Prosecution Insights
Last updated: April 19, 2026
Application No. 18/484,550

LOGIC AND MEMORY DEVICE WITH COMMON VERTICAL CHANNEL

Non-Final OA §102
Filed
Oct 11, 2023
Examiner
ULLAH, ELIAS
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
International Business Machines Corporation
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
92%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
700 granted / 829 resolved
+16.4% vs TC avg
Moderate +8% lift
Without
With
+8.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
22 currently pending
Career history
851
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
32.8%
-7.2% vs TC avg
§102
55.7%
+15.7% vs TC avg
§112
7.8%
-32.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 829 resolved cases

Office Action

§102
DETAILED ACTION Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102 (a)(1) as being anticipated by Masuoka et al. (Masuoka, US 2010/0219483 A1). Regarding claims 1 and 13, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) device comprising: a vertical channel (channel 722b/721a/723b in FIG. 27a); a memory microdevice connected ( by contact 707a and [0120-0130]) to the vertical channel ( channel 722b/721a/723b in FIG. 27a), the memory microdevice comprising a memory cell ( by memory contact 707a) in direct contact with to a sidewall ( electrode 718a) of the vertical channel ( channel 722b/721a/723b in FIG. 27a); and a logic microdevice (Qp28) connected to the vertical channel, the logic microdevice comprising a logic-gate insulator (insulator 734) in direct contact with to the sidewall of the vertical channel (channel 722b/721a/723b in FIG. 27a). Regarding claim 2, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d), wherein the memory microdevice further comprises: a memory-gate ( electrode 718a) in direct contact with to a sidewall of the memory cell ( element 707a). Regarding claim 3, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d), wherein the logic microdevice further comprises: a logic-gate (electrode 718a) in direct contact with to a sidewall of the logic-gate insulator ( insulator 734). Regarding claim 4, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d), further comprising: a top source/drain ( 716/704b) in direct contact with to a top surface of the vertical channel ( channel 721a). Regarding claim 5, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising: a bottom source/drain (704b) in direct contact with to a bottom surface of the vertical channel (cannel 721a). Regarding claim 6, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising: a first frontside contact in direct contact with to a top surface of the memory-gate ([0120-0130], 715, and FIG. 27a-27d). Regarding claim 7, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) a second frontside contact (706a)in direct contact with to a top surface of the top source/drain (714). Regarding claim 8, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising: a first backside contact in direct contact with to a bottom surface of the logic-gate (see FIG. 26). Regarding claim 9, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a second backside contact in direct contact with to a bottom surface of the bottom source/drain (see FIG. 26-27d). Regarding claim 10, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a frontside back end of line (BEOL) network in direct contact with to the first frontside contact and the second frontside contact (see FIG. 26-27d). Regarding claim 11, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a backside BEOL network in direct contact with to the first backside contact and the second backside contact (see FIG. 26-27d). Regarding claim 12, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising, wherein the second frontside contact, the top source/drain, the vertical channel, the bottom source/drain , and the second backside contact are vertically inline (see FIG. 26-27d). Regarding claim 14, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) , wherein the memory microdevice further comprises: a memory-gate around and against each of one or more sidewalls of the memory cell (see FIG. 26-27d). Regarding claim 15, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising wherein the logic microdevice further comprises: a logic-gate around and against each of one or more sidewalls of the logic-gate insulator (see FIG. 26-27d). Regarding claim 16, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a top source/drain in direct contact with to a top surface of the vertical channel (see FIG. 26-27d). Regarding claim 17, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a bottom source/drain in direct contact with to a bottom surface of the vertical channel(see FIG. 26-27d). Regarding claim 18, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a first frontside contact in direct contact with to a top surface of the memory-gate; and a second frontside contact in direct contact with to a top surface of the top source/drain (see FIG. 26-27d). Regarding claim 19, Masuoka shows a semiconductor integrated circuit (IC) (FIG. 27a-d) further comprising a first backside contact in direct contact with to a bottom surface of the logic-gate; and a second backside contact in direct contact with to a bottom surface of the bottom source/drain (see FIG. 26-27d). Regarding claim 20, Masuoka shows a method of semiconductor integrated circuit (IC) device fabrication comprising: forming a vertical channel (channel 721a); forming a logic-gate insulator (insulator 734) directly against a sidewall of the vertical channel (channel 721a) and forming a logic-gate (gate electrode 718a) directly against a sidewall of the logic-gate insulator (insulator 734); and forming a memory cell directly (by memory contact 707a) against the sidewall of the vertical channel and forming a memory-gate directly against a sidewall of the memory cell (see FIG. 26 and 27a-d). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ELIAS M ULLAH whose telephone number is (571)272-1415. The examiner can normally be reached M-F at 8AM-5PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Yara Green can be reached at 571-270-3035. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ELIAS ULLAH/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Oct 11, 2023
Application Filed
Dec 13, 2025
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
92%
With Interview (+8.1%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 829 resolved cases by this examiner. Grant probability derived from career allow rate.

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