Prosecution Insights
Last updated: April 19, 2026
Application No. 18/417,115

AIMING PLATE

Non-Final OA §102§103
Filed
Jan 19, 2024
Examiner
FERGUSON, MICHAEL P
Art Unit
3619
Tech Center
3600 — Transportation & Electronic Commerce
Assignee
Musco Corporation
OA Round
1 (Non-Final)
63%
Grant Probability
Moderate
1-2
OA Rounds
3y 2m
To Grant
99%
With Interview

Examiner Intelligence

Grants 63% of resolved cases
63%
Career Allow Rate
793 granted / 1253 resolved
+11.3% vs TC avg
Strong +74% interview lift
Without
With
+74.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
48 currently pending
Career history
1301
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
42.7%
+2.7% vs TC avg
§102
25.3%
-14.7% vs TC avg
§112
28.5%
-11.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1253 resolved cases

Office Action

§102 §103
DETAILED ACTION Election/Restrictions Applicant’s election without traverse of Species 1, Figures 67 and 68, claims 1-15, 17 and 18, in the reply filed on February 12, 2026 is acknowledged. Claims 16 and 19-21 str withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected species, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on February 12, 2026. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1, 2, 7 and 14 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Chengdu Yiming Semiconductor (CN 213146490). As to claim 1, Chengdu Yiming Semiconductor discloses an aiming plate comprising: a central hole 22 defining a central axis; a mounting hole A disposed about the central axis and away from the central hole a first minimum distance (Figure 1 reprinted below with annotations); and a first straight surface B that is spaced away from the central hole a second minimum distance that is larger than the first minimum distance (Figures 1-4). [AltContent: textbox (D)][AltContent: arrow][AltContent: textbox (E)][AltContent: arrow][AltContent: textbox (F)][AltContent: arrow][AltContent: textbox (C)][AltContent: arrow][AltContent: textbox (B)][AltContent: arrow][AltContent: textbox (A)][AltContent: arrow] PNG media_image1.png 194 185 media_image1.png Greyscale As to claim 2, Chengdu Yiming Semiconductor discloses an aiming plate comprising a second straight surface C that is parallel to the first straight surface B, and the first straight surface and the second straight defines a first plane and a second plane that do not intersect the central axis (Figures 1-4). As to claim 7, Chengdu Yiming Semiconductor discloses an aiming plate comprising: a central circular hole 22 defining a central axis, and a radial direction; a first mounting hole A disposed about the central axis and away from the central circular hole a first minimum distance; and a second mounting hole A disposed about the central axis and away from the central circular hole the first minimum distance; wherein the aiming plate defines a radially varying outer perimeter including an angle indicator D with a substantially radially extending surface (Figures 1-4). As to claim 14, Chengdu Yiming Semiconductor discloses an aiming plate comprising: a central circular hole 22 defining a central axis, and a radial direction; an array of mounting holes A disposed about the central circular hole; and an outer perimeter including a pair of arcuate surfaces E,F, and a pair of parallel surfaces B,C; wherein the pair of arcuate surfaces define a radius of curvature measured from the central axis to the pair of arcuate surfaces, and the pair of parallel surfaces are spaced away from central axis a minimum radial dimension, and a ratio of the radius of curvature to the minimum radial dimension ranges from 1.1 to 1.4 (Figures 1-4). Claims 1-14, 17 and 18 are rejected under 35 U.S.C. 102(a)(1) being anticipated by Byd (WO 2018/095289). As to claim 1, Byd discloses an aiming plate comprising: a central hole A defining a central axis (Figure 12b reprinted below with annotations); a mounting hole B disposed about the central axis and away from the central hole a first minimum distance; and a first straight surface C that is spaced away from the central hole a second minimum distance that is larger than the first minimum distance (Figures 1-3, 12a-12c). [AltContent: textbox (Y’)][AltContent: arrow][AltContent: textbox (F)][AltContent: arrow][AltContent: textbox (D)][AltContent: arrow][AltContent: textbox (B)][AltContent: arrow][AltContent: textbox (A)][AltContent: textbox (C)][AltContent: arrow][AltContent: textbox (Y)][AltContent: arrow][AltContent: textbox (X)][AltContent: arrow][AltContent: textbox (E)][AltContent: arrow][AltContent: arrow] PNG media_image2.png 523 544 media_image2.png Greyscale As to claim 2, Byd discloses an aiming plate comprising a second straight surface D that is parallel to the first straight surface C, and the first straight surface and the second straight defines a first plane and a second plane that do not intersect the central axis (Figures 1-3, 12a-12c). As to claim 3, Byd discloses an aiming plate comprising a first angle indicator 612 that extends from the first straight surface to a radial extremity of the aiming plate (Figures 1-3, 12a-12c). As to claim 4, Byd discloses an aiming plate wherein the first angle indicator 612 includes a third straight surface E that defines a plane that intersects the central axis (Figures 1-3, 12a-12c). As to claim 5, Byd discloses an aiming plate comprising a second angle indicator 612 that extends from the second straight surface D to a radial extremity of the aiming plate (Figures 1-3, 12a-12c). As to claim 6, Byd discloses an aiming plate wherein the second angle indicator 612 includes a fourth straight surface F that defines a plane that intersects the central axis (Figures 1-3, 12a-12c). As to claim 7, Byd discloses an aiming plate comprising: a central circular hole A defining a central axis, and a radial direction; a first mounting hole B disposed about the central axis and away from the central circular hole a first minimum distance; and a second mounting hole B disposed about the central axis and away from the central circular hole the first minimum distance; wherein the aiming plate defines a radially varying outer perimeter including an angle indicator 612 with a substantially radially extending surface (Figures 1-3, 12a-12c). As to claim 8, Byd discloses an aiming plate defining a third mounting hole B, and a fourth mounting hole B, forming a rectangular array centered about the central axis (Figures 1-3, 12a-12c). As to claim 9, Byd discloses an aiming plate wherein the rectangular array is a square array (Figures 1-3, 12a-12c). As to claim 10, Byd discloses an aiming plate wherein the radially varying outer perimeter includes a first notch X defined by a first segment defining a first segment length, and a second segment defining a second segment length that is less than the first segment length, and the rectangular array defines a major axis, and a minor axis (Figures 1-3, 12a-12c). As to claim 11, Byd discloses an aiming plate wherein the minor axis is parallel to the first segment (Figures 1-3, 12a-12c). As to claim 12, Byd discloses an aiming plate wherein the radially varying outer perimeter includes a first angle indicator 612 defining a radial extremity of the radially varying outer perimeter that is spaced a first minimum radial distance from the central axis, and a first flat surface C that is spaced a second minimum radial distance from the central axis, and a ratio of the first minimum radial distance to the second minimum radial distance ranges from 1.75 to 2.25 (Figures 1-3, 12a-12c). As to claim 13, Byd discloses an aiming plate comprising a second flat surface D that is parallel to the first flat surface C (Figures 1-3, 12a-12c). As to claim 14, Byd discloses an aiming plate comprising: a central circular hole A defining a central axis, and a radial direction; an array of mounting holes B disposed about the central circular hole; and an outer perimeter including a pair of arcuate surfaces Y,Y’, and a pair of parallel surfaces C,D; wherein the pair of arcuate surfaces define a radius of curvature measured from the central axis to the pair of arcuate surfaces, and the pair of parallel surfaces are spaced away from central axis a minimum radial dimension, and a ratio of the radius of curvature to the minimum radial dimension ranges from 1.1 to 1.4 (Figures 1-3, 12a-12c). As to claim 17, Byd discloses an aiming plate wherein the outer perimeter includes a first L-shaped cutout X (Figures 1-3, 12a-12c). As to claim 18, Byd discloses an aiming plate wherein the outer perimeter includes a second L-shaped cutout X that forms a circular array about the central axis with the first L-shaped cutout X (Figures 1-3, 12a-12c). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 15 is rejected under 35 U.S.C. 103 as being unpatentable over Chengdu Yiming Semiconductor. As to claim 15, Chengdu Yiming Semiconductor fails to explicitly disclose an aiming plate wherein the radius of curvature ranges from 2.25 inches to 2.75 inches. Chengdu Yiming Semiconductor does not disclose any structural or functional significance as to the specific radius of curvature of the aiming plate. Applicant is reminded that a change in the size of a prior art device, wherein there is no structural or functional significance disclosed as to the specific size of an element, is a design consideration within the skill of the art. In re Rose, 220 F.2d 459, 105 USPQ 237 (CCPA 1955). Accordingly, it would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to modify the aiming plate disclosed by Chengdu Yiming Semiconductor wherein the radius of curvature ranges from 2.25 inches to 2.75 inches, as Chengdu Yiming Semiconductor does not disclose any structural or functional significance as to the specific radius of curvature of the aiming plate, and as such change in size is a design consideration within the skill of the art that would yield expected and predictable results; and as it would be expected that one of ordinary skill in the art would routinely experiment to arrive at the optimum or workable dimensions for a given application. Claim 15 is rejected under 35 U.S.C. 103 as being unpatentable over Byd. As to claim 15, Byd fails to explicitly disclose an aiming plate wherein the radius of curvature ranges from 2.25 inches to 2.75 inches. Byd does not disclose any structural or functional significance as to the specific radius of curvature of the aiming plate. Applicant is reminded that a change in the size of a prior art device, wherein there is no structural or functional significance disclosed as to the specific size of an element, is a design consideration within the skill of the art. In re Rose, 220 F.2d 459, 105 USPQ 237 (CCPA 1955). Accordingly, it would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to modify the aiming plate disclosed by Byd wherein the radius of curvature ranges from 2.25 inches to 2.75 inches, as Byd does not disclose any structural or functional significance as to the specific radius of curvature of the aiming plate, and as such change in size is a design consideration within the skill of the art that would yield expected and predictable results; and as it would be expected that one of ordinary skill in the art would routinely experiment to arrive at the optimum or workable dimensions for a given application. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MICHAEL P FERGUSON whose telephone number is (571)272-7081. The examiner can normally be reached M-F (10:00 am-7:00 pm EST). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Anna Momper can be reached at (571)270-5788. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. 03/06/26 /MICHAEL P FERGUSON/Primary Examiner, Art Unit 3619
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Prosecution Timeline

Jan 19, 2024
Application Filed
Mar 06, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
63%
Grant Probability
99%
With Interview (+74.1%)
3y 2m
Median Time to Grant
Low
PTA Risk
Based on 1253 resolved cases by this examiner. Grant probability derived from career allow rate.

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