Prosecution Insights
Last updated: July 17, 2026
Application No. 18/420,231

INTEGRATED CIRCUIT (IC) PACKAGE WITH EMBEDDED POWER MANAGEMENT INTEGRATED CIRCUIT (PMIC)

Non-Final OA §103
Filed
Jan 23, 2024
Examiner
VALENZUELA, PATRICIA D
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Qualcomm Incorporated
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allowance Rate
647 granted / 717 resolved
+22.2% vs TC avg
Minimal +2% lift
Without
With
+2.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
63 currently pending
Career history
794
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
86.7%
+46.7% vs TC avg
§102
4.8%
-35.2% vs TC avg
§112
1.8%
-38.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 717 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-10,17-20 in the reply filed on 05/27/26 is acknowledged. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-10,17-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Choi(USPGPUB DOCUMENT: 2019/0385997, hereinafter Choi) in view of Elsherbini(USPGPUB DOCUMENT: 2023/0163098, hereinafter Elsherbini). Re claim 1 Choi discloses an integrated circuit (IC) package, comprising: a package substrate(102) including at least a first power node(left/right104) and a second power node(left/right104); an interposer(110) on the package substrate(102), the interposer(110) including: a insulating layer(110bd)[0048]; and a power management integrated circuit (PMIC(124)) embedded in the insulating layer(110bd)[0048], the PMIC(124) including a third power node(left/right126) and a fourth power node(left/right126), and the third power node(left/right126) being electrically coupled to the first power node(left/right104); and an IC die(120) on the interposer(110), the IC die(120) including a fifth power node(left/right122) and a sixth power node(left/right122), the fifth power node(left/right122) being electrically coupled to the fourth power node(left/right126), and the sixth power node(left/right122) being electrically coupled to the second power node(left/right104), wherein: the first power node(left/right104) and the third power node(left/right126) are configured to carry a first supply voltage[0130] having a first voltage level[0130], the fourth power node(left/right126) and the fifth power node(left/right122) are configured to carry a second supply voltage[0130] having a second voltage level[0130] different from the first voltage level[0130], the second power node(left/right104) and the sixth power node(left/right122) are configured to carry a third supply voltage[0130] having a third voltage level[0130] different from the first voltage level[0130] and the second voltage level[0130], and the PMIC(124) is configured to receive at the third power node(left/right126) the first supply voltage[0130], and output at the fourth power node(left/right126) the second supply voltage[0130]. Choi does not discloses the interposer(110) including: a dielectric layer(110bd)[0048]; the second power node(left/right104) and the sixth power node(left/right122) are configured to carry a third supply voltage having a ground voltage level or a third voltage level[0130] different from the first voltage level[0130] and the second voltage level[0130] Elsherbini discloses the interposer including: a dielectric layer(114)[0080]; the second power node(left/right122) and the sixth power node(left/right122) are configured to carry a third supply voltage[0104] having a ground voltage level[0097] or a third voltage level[0104] different from the first voltage level and the second voltage level[0104] It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Elsherbini to the teachings of Choi in order to minimize challenges in power delivery network (PDN) design [0024, Elsherbini]. Re claim 2 Choi and Elsherbini disclose the IC package of claim 1, wherein: the PMIC(124) is further configured to output at the fourth power node(left/right126) the second supply voltage[0130] based on the PMIC(124) being at a power-on mode and to set the fourth power node(left/right126) at an open-circuit state based on the PMIC(124) being at a power-off mode. Re claim 3 Choi and Elsherbini disclose the IC package of claim 1, wherein:the interposer(110) further comprises one or more conductive structures, the dielectric layer(110bd)[0048] surrounding the one or more conductive structures, andthe third power node(left/right126) is electrically coupled to the first power node(left/right104) through a first conductive structure of the one or more conductive structures. Re claim 4 Choi and Elsherbini disclose the IC package of claim 1, wherein the interposer(110) further comprises: a first interposer(110) metallization structure on one side of the dielectric layer(110bd)[0048] facing the package substrate(102), a second interposer(110) metallization structure on another side of the dielectric layer(110bd)[0048] facing the IC die(120), or a combination thereof. Re claim 5 Choi and Elsherbini disclose the IC package of claim 4, wherein: the first interposer(110) metallization structure comprises at least one conductive pattern under the PMIC(124). Re claim 6 Choi and Elsherbini disclose the IC package of claim 1, wherein: the interposer(110) further comprises a capacitive device(106 of Elsherbini) including a seventh power node and an eighth power node, the seventh power node is electrically coupled to the fourth power node(left/right126) and the fifth power node(left/right122), and the eighth power node is electrically coupled to the second power node(left/right104) and the sixth power node(left/right122). Re claim 7 Choi and Elsherbini disclose the IC package of claim 6, wherein the capacitive device(106 of Elsherbini) comprises: a deep trench capacitor structure, a metal-insulator-metal structure, a metal-oxide-metal structure, or a combination thereof. Re claim 8 Choi and Elsherbini disclose the IC package of claim 1, wherein the IC die(120) comprises: based on the IC die(120) at a face-up position with respect to the package substrate(102), a Page 3 of 9 metallization portion facing the interposer(110), a device portion on the metallization portion, and a substrate portion on the device portion;or based on the IC die(120) at a face-down position with respect to the package substrate(102), the substrate portion facing the interposer(110) and including backside conductive structures formed therein, a device portion on the substrate portion, and a metallization portion on the device portion. Re claim 9 Choi and Elsherbini disclose the IC package of claim 8, wherein: the third power node(left/right126) is electrically coupled to the first power node(left/right104) through a conductive pattern of the metallization portion of the IC die(120), a portion of the backside conductive structures, or a combination thereof. Re claim 10 Choi and Elsherbini disclose the IC package of claim 1, wherein a thickness of the interposer(110) ranges from 30 micrometers (pm) to 60 pm. Re claim 17 Choi discloses an electronic device, comprising: an integrated circuit (IC) package that comprises: a package substrate(102) including at least a first power node(left/right104) and a second power node(left/right104); an interposer(110) on the package substrate(102), the interposer(110) including: an insulating layer(110bd)[0048]; and a power management integrated circuit (PMIC(124)) embedded in the insulating layer(110bd)[0048], the PMIC(124) including a third power node(left/right126) and a fourth power node(left/right126), and the third power node(left/right126) being electrically coupled to the first power node(left/right104); and an IC die(120) on the interposer(110), the IC die(120) including, a fifth power node(left/right122) and a sixth power node(left/right122), the fifth power node(left/right122) being electrically coupled to the fourth power node(left/right126), and the sixth power node(left/right122) being electrically coupled to the second power node(left/right104), wherein: the first power node(left/right104) and the third power node(left/right126) are configured to carry a first supply voltage[0130] having a first voltage level[0130], the fourth power node(left/right126) and the fifth power node(left/right122) are configured to carry a second supply voltage[0130] having a second voltage level[0130] different from the first voltage level[0130], the second power node(left/right104) and the sixth power node(left/right122) are configured to carry a third voltage level[0130] different from the first voltage level[0130] and the second voltage level[0130], and the PMIC(124) is configured to receive at the third power node(left/right126) the first supply voltage[0130], and output at the fourth power node(left/right126) the second supply voltage[0130]. Choi does not discloses the interposer(110) including: a dielectric layer(110bd)[0048]; the second power node(left/right104) and the sixth power node(left/right122) are configured to carry a third supply voltage[0130] having a ground voltage level[0130] or a third voltage level[0130] different from the first voltage level[0130] and the second voltage level[0130], Elsherbini discloses the interposer including: a dielectric layer(114)[0080]; the second power node(left/right122) and the sixth power node(left/right122) are configured to carry a third supply voltage[0104] having a ground voltage level[0097] or a third voltage level[0104] different from the first voltage level and the second voltage level[0104], It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Elsherbini to the teachings of Choi in order to minimize challenges in power delivery network (PDN) design [0024, Elsherbini]. Re claim 18 Choi and Elsherbini disclose the electronic device of claim 17, wherein: the PMIC(124) is further configured to output at the fourth power node(left/right126) the second supply voltage[0130] based on the PMIC(124) being at a power-on mode and to set the fourth power node(left/right126) at an open-circuit state during based on the PMIC(124) being at a power-off mode. Re claim 19 Choi and Elsherbini disclose the electronic device of claim 17, wherein: the interposer(110) further comprises one or more conductive structures, the dielectric layer(110bd)[0048] surrounding the one or more conductive structures, and the third power node(left/right126) is electrically coupled to the first power node(left/right104) through a first conductive structure of the one or more conductive structures. Re claim 20 Choi and Elsherbini disclose the electronic device of claim 17, wherein the interposer(110) further comprises: a first interposer(110) metallization structure on one side of the dielectric layer(110bd)[0048] facing the package substrate(102), a second interposer(110) metallization structure on another side of the dielectric layer(110bd)[0048] facing the IC die(120), or a combination thereof. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to PATRICIA D VALENZUELA whose telephone number is (571)272-9242. The examiner can normally be reached Monday-Friday 10am-6pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at 571-270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /PATRICIA D VALENZUELA/Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jan 23, 2024
Application Filed
Jul 01, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12677712
SEMICONDUCTOR PACKAGE HAVING MULTIPLE REDISTRIBUTION LAYERS AND METHOD OF MAKING THE SAME
3y 0m to grant Granted Jul 07, 2026
Patent 12677656
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
2y 11m to grant Granted Jul 07, 2026
Patent 12672539
THIN FILM RESISTOR, THERMISTOR AND METHOD OF PRODUCING THE SAME
3y 0m to grant Granted Jun 30, 2026
Patent 12666951
SEMICONDUCTOR DEVICE
3y 1m to grant Granted Jun 23, 2026
Patent 12666952
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
3y 1m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
92%
With Interview (+2.1%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 717 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month