Prosecution Insights
Last updated: May 29, 2026
Application No. 18/472,375

GA2O3-BASED SINGLE CRYSTAL SUBSTRATE AND METHOD OF MANUFACTURING GA2O3-BASED SINGLE CRYSTAL SUBSTRATE

Non-Final OA §102§103
Filed
Sep 22, 2023
Priority
Mar 24, 2021 — JP 2021-049332 +1 more
Examiner
EDMONDSON, LYNNE RENEE
Art Unit
1734
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Orbray Co. Ltd.
OA Round
1 (Non-Final)
71%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allowance Rate
555 granted / 781 resolved
+6.1% vs TC avg
Strong +16% interview lift
Without
With
+15.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
20 currently pending
Career history
811
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
62.9%
+22.9% vs TC avg
§102
3.7%
-36.3% vs TC avg
§112
5.2%
-34.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 781 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Claims 16-18 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 4/2/26. Claims 2-9 and claims 12-15 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to nonelected species, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 4/2/26. Applicant’s election without traverse of Group I, claim 1, Species IB, claims 10 and 11, in the reply filed on 4/2/26 is acknowledged. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. The instant claims contain the transitional phrase “comprising”. Per MPEP 2111.03 ‘The transitional term “comprising”, which is synonymous with “including,” “containing,” or “characterized by,” is inclusive or open-ended and does not exclude additional, unrecited elements or method steps'. This open-ended definition has been taken into consideration in the following rejections. Claim 1 is rejected under 35 U.S.C. 102(a)(1) as being anticipated by US 2015/0380500 A1 to Masui et al. (hereinafter Masui). Regarding claim 1, Masui discloses a Ga2O3-based single crystal substrate, which has an amount of warpage of no more than 25 µm on a main surface (para [0014]), which falls completely within the instantly claimed range of -50 µm or more and 50 µm or less (including 0 µm) on a main surface. Claim 1 is rejected under 35 U.S.C. 102(a)(1) as being anticipated by US 2017/0152610 A1 to Watanabe et al. (hereinafter Watanabe). Regarding claim 1, Watanabe discloses a Ga2O3-based single crystal substrate (para [0043]), which has an amount of warpage of 14.451 to 24.805 µm (Table 2) on a main (principal) surface (para [0106]), which falls completely within the instantly claimed range of -50 µm or more and 50 µm or less (including 0 µm) on a main surface. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The instant claims contain the transitional phrase “comprising”. See MPEP 2111.03, cited above. This open-ended definition has been taken into consideration in the following rejections. Claim 10 is rejected under 35 U.S.C. 103 as being unpatentable over Masui. Regarding claim 10, Masui discloses the Ga2O3-based single crystal substrate according to claim 1, which comprises one or more elements of Group 14 elements which are n-type dopants, such as Sn (para [0044]), in a total range of 0.003 to 1.0 mol% (para [0044]), which overlaps the instantly claimed total range of 0.02 mol% or more and 0.15 mol% or less. See MPEP 2144.05(I), which states that ‘In the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists’. Claims 10 and 11 are rejected under 35 U.S.C. 103 as being unpatentable over Watanabe. Regarding claim 10, Watanabe discloses the Ga2O3-based single crystal substrate according to claim 1, which comprises one or more elements of Group 14 elements which are n-type dopants, such as Si and Sn (para [0057]), in amounts of 0.03 mol%, 0.02 mol% (para [0088]) and 0.01 mol% (para [0104]), which overlap the instantly claimed total range of 0.02 mol% or more and 0.15 mol% or less. See MPEP 2144.05(I), cited above. Regarding claim 11, Watanabe discloses the Ga2O3-based single crystal substrate according to claim 1, which comprises one or more elements of Group 2 elements such as Mg, or Fe, Cu, and Zn (para [0057]), which are p-type dopants. The reference does not expressly disclose amounts of these particular dopants but does teach typical dopant amounts of 0.03 mol%, 0.02 mol% (para [0088]) and 0.01 mol% (para [0104]) in other examples. These amount overlap the instantly claimed total range of 0.02 mol% or more and 0.15 mol% or less. See MPEP 2144.05(I), cited above. It would be obvious to one of ordinary skill in the art to control the dopant amounts to optimize the width of the band gap (para [0057]) and ultimately improve the quality of the substrate (para [0108]). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LYNNE EDMONDSON whose telephone number is (571)272-2678. The examiner can normally be reached M-F 10-6:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jonathan Johnson can be reached at 571-272-1177. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /L.E./Examiner, Art Unit 1734 /Matthew E. Hoban/Primary Examiner, Art Unit 1734
Read full office action

Prosecution Timeline

Sep 22, 2023
Application Filed
May 20, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
71%
Grant Probability
87%
With Interview (+15.6%)
3y 0m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 781 resolved cases by this examiner. Grant probability derived from career allowance rate.

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