30B, column 2, line 5); and a first chip connection pad on the first surface of the first semiconductor substrate and connected to the first through electrode (Fig. 6, element 54; column 3, line 60), wherein the first dummy pattern is disposed adjacent to at least one side of four sides of the quadrangle shape of the first semiconductor substrate from the plan view (Figs. 1A-B). Regarding to claim 2, Lin teaches the first dummy pattern comprises a plurality of dummy patterns disposed on the same plane, and the dummy patterns comprise a plurality of line patterns disposed adjacent to the four sides of the quadrangle shape of the first semiconductor substrate from the plan view and spaced apart from each other (Fig. 1A, the first dummy pattern comprises a plurality of dummy patterns 30B disposed on the same plane, and the dummy patterns comprise a plurality of line patterns disposed adjacent to the four sides of the quadrangle shape of the first semiconductor substrate from the plan view and spaced apart from each other). PNG media_image1.png 698 661 media_image1.png Greyscale Claims 21-23 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Chuang et al. (U.S. Patent No. 11,018,113). Regarding to claim 21, Chuang teaches a semiconductor device comprising: a first semiconductor chip (Fig. 1M, element 320), the first semiconductor chip comprising: a first semiconductor substrate having a first surface and a second surface opposite to the first surface, and having a first active layer adjacent to the first surface (Fig. 1M, column 9, lines 25-27, the first surface is the bottom surface in the figure, the second surface is the top surface), the first semiconductor substrate having a quadrangle shape from a plan view (Fig. 2); a plurality of first through electrodes penetrating at least a portion of the first semiconductor substrate and connected to the first active layer (Fig. 1M, the through vias through the substrate, please see the attached reproduced figure 1M with annotations); a plurality of second chip connection pads on the second surface of the first semiconductor substrate and respectively connected to the plurality of first through electrodes (Fig. 1M, please see the attached reproduced figure 1M with annotations); a plurality of protruding line patterns positioned outside the plurality of second chip connection pads on the second surface of the first semiconductor substrate from the plan view, each line pattern of the plurality of protruding line patterns extending horizontally along the second surface of the first semiconductor substrate (Fig. 1M, elements 280, please see Fig. 2 for plan view); and a plurality of first chip connection pads on the first surface of the first semiconductor substrate and respectively connected to the plurality of first through electrodes (Fig. 1M, please see the attached reproduced figure 1M with annotations), wherein the plurality of protruding line patterns are disposed adjacent to respective sides of the quadrangle shape of the first semiconductor substrate from the plan view (Fig. 2, layer 130 in the figure is on top and has same shape with element 280). PNG media_image2.png 715 1706 media_image2.png Greyscale Regarding to claim 22, Chuang teaches each protruding line pattern of the plurality of protruding line patterns has a bar shape extending adjacent to a respective side of the quadrangle shape along only a portion of the respective side (Fig. 1M, Fig. 2). Regarding to claim 23, Chuang teaches the plurality of protruding line patterns are formed of the same material as the first semiconductor substrate or of a different, insulating material (Fig. 1M, protruding line patterns 280 are molding material, which is different from the semiconductor material). Claims 21-26 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Chuang et al. (U.S. Patent No. 11,018,113, different from the rejection above with same reference, in this rejection, other elements of the reference are cited for satisfying the requirements of dependent claims). Regarding to claim 21, Chuang teaches a semiconductor device comprising: a first semiconductor chip (Fig. 1L, please see the attached reproduced figure 1L with annotations), the first semiconductor chip comprising: a first semiconductor substrate having a first surface and a second surface opposite to the first surface, and having a first active layer adjacent to the first surface (Fig. 1L, the fist semiconductor substrate including left and right elements 270, the first surface is the bottom surface in the figure, the second surface is the top surface), the first semiconductor substrate having a quadrangle shape from a plan view (Fig. 2); a plurality of first through electrodes penetrating at least a portion of the first semiconductor substrate and connected to the first active layer (Fig. 1L, the through vias through the substrate, please see the attached reproduced figure 1L with annotations); a plurality of second chip connection pads on the second surface of the first semiconductor substrate and respectively connected to the plurality of first through electrodes (Fig. 1L, please see the attached reproduced figure 1L with annotations); a plurality of protruding line patterns positioned outside the plurality of second chip connection pads on the second surface of the first semiconductor substrate from the plan view, each line pattern of the plurality of protruding line patterns extending horizontally along the second surface of the first semiconductor substrate (Fig. 1L, elements 240, please see Fig. 2 for plan view); and a plurality of first chip connection pads on the first surface of the first semiconductor substrate and respectively connected to the plurality of first through electrodes (Fig. 1L, please see the attached reproduced figure 1L with annotations), wherein the plurality of protruding line patterns are disposed adjacent to respective sides of the quadrangle shape of the first semiconductor substrate from the plan view (Fig. 2, layer 130 in the figure is on top and has same shape with element 240). Regarding to claim 22, Chuang teaches each protruding line pattern of the plurality of protruding line patterns has a bar shape extending adjacent to a respective side of the quadrangle shape along only a portion of the respective side (Fig. 1L, Fig. 2). Regarding to claim 23, Chuang teaches the plurality of protruding line patterns are formed of the same material as the first semiconductor substrate or of a different, insulating material (Fig. 1L, protruding line patterns 240 are molding material, which is different from the semiconductor material). Regarding to claim 24, Chuang teaches a second semiconductor chip disposed on the second surface of the first semiconductor chip (Fig. 1L, please see the attached reproduced figure 1L with annotations); and an adhesive layer formed between the second semiconductor chip and the second surface of the first semiconductor chip (Fig. 1L, please see the attached reproduced figure 1L with annotations); wherein the adhesive layer surrounds and contacts the plurality of protruding line patterns (Fig. 1L). Regarding to claim 25, Chuang teaches the adhesive layer extends horizontally beyond side surfaces of the first semiconductor chip and the second semiconductor chip (Fig. 1L). Regarding to claim 26, Chuang teaches an encapsulation layer formed to surround the side surfaces of the first and second semiconductor chips and side surfaces of the adhesive layer (Fig. 1L, element 350). PNG media_image3.png 780 1794 media_image3.png Greyscale Allowable Subject Matter Claims 8-14, 17-20, and 27 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Regarding to claim 8, the prior art fails to anticipate or render obvious the claimed limitations including “a second semiconductor chip mounted on the first semiconductor chip; and a first adhesive layer disposed between the first semiconductor chip and the second semiconductor chip… wherein the first adhesive layer surrounds the second chip connection pad, the third chip connection pad, the first connection terminal, and the first dummy pattern” in combination with the limitations recited in claim 1 and the rest of limitations recited in claim 8. Regarding to claim 27, the prior art fails to anticipate or render obvious the claimed limitations including “plurality of protruding line patterns are dam structures that control the flow of an adhesive material that forms the adhesive layer” in combination with the limitations recited in claim 21 and claim 24. Pertinent Art For the benefits of the Applicant, US-9275968-B2, US-9299736-B2, US-9224697-B1, US-7547975-B2, US-8299633-B2, US-10818640-B1, US-10665582-B2, US-10043769-B2, US-11855003-B2, US-11239203-B2, US-11508707-B2, US-11145639-B2, and US-11901333-B2, are cited on the record as being pertinent to significant disclosure through some but not all claimed features of the defined invention. In particular, these references disclose most features of the claims but fail to disclose the combination of limitations including “a first dummy pattern positioned outside the second chip connection pad on the second surface of the first semiconductor substrate from the plan view, the first dummy pattern comprising a line pattern extending horizontally along the second surface of the first semiconductor substrate; wherein the first dummy pattern is disposed adjacent to at least one side of four sides of the quadrangle shape of the first semiconductor substrate from the plan view, a second semiconductor chip mounted on the first semiconductor chip; and a first adhesive layer disposed between the first semiconductor chip and the second semiconductor chip.” Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to VU A VU whose telephone number is (571)270-7467. The examiner can normally be reached M-F: 8:00AM - 5:00PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, CHAD M DICKE can be reached at (571) 270-7996. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /VU A VU/Primary Examiner, Art Unit 2897
Read full office action

Prosecution Timeline

Sep 19, 2023
Application Filed
Jan 12, 2026
Non-Final Rejection — §102
Feb 16, 2026
Interview Requested
Feb 23, 2026
Applicant Interview (Telephonic)
Feb 23, 2026
Examiner Interview Summary

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12604466
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
2y 5m to grant Granted Apr 14, 2026
Patent 12604714
LIFT-OFF METHOD
2y 5m to grant Granted Apr 14, 2026
Patent 12593656
HYBRID RELEASE LAYER FOR MICRODEVICE CARTRIDGE
2y 5m to grant Granted Mar 31, 2026
Patent 12593704
Three-Dimensional Semiconductor Device and Method
2y 5m to grant Granted Mar 31, 2026
Patent 12593147
STRUCTURES AND METHODS FOR PHASE DETECTION AUTO FOCUS
2y 5m to grant Granted Mar 31, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
92%
Grant Probability
99%
With Interview (+6.6%)
2y 0m
Median Time to Grant
Low
PTA Risk
Based on 1309 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month