Prosecution Insights
Last updated: July 17, 2026
Application No. 18/454,222

EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Non-Final OA
Filed
Aug 23, 2023
Priority
Aug 25, 2022 — JP 2022-134264
Examiner
COSGROVE, JAYSON D
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
KIOXIA Corporation
OA Round
1 (Non-Final)
52%
Grant Probability
Moderate
1-2
OA Rounds
10m
Est. Remaining
85%
With Interview

Examiner Intelligence

Grants 52% of resolved cases
52%
Career Allowance Rate
63 granted / 122 resolved
-13.4% vs TC avg
Strong +33% interview lift
Without
With
+33.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 9m
Avg Prosecution
28 currently pending
Career history
160
Total Applications
across all art units

Statute-Specific Performance

§103
94.1%
+54.1% vs TC avg
§102
3.7%
-36.3% vs TC avg
§112
1.0%
-39.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 122 resolved cases

Prosecution Timeline

Aug 23, 2023
Application Filed
May 28, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12675039
MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURING SAME
4y 10m to grant Granted Jul 07, 2026
Patent 12656676
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
5y 7m to grant Granted Jun 16, 2026
Patent 12656672
EXPOSURE MASK
5y 4m to grant Granted Jun 16, 2026
Patent 12650647
LIQUID CHEMICAL AND METHOD FOR PRODUCING LIQUID CHEMICAL
5y 11m to grant Granted Jun 09, 2026
Patent 12645138
MULTI-LAYER PELLICLE MEMBRANE
5y 0m to grant Granted Jun 02, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
52%
Grant Probability
85%
With Interview (+33.1%)
3y 9m (~10m remaining)
Median Time to Grant
Low
PTA Risk
Based on 122 resolved cases by this examiner. Grant probability derived from career allowance rate.

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