Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1722 1726 1737 1795
This examiner grants 88% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18483895 | ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18467898 | COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, CURED FILM, AND DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18467889 | TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION | Non-Final OA | FUJIFILM Corporation |
| 18159152 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | Final Rejection | FUJIFILM Corporation |
| 18114678 | Lithium Secondary Battery | Non-Final OA | LG Energy Solution, Ltd. |
| 18379933 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 17919025 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE RESIN FILM AND COLOR FILTER MANUFACTURED BY USING SAME | Final Rejection | SAMSUNG SDI CO., LTD. |
| 18383101 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18379870 | PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Company LTD |
| 18462003 | TREATMENTS FOR METAL OXIDE PHOTORESIST FILMS | Non-Final OA | Tokyo Electron Limited |
| 18347982 | PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT | Non-Final OA | Murata Manufacturing Co., Ltd. |
| 18563358 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18546879 | HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS THEREOF | Non-Final OA | Lam Research Corporation |
| 18278921 | CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION OF SOLID ELECTROLYTE, METHOD FOR PREPARATION OF SOLID ELECTROLYTE BY USING SAME, AND ELECTRONIC ELEMENT INCLUDING SAME SOLID ELECTROLYTE | Non-Final OA | IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) |
| 18578299 | METHOD FOR GENERATING MASK PATTERN | Non-Final OA | ASML NETHERLANDS B.V. |
| 18571649 | METROLOGY METHOD AND DEVICE | Non-Final OA | ASML NETHERLANDS B.V. |
| 17754960 | FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME, SEPARATOR WITH FUNCTIONAL LAYER FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | ZEON CORPORATION |
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