Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1737
This examiner grants 50% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18273123 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | Non-Final OA | ASAHI KASEI KABUSHIKI KAISHA |
| 17775130 | COLORING AGENT COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, PHOTORESIST, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY DEVICE | Final Rejection | LG CHEM, LTD. |
| 18266057 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 17329177 | COLORING PHOTOSENSITIVE COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Final Rejection | FUJIFILM Corporation |
| 18145038 | PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST | Non-Final OA | Intel Corporation |
| 17679720 | OPTICAL ELEMENT FOR REFLECTING EUV RADIATION, EUV LITHOGRAPHY SYSTEM AND METHOD FOR SEALING A GAP | Final Rejection | Carl Zeiss SMT GmbH |
| 17762497 | POSITIVE WORKING PHOTOSENSITIVE MATERIALS | Non-Final OA | Merck Patent GmbH |
| 18456075 | REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18038574 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | Final Rejection | MITSUBISHI GAS CHEMICAL COMPANY, INC. |
| 17805188 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | Final Rejection | TOKYO OHKA KOGYO CO., LTD. |
| 18271556 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 17772340 | REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 18109589 | SYSTEM, METHOD AND PROGRAM PRODUCT FOR IMPROVING ACCURACY OF PHOTOMASK BASED COMPENSATION IN FLAT PANEL DISPLAY LITHOGRAPHY | Non-Final OA | PHOTRONICS, INC. |
| 17762126 | MICRO AND NANO STRUCTURING OF A DIAMOND SUBSTRATE | Final Rejection | Universität des Saarlandes |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy