Prosecution Insights
Last updated: April 19, 2026
Application No. 18/448,505

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Non-Final OA §103
Filed
Aug 11, 2023
Examiner
WALKE, AMANDA C
Art Unit
1722
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Fujifilm Corporation
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
2y 7m
To Grant
97%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allow Rate
1488 granted / 1681 resolved
+23.5% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
52 currently pending
Career history
1733
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
51.0%
+11.0% vs TC avg
§102
23.1%
-16.9% vs TC avg
§112
15.2%
-24.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1681 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kawabata et al (JP 2015-138232 and its machine translation). Kawabata et al disclose a resist composition comprising a resin comprising a unit having a sulfonic acid salt falling within the scope of the instant claims and the ionic group of unit (a). The exemplified resins P-15 to P-20 include units having a sulfonic acid having a molecular weight of less than 300 when the cation / leaving group is replaced with a hydrogen to form an acid as required by the instant claim 1 (see especially P-15, having a structure as exemplified compounds, [0137]-[0152]; see pages 22-26 of the instant specification, and that of P-15 has a MW of 200 or less; instant claims 1, 2). The content of the unit is preferably 1 to 40 mol% of the polymer repeat units. The unit included in P-15 falls within the instant formula (1) of instant claims 5, 6, and 20. PNG media_image1.png 70 54 media_image1.png Greyscale In the formula, instant A is CH=CH, L is aryl/ divalent linking group, and Z is a sulfonium cation. With respect to the amount of ionic group, the claim sets forth two amounts; one for when the composition comprises only the ionic group-containing unit as acid generator, and another for an instance when the composition comprises both the ionic group-containing unit, and an acid generator (PAG). Kawabata et al disclose that the composition usually comprises a PAG, wherein the compound preferably has a molecular weight of 1000 or less, in an amount preferably 0.1 to 50 % by mas with respect to the total solid content of the composition ([0168]-[0211]). While the reference materials do not specifically teach the amounts of the unit as claimed, given the taught ranges of PAG and unit in the polymer, it appears as though the amounts fall within the scope of the instant claim 1, that being the unit or unit and PAG combined, are present in an amount of 0.50 mmol/g or more. Alternatively, one of ordinary skill in the art would have arrived at the claimed amounts as set forth by the instant claim 1, but also claims 12 and 13 (0.7 and 1.0 mmol/g, respectively), through routine experimentation and optimization of resist properties such as resist sensitivity and resolution which result in more accurate patterns. The PAG with a molecular weight of less than 1,000 is a low molecular weight compound (As defined by the instant specification [0182]; instant claims 3, 4, 18, 19). The resin changes solubility in developer (instant claim 7) further comprises additional units such as those meeting the limitations of the instant (A2) in claim 8, and units with phenolic hydroxyl groups and carboxyl groups (instant claim 9) falling within the scope of the instant (6) and (7) of the instant claims 10 and 11: PNG media_image2.png 82 42 media_image2.png Greyscale PNG media_image3.png 62 42 media_image3.png Greyscale R101 to R103 are H or alkyl, LA is a single bond or -C(=O)O, ArA is phenyl. PNG media_image4.png 116 146 media_image4.png Greyscale Wherein the first unit is of (6), with instant R22 to R24 H (or alkyl), L4 is a single bondar is phenyl, R25 and R26 are alkyl or H, and R27 is alkyl group having a heteroatom. In the second monomer, R28-R30 are H or alkyl, L5 is a single bond, R31 and R32 are alkyl or H, and R33 is cycloalkyl (as examples, may be alkyl or other groups in the broader formula; instant claims 9-11). The rest further comprises a nitrogen-containing basic compound (degradable base, instant claim 14; [0219]-[0238]). The resist composition is included in a patterning method including applying the resist to a substrate, drying/ pre-baking to form a film, exposing to radiation, and developing as required by the instant claims 15-17 (see examples [0297]-[0304]). Given the teachings of the reference, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Kawabata et al, choosing as the sulfonic acid-containing monomer unit, that as taught by the reference having a molecular weight of 300 or less, in an amount of 0.50 mmol/g or more. Claim(s) 1-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al (11,460,772). Hatakeyama et al disclose a resist composition comprising a resin, an acid generator (ionic compound, claim 6; instant claims 4 and 19), a solvent, and a quencher (degradable base; instant claim 14; claim 8). The reference teaches the resin may include a unit having a PAG, such as a sulfonic acid (claim 5), wherein the broad structures fall within the instant formula (1) (instant claims 5 and 20). Exemplified monomers include PNG media_image5.png 100 272 media_image5.png Greyscale PNG media_image6.png 50 310 media_image6.png Greyscale PNG media_image7.png 234 174 media_image7.png Greyscale PNG media_image8.png 96 182 media_image8.png Greyscale PNG media_image9.png 146 224 media_image9.png Greyscale Exemplified units, and those taught by the broader formula include those having MWs of 300 or less, and 200 or less, including wherein Z3 is phenylene without fluorine substitution.The units would meet the limitations of the instant claims 1, 2, 5, 6, and 20 wherein instant A is CR=CR, instant L is a single bond, alkyl, or phenylene with or without F substitution. The unit is included to affect resolution and line width reduction (LWR) (column 87, lines 24-32). Unit (d3) is included in the polymer in an amount of 0< d3 < 0.3 (column 90, lines 25-36). The PAG is included in an amount of 0.1 to 50 parts by weight of the base polymer, and it appears as though the amount of d3 and the PAG would meet the limitations of the instant claim 1, that being the unit or unit and PAG combined, are present in an amount of 0.50 mmol/g or more. Alternatively, one of ordinary skill in the art would have arrived at the claimed amounts as set forth by the instant claim 1, but also claims 12 and 13 (0.7 and 1.0 mmol/g, respectively), through routine experimentation and optimization of resist properties such as resist sensitivity and resolution which result in more accurate patterns. PNG media_image10.png 118 310 media_image10.png Greyscale The resin which changes solubility in developer further comprises units having a phenolic hydroxyl group meeting the limitations of the instant (A2) in claim 8, wherein R101 to R103 are H or alkyl, LA is a single bond or -C(=O)O, and ArA is phenyl: PNG media_image11.png 118 64 media_image11.png Greyscale PNG media_image12.png 164 90 media_image12.png Greyscale The reference resin further comprises an acid-decomposable group having an acid-labile group-containing unit (b1) and/or (b2) (claim 3, examples). Examples include those of (b1) of instant (3) of claim 10, with R5 to R7 H or alkyl, L2 a single bond, and R8 to R10 alkyl or aryl or two join to form a ring. PNG media_image13.png 128 92 media_image13.png Greyscale PNG media_image14.png 264 132 media_image14.png Greyscale Additional ALG-containing units include those of instant formula (6) wherein the instant L4 is a single bond or C(=O)O, Ar1 is phenyl, R25 and R26 are H, alkyl, cycloalkyl, and R27 is alkyl, cycloalkyl, aryl as defined by the broader formulas (instant claims 9-11): PNG media_image15.png 122 72 media_image15.png Greyscale PNG media_image16.png 164 80 media_image16.png Greyscale PNG media_image17.png 132 234 media_image17.png Greyscale The method of patterning and forming a film and device meet the limitations of the instant claims 15-17. PNG media_image18.png 106 308 media_image18.png Greyscale Given the teachings of the reference, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Hatakeyama et al, choosing as the sulfonic acid-containing monomer unit, that as taught by the reference having a molecular weight of 300 or less, in an amount of 0.50 mmol/g or more. Claim(s) 1, 2,7,8, 12, 13, 15-17 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kodama (JP 2007-192907 and its machine translation). Kodama discloses a resist composition comprising a acid generator (A) (ionic compound having a low molecular weight; [0018], [0035], [0036]), wherein the compound may be included in the resin and have the following general structure meeting the limitations of the instant claims 1 and 2: PNG media_image19.png 88 184 media_image19.png Greyscale PNG media_image20.png 96 70 media_image20.png Greyscale Wherein Wa is a polymer backbone, and Ya1 is a single or divalent linking group. Preferred examples of the divalent linking group include a divalent linking group formed by bonding an arylene group, an alkylene group, a monocyclic or polycyclic alkylene group, or a plurality of these groups via a single bond, a - C (O) O - bond, or a - (C ═ O) NRy - bond (R y is an alkyl or aryl group) falling within the scope of the instant claim 5 ([0043]). The unit is present in an amount of 40 to 100 mol% of the units, which appears to fall within the scope of the instant claim 1 wherein the content is 0.50 mmol/g or more. Alternatively, one of ordinary skill in the art would have arrived at the claimed amounts as set forth by the instant claim 1, but also claims 12 and 13 (0.7 and 1.0 mmol/g, respectively), through routine experimentation and optimization of resist properties such as resist sensitivity and resolution which result in more accurate patterns. The resin increases solubility in developer (instant claim 7) and further comprises units meeting the limitations of (A2) of the instant claim 8, wherein R101 to R103 are alkyl or H, LA is a single blond, and ArA is phenyl. PNG media_image21.png 74 52 media_image21.png Greyscale The pattern forming method comprises the steps as claimed including forming a photosensitive film by applying and drying/pre-baking on a substrate, and exposing and developing the photosensitive film to form a device pattern (instant claims 15-17). Given the teachings of the reference, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Kodama, choosing as the PAG, a monomer unit, that as taught by the reference having a molecular weight of 300 or less, in an amount of 0.50 mmol/g or more. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Additional references, such as Masunaga et al JP 2011-195812 as cited by applicant, teach resist polymers comprising PAG salts, which is known in the art, however, the references teach and prefer compound having higher MWs than the instant claim 1. Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMANDA C WALKE whose telephone number is (571)272-1337. The examiner can normally be reached Monday to Thursday 5:30am to 4pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Niki Bakhtiari can be reached at 571-272-3433. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AMANDA C. WALKE/ Primary Examiner, Art Unit 1722
Read full office action

Prosecution Timeline

Aug 11, 2023
Application Filed
Mar 06, 2026
Non-Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
97%
With Interview (+8.2%)
2y 7m
Median Time to Grant
Low
PTA Risk
Based on 1681 resolved cases by this examiner. Grant probability derived from career allow rate.

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