Prosecution Insights
Last updated: April 19, 2026
Application No. 18/446,507

METHOD FOR FORMING CAPACITOR AND SEMICONDUCTOR DEVICE

Non-Final OA §102§103
Filed
Aug 09, 2023
Examiner
PHAM, THANHHA S
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Changxin Memory Technologies Inc.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
90%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allow Rate
742 granted / 872 resolved
+17.1% vs TC avg
Minimal +5% lift
Without
With
+4.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
22 currently pending
Career history
894
Total Applications
across all art units

Statute-Specific Performance

§103
33.6%
-6.4% vs TC avg
§102
35.5%
-4.5% vs TC avg
§112
23.4%
-16.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 872 resolved cases

Office Action

§102 §103
DETAILED ACTION This Office Action is in response to Applicant’s Election dated 12/6/2025. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Claims 1-10 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention. Election was made without traverse in the reply filed on 12/6/25. Applicant’s election without traverse of claims 11-18 in the reply filed on 12/6/25 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 11-16 are rejected under 35 U.S.C. 102(a)(1) and 102(a)(2) as being anticipated by Yoon et al [US 2013/0005110] ► With respect to claim 11, Yoon et al (fig 14, text [0001]-[0095]) discloses the claimed semiconductor device comprising: at least a base (120) and a capacitor; wherein the capacitor (text [0066]-[0068]) comprises: a first supporting layer (152s), a second supporting layer (154s) and a third supporting layer (156s) disposed sequentially parallel to the base; first electrode layers (180) disposed perpendicular to the base and penetrating the first supporting layer, the second supporting layer and the third supporting layer, wherein filling sub-layers (175) are disposed between the second supporting layer and the first electrode layers; a dielectric layer (182) covering surfaces of the first electrode layers, the first supporting layer, the second supporting layer and the third supporting layer; and a second electrode layer (184) covering a surface of the dielectric layer. ► With respect to claim 12, Yoon et al (text [0029]) discloses conductive structures (130) located in the base and connected with the first electrode layers. ► With respect to claim 13, Yoon et al (text [0034]) discloses wherein a material of the first supporting layer, the second supporting layer, or the third supporting layer comprises at least one of silicon oxide, silicon nitride, silicon carbonitride, or silicon oxynitride. ► With respect to claim 14, Yoon et al (text [0051]) discloses a material of the first electrode layers or the second electrode layer comprises at least one of metal nitride or metal silicide. ► With respect to claim 15, Yoon et al (text [0066]) discloses a material of the dielectric layer comprises at least one of zirconium oxide, hafnium oxide, zirconium titanium oxide, ruthenium oxide, antimony oxide, or aluminum oxide. ► With respect to claim 16, Yoon et al (text [0049]) discloses a material of the filling sub-layers comprises silicon oxide, silicon nitride, silicon carbonitride or silicon oxynitride. ► With respect to claim 17, Yoon et al discloses the second supporting layer and the first electrode layers are not in direct contact, the filling sub-layers (175) are blocks between the second supporting layer. Interpreting the claim in broad scope when materials of the first supporting layer, the third supporting layer and the filling sub-layers are the same, claimed structure of figure 14 of Yoon et al discloses the first supporting layer and the first electrode layers are in direct contact, the third supporting layer and the first electrode layers are in direct contact (the first supporting layer 152s/175 & the third supporting layer 156s/175 when materials of 152s, 175 & 156s are the same) Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 18 is rejected under 35 U.S.C. 103 as being unpatentable over Yoon et al [US 2013/0005110] in view of Wang et al [WO 2021/175154] ► With respect to claim 18, the claimed width of the second supporting layer relative the the claimed width of the first supporting layer or the third supporting layer would have been obvious to an ordinary artisan practicing the invention because, absent evidence of disclosure of criticality for the range giving unexpected results, it is not inventive to discover optimal or workable ranges by routine experimentation. In re Aller, 220 F.2d 454, 105 USPQ 233, 235 (CCPA 1955). Furthermore, it appears that these changes produce no functional differences and therefore would have been obvious. See In re Woodruff, 919 F.2d 1575, 1578, 16 USPQ2d 1934, 1936 (Fed. Cir. 1990). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to THANHHA S PHAM whose telephone number is (571)272-1696. The examiner can normally be reached Monday-Friday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at 571-270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /THANHHA S PHAM/Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Aug 09, 2023
Application Filed
Jan 09, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
90%
With Interview (+4.9%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 872 resolved cases by this examiner. Grant probability derived from career allow rate.

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