Prosecution Insights
Last updated: July 17, 2026
Application No. 18/422,928

PHOTOELECTRIC DEVICE BASED ON QUANTUM DOTS AND ITS MANUFACTURING METHOD

Non-Final OA §103
Filed
Jan 25, 2024
Priority
Jan 25, 2023 — RE 10-2023-0009313
Examiner
LIU, XIAOMING
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Kyung Hee University Industry Cooperation Group
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
514 granted / 596 resolved
+18.2% vs TC avg
Moderate +11% lift
Without
With
+10.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
36 currently pending
Career history
635
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
89.3%
+49.3% vs TC avg
§102
6.1%
-33.9% vs TC avg
§112
0.8%
-39.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 596 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-5 in the reply filed on 4/30/2026 is acknowledged. Information Disclosure Statement The information disclosure statement (IDS) submitted on 8/19/2024. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1 and 4-5 are rejected under 35 U.S.C. 103 as being unpatentable over Cho US 2021/0126159 in view of Abayomi et al. (Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor, Mater. Chem. C, 2020, 8, 3730—3739). Re claim 1, Cho teaches a photoelectric device based on quantum dots (fig10), comprising: a substrate (230, fig10, [76]); a zinc oxide layer (oxide semiconductor layer 210 as ZnO or SIZO a mixture of Si doped indium oxide and zinc oxide, fig10, [64, 76]) stacked on the substrate; a quantum dots (QDs) layer (QD, fig10, [76]) stacked on the zinc oxide layer; and a silicon oxide gate insulating layer (225, fig10, [71, 76]) stacked on the QDs layer. Cho does not explicitly show a zirconium oxide (ZrO2) layer stacked on the QDs layer, enabling stability in atmosphere and eliminating defects caused by ligands of the quantum dots. Abayomi teaches replacing SiO2 gate insulating layer with ZrO2 (conclusion, left col, page 3738). It would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to combine the teaching of Cho and Abayomi to use ZrO2 as the material of layer 225 in Cho fig10. The motivation to do so is to form a TFT with optimized performance (Abayomi, conclusion, left col, page 3738). Cho in view of Abayomi teaches a zirconium oxide (ZrO2) layer stacked on the QDs layer, enabling stability in atmosphere and eliminating defects caused by ligands of the quantum dots. "[A]pparatus claims cover what a device is, not what a device does." Hewlett-Packard Co. v. Bausch & Lomb Inc., 909 F.2d 1464, 1469, 15 USPQ2d 1525, 1528 (Fed. Cir. 1990). A claim containing a "recitation with respect to the manner in which a claimed apparatus is intended to be employed does not differentiate the claimed apparatus from a prior art apparatus" if the prior art apparatus teaches all the structural limitations of the claim. Ex parte Masham, 2 USPQ2d 1647 (Bd. Pat. App. & Inter. 1987). Cho in view of Abayomi teaches the device with the same structure of the claimed device and manner of operating the device does not differentiate apparatus claim from the prior art. Re claim 4, Cho in view of Abayomi teaches the photoelectric device of claim 1, wherein the zirconium oxide layer is formed by a spin coating process (Abayomi, conclusion, left col, page 3738). Re claim 5, Cho in view of Abayomi teaches the photoelectric device of claim 1,wherein as a result of durability experiments under relative humidity conditions of 40% or less, electrical/photo reactivity properties of the photoelectric device are improved sixfold compared to a photoelectric device without the zirconium oxide layer. "[A]pparatus claims cover what a device is, not what a device does." Hewlett-Packard Co. v. Bausch & Lomb Inc., 909 F.2d 1464, 1469, 15 USPQ2d 1525, 1528 (Fed. Cir. 1990). A claim containing a "recitation with respect to the manner in which a claimed apparatus is intended to be employed does not differentiate the claimed apparatus from a prior art apparatus" if the prior art apparatus teaches all the structural limitations of the claim. Ex parte Masham, 2 USPQ2d 1647 (Bd. Pat. App. & Inter. 1987). Cho in view of Abayomi teaches the device with the same structure of the claimed device and manner of operating the device does not differentiate apparatus claim from the prior art. Allowable Subject Matter Claim 2 and 3 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim. Specifically, the limitations are material to the inventive concept of the application in hand to form an optoelectrical device with high efficiency by using a ZrO2 channel material. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to XIAOMING LIU whose telephone number is (571)270-0384. The examiner can normally be reached Monday-Friday, 9am-8pm, EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine S Kim can be reached at (571)272-8458. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /XIAOMING LIU/Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jan 25, 2024
Application Filed
Jun 29, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
97%
With Interview (+10.9%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 596 resolved cases by this examiner. Grant probability derived from career allowance rate.

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