Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1722 1726 1737 1795
This examiner grants 88% of resolved cases
Amanda C. Walke is an extremely prolific examiner in Art Unit 1722, with 1731 resolved cases. The allowance rate of 88.4 percent is notably high, suggesting a streamlined path to grant for most applications in Tech Center 1700. This 88.4 percent rate indicates that the examiner is highly efficient at identifying allowable subject matter and moving cases toward issuance.
Efficiency is further evidenced by a median days to allowance of 888, which is relatively fast for this volume of cases. This 888 day median allows applicants to expect a resolution in under three years, which is favorable for maintaining business momentum. Although the interview lift is 8.6 percent, the high overall allowance rate implies that written prosecution is often sufficient to reach a positive outcome.
The 8.6 percent lift still provides a marginal benefit, but the primary driver of success with this examiner is the 88.4 percent baseline allowance rate. Practitioners should focus on clear, concise written responses to maintain the 888 day efficiency. The high volume of 1731 cases suggests a consistent and predictable examination style that benefits well-prepared applicants.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18392802 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18467889 | TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION | Non-Final OA | FUJIFILM Corporation |
| 18467898 | COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, CURED FILM, AND DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18607213 | ORIGINAL, METHOD OF DETERMINING PATTERN OF ORIGINAL, AND METHOD OF EXPOSING | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18687238 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYERED PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING MULTILAYERED PRINTED WIRING BOARD | Non-Final OA | Resonac Corporation |
| 18023952 | PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORMING PERMANENT RESIST, AND METHOD FOR INSPECTING PERMANENT RESIST CURED FILM | Non-Final OA | RESONAC CORPORATION |
| 18617447 | METHOD OF FORMING PATTERNS | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 17919025 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE RESIN FILM AND COLOR FILTER MANUFACTURED BY USING SAME | Final Rejection | SAMSUNG SDI CO., LTD. |
| 18379870 | PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Company LTD |
| 18484051 | PHOTORESIST COMPOSITION | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18563382 | PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING DEVICE | Non-Final OA | Tokyo Electron Limited |
| 18462003 | TREATMENTS FOR METAL OXIDE PHOTORESIST FILMS | Non-Final OA | Tokyo Electron Limited |
| 18563358 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18282909 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, PREPARATION METHOD OF CURED PRODUCT, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | Non-Final OA | TORAY INDUSTRIES, INC. |
| 18278921 | CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION OF SOLID ELECTROLYTE, METHOD FOR PREPARATION OF SOLID ELECTROLYTE BY USING SAME, AND ELECTRONIC ELEMENT INCLUDING SAME SOLID ELECTROLYTE | Non-Final OA | IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) |
| 18578299 | METHOD FOR GENERATING MASK PATTERN | Non-Final OA | ASML NETHERLANDS B.V. |
| 18383101 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18380970 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18367157 | ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18392011 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 18517715 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Final Rejection | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17754960 | FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME, SEPARATOR WITH FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | ZEON CORPORATION |
| 18685539 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | Non-Final OA | JSR CORPORATION |
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