Prosecution Insights
Last updated: April 19, 2026
Application No. 18/467,293

SEMICONDUCTOR POWER DEVICE WITH IMPROVED RUGGEDNESS

Non-Final OA §103
Filed
Sep 14, 2023
Examiner
DIAZ, JOSE R
Art Unit
2815
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Nexperia B V
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
2y 6m
To Grant
94%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allow Rate
799 granted / 922 resolved
+18.7% vs TC avg
Moderate +8% lift
Without
With
+7.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
26 currently pending
Career history
948
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
39.3%
-0.7% vs TC avg
§102
36.3%
-3.7% vs TC avg
§112
7.8%
-32.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 922 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-2, 4-10, and 12-17 are rejected under 35 U.S.C. 103 as being unpatentable over Kinoshita (US 2022/0199824) in view of Bauer et al. (US 2019/0035884). Regarding claim 1, Kinoshita discloses a semiconductor power device, comprising: a semiconductor body (40) including a semiconductor substrate (41) and an epitaxial layer (42) formed on the semiconductor substrate [Fig. 2 and paragraph 0074]; an active area (1) and a termination area (2) adjacent the active area arranged in the epitaxial layer [Fig. 2]; wherein the termination area (2) comprises a plurality of first rings (31) of a first polarity (P++), wherein the semiconductor substrate (41) and the epitaxial layer (42) have the second polarity (n-type: N+/N-) [Fig. 2]; wherein the epitaxial layer (42) has a dopant concentration (N-) associated with the second polarity (n-type) wherein the termination area (2) further comprises a junction termination extension (JTE) border (32) of the first polarity type (P--), and wherein the rings are separately formed from and arranged inside the junction termination extension border (32) [Fig. 2]. However, Kinoshita does not disclose a plurality of second rings of a second polarity different from the first polarity. Bauer teaches: wherein the termination area (TR) comprises a plurality of first rings (10) of a first polarity (P-type), and a plurality of second rings (15) of a second polarity (n-type) different from the first polarity (p-type) [Fig. 1 and paragraphs 0038]; wherein the epitaxial layer (5) has a dopant concentration (N-) associated with the second polarity (n-type) that is smaller than a dopant concentration (N+) in the second rings (15) associated with the second polarity (n-type) [Fig. 1 and paragraph 0039]. Therefore, one of ordinary skill in the art, before the effective filing date of the claimed invention, would have been motivated to modify Kinoshita by including a plurality of second rings (15) of a second polarity as taught by Bauer because it helps to increase the electric field coupling from floating field ring to floating field ring [paragraph 0011]. Regarding claim 2, Kinoshita wherein the first rings (31) associated with the first polarity (p-type) have a dopant concentration (P++) that is higher than a dopant concentration (P--) of the JTE border (32) associated with the first polarity (p-type) [Fig. 2]. Regarding claim 4, Bauer teaches wherein the dopant concentration in the second rings (15) associated with the second polarity is at least 100 times larger than the dopant concentration in the epitaxial layer (5b) associated with the second polarity (N-type) [paragraphs 0036 and 0039]. The court has held that in the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. In re Wertheim, 541F.2d 257,191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). Regarding claim 5, Bauer teaches wherein the first rings (10) and second rings (15) are arranged alternately [Fig. 1]. Regarding claim 6, Bauer teaches wherein the first and second rings (10/15) are configured to be electrically floating during operation [paragraphs 0011, 0035 and 0038]. Regarding claim 7, Kinoshita discloses wherein the termination area (2) is at least partially covered by a passivation layer (19) [Fig. 2]; wherein the passivation layer (19) comprises a passivation layer made of a material selected from the group consisting of Silicon Nitride, Silicon Oxynitride, Silicon Oxide, and Metallic Oxide; and/or wherein the passivation layer comprises a field oxide [paragraphs 0082 and 0106]. Regarding claim 8, Kinoshita discloses wherein the semiconductor power device comprises a device selected from the group consisting of a Merged P-I-N Schottky (MPS) diode, a MOSFET, a JFET, a Schottky barrier, and a PN diode [Fig. 2 and paragraph 0041]. Also. Bauer teaches the same in paragraph 0052. Regarding claim 9, Kinoshita discloses wherein the semiconductor substrate (41) comprises a Silicon Carbide substrate; and/or wherein the first polarity corresponds to p-type and the second polarity to n-type [Fig. 2 and paragraphs 0041 and 0111]. Regarding claim 10, Kinoshita discloses wherein the dopant concentration of the first rings (31) associated with the first polarity (p-type) lies in a range between 1E19 and 1E20 #/cm3 [paragraph 0063], and wherein the dopant concentration of the JTE border (32) associated with the first polarity lies in a range between 1 E17 and 1 E20 #/cm3 [paragraph 0067]. The court has held that in the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. In re Wertheim, 541F.2d 257,191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). Regarding claim 12, Bauer teaches wherein the dopant concentration in the second rings (15) associated with the second polarity (n-type) is at least 100 times larger than the dopant concentration in the epitaxial layer (5b) associated with the second polarity [paragraphs 0036 and 0039]. The court has held that in the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. In re Wertheim, 541F.2d 257,191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). Regarding claim 13, Bauer teaches wherein the first rings (10) and second rings (15) are arranged alternately [Fig. 1]. Regarding claim 14, Kinoshita discloses wherein the termination area (2) further comprises a plurality of floating JTE rings (32/30c) of the first polarity (p-type) arranged spaced apart from the first Regarding claim 15, Kinoshita discloses a channel stopper (33) arranged at or near an edge of the semiconductor power device, wherein the termination area (2) is arranged in between the channel stopper (33) and the active area (1), and wherein the channel stopper (33) is of the second polarity (n-type) [Figs. 1-2]. Regarding claim 16, Kinoshita discloses wherein, when the passivation layer (19) is made of a material selected from the group consisting of Silicon Nitride, Silicon Oxynitride, Silicon Oxide and Metallic Oxide, and extends over the termination area from a region directly above the channel stopper towards the active area, a part of the plurality of first and second rings is covered [Fig. 2 and paragraphs 0082 and 0106]. Regarding claim 17, Kinoshita discloses wherein, when the passivation layer (19) comprises the field oxide, it extends over the termination area (2) from a region directly above the channel stopper (33) towards the active area (1) thereby fully covering the plurality of first . Allowable Subject Matter Claims 3, 11 and 18-19 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Wehrhahn-Kilian et al. (US 2019/0165159) teaches a MPS diode (500) in Figure 8. Correspondence Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOSE R DIAZ whose telephone number is (571)272-1727. The examiner can normally be reached Monday-Friday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Benitez can be reached at 571-270-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Jose R Diaz/Primary Examiner, Art Unit 2815
Read full office action

Prosecution Timeline

Sep 14, 2023
Application Filed
Jan 09, 2026
Non-Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
94%
With Interview (+7.5%)
2y 6m
Median Time to Grant
Low
PTA Risk
Based on 922 resolved cases by this examiner. Grant probability derived from career allow rate.

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