Last updated: July 17, 2026

Application No. 18/476,975

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Non-Final OA

Filed

Sep 28, 2023

Priority

Mar 29, 2021 — JP 2021-055493 +1 more

Examiner

CHAMPION, RICHARD DAVID

Art Unit

1737

Tech Center

1700 — Chemical & Materials Engineering

Assignee

Fujifilm Corporation

OA Round

1 (Non-Final)

Interview Optional

— +8.8% interview lift. Interview lift (+8.8%) is below the 15.0% threshold. A written response is recommended.

Based on 124 resolved cases, 2023–2026

Examiner Intelligence

CHAMPION, RICHARD DAVID View full profile →

Grants 44% of resolved cases

Career Allowance Rate

55 granted / 124 resolved

-20.6% vs TC avg

Moderate +9% lift

Without

With

+8.8%

Interview Lift

resolved cases with interview

Typical timeline

3y 10m

Avg Prosecution

40 currently pending

Career history

172

Total Applications

across all art units

Statute-Specific Performance

§103

86.0%

+46.0% vs TC avg

§102

13.2%

-26.8% vs TC avg

§112

0.3%

-39.7% vs TC avg

Black line = Tech Center average estimate • Based on career data from 124 resolved cases

Prosecution Timeline

Sep 28, 2023

Application Filed

Apr 24, 2026

Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

18/701,807

Patent 12645139

FREE-RADICALLY POLYMERIZABLE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, POLYMERIZED COMPOUNDS, METHODS OF MAKING AND ARTICLES INCLUDING THE SAME

2y 1m to grant Granted Jun 02, 2026

17/437,783

Patent 12631964

RESIST UNDERLAYER FILM-FORMING COMPOSITION

4y 8m to grant Granted May 19, 2026

16/083,869

Patent 12625428

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS

7y 8m to grant Granted May 12, 2026

18/337,892

Patent 12607930

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

2y 10m to grant Granted Apr 21, 2026

17/671,661

Patent 12585202

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

4y 1m to grant Granted Mar 24, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

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Prosecution Projections

1-2

Expected OA Rounds

44%

Grant Probability

53%

With Interview (+8.8%)

3y 10m (~1y 0m remaining)

Median Time to Grant

Low

PTA Risk

Based on 124 resolved cases by this examiner. Grant probability derived from career allowance rate.