Prosecution Insights
Last updated: April 19, 2026
Application No. 18/432,073

CAPACITANCE MEASUREMENT METHOD FOR A CAPACITIVE DEVICE

Non-Final OA §102§103
Filed
Feb 05, 2024
Examiner
HE, AMY
Art Unit
2858
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
UNITED MICROELECTRONICS CORPORATION
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 10m
To Grant
85%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allow Rate
425 granted / 523 resolved
+13.3% vs TC avg
Minimal +4% lift
Without
With
+4.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 10m
Avg Prosecution
20 currently pending
Career history
543
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
44.6%
+4.6% vs TC avg
§102
36.7%
-3.3% vs TC avg
§112
9.4%
-30.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 523 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Objections Claims 1 and 3 are objected to because of the following informalities: In claim 1, line 4, replace the typo “correction test pads” with –calibration test pads--. In claim 3, inserted --test pad—after “the second calibration” on line 9. Appropriate corrections are required. In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-5 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Wu (U. S. Patent 6,872,583). As for claim 1, Wu discloses (see Figs. 2A, 2B, 3A and 3B; col. 3, line 1—col. 4, line 20) a capacitance measurement method for a capacitive device (114), comprising: providing a wafer (205), wherein the wafer is formed with the capacitive device (114), and the wafer (205) is provided with a set of calibration test pads (dummy pads 122, 123) and a set of test pads (pads 112, 113); applying a test signal (using probe card 230) to the set of calibration test pads (122, 123) through a first test path to measure a first capacitance between two calibration test pads (122, 123) in the set of calibration test pads (see col. 3, lines 40-50); applying the test signal (using the probe card 230) to the set of test pads (112, 113) through a second test path to measure a second capacitance between two test pads in the set of test pads (see col. 3, line 63—col. 4, line 9), wherein the capacitive device (114) is coupled between the two test pads (112, 113); and obtaining a capacitance of the capacitive device (114) based on a difference between the first capacitance and the second capacitance (i.e., by subtract the parasitic capacitance or zeroing-out the effect of the parasitic capacitance, see col. 3, line 1—col. 4, line 9). As for claim 2, Wu discloses the capacitance measurement method according to claim 1, further comprising: measuring a voltage value between the two calibration test pads (122, 123) and a current value flowing between the two calibration test pads (122, 123) based on the test signal, and calculating the first capacitance based on a time variation rate of the voltage value and the current value; and measuring a voltage value between the two test pads (112, 113) and a current value flowing between the two test pads (112, 113) based on the test signal, and calculating the second capacitance based on a time variation rate of the voltage value and the current value (col. 3, line 1—col. 4, line 9). As for claim 3, Wu discloses the capacitance measurement method according to claim 1, wherein a connection line between a center point of a first calibration test pad (122)of the two calibration test pads and a center point of a first test pad (112) of the two test pads is a first connection line, a connection line between a center point of a second calibration test pad (123) of the two calibration test pads and a center point of a second test pad (113) of the two test pads is a second connection line, the first connection line and the second connection line are parallel with each other, and a distance between the center point of the first calibration test pad (122)of the two calibration test pads and the center point of the first test pad (112) of the two test pads is equal to a distance between the center point of the second calibration test pad (123) of the two calibration test pads and the center point of the second test pad (113) of the two test pads (see Figs. 2A, 2B and 3A, 3B, wherein the dummy structure 120 is identical to the test structure 110; col. 3, lines 29—40). As for claim 4, Wu discloses the capacitance measurement method according to claim 1, a distance between respective center points of the two calibration test pads (122, 123) in the set of calibration test pads is equal to a distance between respective center points of the two test pads (112, 113) in the set of test pads (see Figs. 2A, 2B, 3A, 3B wherein the dummy structure 120 is identical to the test structure 110; col. 3, lines 29—40). As for claim 5, Wu discloses the capacitance measurement method according to claim 1, wherein a size of each of the two calibration test pads in the set of calibration test pads (122, 123) is the same as a size of each of the two test pads in the set of test pads (112, 113) (see col. 3, lines 29-40). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 6-14 are rejected under 35 U.S.C. 103 as being unpatentable over Wu (U. S. Patent 6,872,583). As for claims 7, 12 and 13, Wu discloses (see Figs. 2A, 2B, 3A and 3B; col. 3, line 1—col. 4, line 20) a capacitance measurement method for a capacitive device (114), comprising: providing a wafer (205), wherein the wafer is formed with the capacitive device (114), and the wafer (205) is provided with a set of calibration test pads (122, 123) and a set of test pads (112, 113); providing a test probe card (probe card 230); applying a test signal (by using the probe card 230) to the set of calibration test pads (122, 123) to make the test probe card (230) be coupled to the set of calibration test pads (122, 123), so as to measure a first capacitance between the two calibration test pads in the set of calibration test pads (see col. 3, lines 40-50); applying the test signal (by using the probe card 230) to the set of test pads (112, 113) to make the test probe card (230) be coupled to the set of test pads, so as to measure a second capacitance between the two test pads in the set of test pads (see col. 3, line 63—col. 4, line 9), wherein the capacitive device (114) is coupled between the two test pads (112, 113); obtaining a capacitance of the capacitive device based on a difference between the first capacitance and the second capacitance (i.e., by subtract the parasitic capacitance or zeroing-out the effect of the parasitic capacitance, see col. 3, line 1—col. 4, line 9). Still referring to claims 7, 12 and 13, Wu does not explicitly disclose using a switch device provided on the test probe card, for selectively applying the test signal to either the set of calibration test pads or to the set of test pads; wherein the switch device is a relay switch or a transistor switch. It would have been obvious to a person of ordinary skill in the art, before the effective filing date of the claimed invention to modify Wu to disclose using a conventional switch device, such as a relay switch or a transistor switch, to apply the test signal to either the set of calibration test pads or the set of test pads, for the purpose of automatically and selectively connecting and applying the test signals to the dummy test structure or the test structure in Wu, or the probe card having a plurality of probes can be selectively coupled to all of the dummy and test pads for simultaneously measuring all the capacitance measurements (see col. 4, lines 15-21). As for claim 8, Wu discloses the capacitance measurement method according to claim 7, further comprising: measuring a voltage value between the two calibration test pads (122, 123) and a current value flowing between the two calibration test pads (122, 123) based on the test signal, and calculating the first capacitance based on a time variation rate of the voltage value and the current value; and measuring a voltage value between the two test pads (112, 113) and a current value flowing between the two test pads (112, 113) based on the test signal, and calculating the second capacitance based on a time variation rate of the voltage value and the current value (col. 3, line 1—col. 4, line 9). As for claim 9, Wu discloses the capacitance measurement method according to claim 7, a distance between respective center points of the two calibration test pads (122, 123) in the set of calibration test pads is equal to a distance between respective center points of the two test pads (112, 113) in the set of test pads (see Figs. 2A, 2B, 3A, 3B wherein the dummy structure 120 is identical to the test structure 110; col. 3, lines 29—40). As for claim 10, Wu discloses the capacitance measurement method according to claim 7, wherein a size of each of the two calibration test pads in the set of calibration test pads (122, 123) is the same as a size of each of the two test pads in the set of test pads (112, 113) (see col. 3, lines 29-40). As for claim 11, Wu discloses the capacitance measurement method according to claim 7, wherein providing the test probe card (230) further comprises: providing a first set of test probes and a second set of test probes on the test probe card (col. 4, lines 18-21); switching to the first set of test probes by operating the switch device so that the first set of test probes (232, 233) is coupled to the set of calibration test pads (122, 123); and switching to the second set of test probes by operating the switch device so that the second set of test probes (232, 233) is coupled to the set of test pads (112, 113). As for claims 6 and 14, Wu discloses the capacitance measurement method according to claims 1 and 7, wherein the capacitive device (114, transistor) is tested. Wu does not explicitly disclose that the capacitive device tested is a deep trench capacitor. It would have been obvious to a person of ordinary skill in the art, before the effective filing date of the claimed invention to modify Wu to disclose that the capacitive device is a deep trench capacitor, for the purpose of accurately testing the deep trench capacitor, or any other desired types of capacitive device by cancelling out the effect of the parasitic capacitance in the capacitive measurement result (see Wu, col. 2, lines 48-67). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Liu (U. S. Pub. 2020/0207618) discloses a method of measuring a capacitance between a detection structure and the substrate and measuring a second capacitance between a reference structure and substrate and compute capacitance difference between the two (see Figs. 4, 8 and 9). Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMY HE whose telephone number is (571)272-2230. The examiner can normally be reached 9:00am--5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Huy Phan can be reached at (571) 272-7924. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AMY HE/Primary Examiner, Art Unit 2858
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Prosecution Timeline

Feb 05, 2024
Application Filed
Feb 09, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
85%
With Interview (+4.1%)
2y 10m
Median Time to Grant
Low
PTA Risk
Based on 523 resolved cases by this examiner. Grant probability derived from career allow rate.

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