Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1737
This examiner grants 52% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18543114 | PHOTORESIST COMPOSITION | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18447404 | DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 17879837 | COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Non-Final OA | FUJIFILM Corporation |
| 17329177 | COLORING PHOTOSENSITIVE COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Final Rejection | FUJIFILM Corporation |
| 17144259 | CHEMICAL LIQUID, KIT, PATTERN FORMING METHOD, CHEMICAL LIQUID MANUFACTURING METHOD, AND CHEMICAL LIQUID STORAGE BODY | Non-Final OA | FUJIFILM Corporation |
| 18145038 | PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST | Final Rejection | Intel Corporation |
| 18389267 | PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
| 18123749 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18237648 | ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME | Non-Final OA | Applied Materials, Inc. |
| 18454222 | EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 18216874 | METHOD OF FORMING A MOISTURE BARRIER ON PHOTOSENSITIVE ORGANOMETALLIC OXIDES | Non-Final OA | Tokyo Electron Limited |
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