Tech Center 1700 • Art Units: 1737
This examiner grants 51% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17879837 | COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Final Rejection | FUJIFILM Corporation |
| 17395469 | CURABLE COMPOSITION, FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND POLYMER COMPOUND | Final Rejection | FUJIFILM Corporation |
| 17329177 | COLORING PHOTOSENSITIVE COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Final Rejection | FUJIFILM Corporation |
| 18273123 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | Non-Final OA | ASAHI KASEI KABUSHIKI KAISHA |
| 17775130 | COLORING AGENT COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, PHOTORESIST, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY DEVICE | Final Rejection | LG CHEM, LTD. |
| 18277648 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18266057 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18025461 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18145038 | PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST | Non-Final OA | Intel Corporation |
| 17679720 | OPTICAL ELEMENT FOR REFLECTING EUV RADIATION, EUV LITHOGRAPHY SYSTEM AND METHOD FOR SEALING A GAP | Final Rejection | Carl Zeiss SMT GmbH |
| 17910398 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PREPARED USING SAME, AND DISPLAY DEVICE | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18456075 | REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18140284 | Reflective Photomask Blank, and Method for Manufacturing Reflective Photomask | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18137081 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 17721538 | DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE | Non-Final OA | Taiwan Semiconductor Manufacturing Company |
| 17805188 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | Final Rejection | TOKYO OHKA KOGYO CO., LTD. |
| 18038574 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | Final Rejection | MITSUBISHI GAS CHEMICAL COMPANY, INC. |
| 17440269 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYER PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING MULTILAYER PRINTED WIRING BOARD | Final Rejection | Showa Denko Materials Co., Ltd. |
| 18271556 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 17772340 | REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 18109589 | SYSTEM, METHOD AND PROGRAM PRODUCT FOR IMPROVING ACCURACY OF PHOTOMASK BASED COMPENSATION IN FLAT PANEL DISPLAY LITHOGRAPHY | Non-Final OA | PHOTRONICS, INC. |
| 17762126 | MICRO AND NANO STRUCTURING OF A DIAMOND SUBSTRATE | Final Rejection | Universität des Saarlandes |
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