Last updated: July 17, 2026

Application No. 18/485,674

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND

Non-Final OA

Filed

Oct 12, 2023

Priority

Apr 16, 2021 — JP 2021-070036 +2 more

Examiner

CHU, JOHN S Y

Art Unit

1737

Tech Center

1700 — Chemical & Materials Engineering

Assignee

Fujifilm Corporation

OA Round

1 (Non-Final)

Interview Optional

— +5.6% interview lift. Interview lift (+5.6%) is below the 15.0% threshold. A written response is recommended.

Based on 971 resolved cases, 2023–2026

Examiner Intelligence

CHU, JOHN S Y View full profile →

Grants 77% — above average

Career Allowance Rate

749 granted / 971 resolved

+12.1% vs TC avg

Moderate +6% lift

Without

With

+5.6%

Interview Lift

resolved cases with interview

Typical timeline

2y 11m

Avg Prosecution

49 currently pending

Career history

1034

Total Applications

across all art units

Statute-Specific Performance

§101

0.4%

-39.6% vs TC avg

§103

75.6%

+35.6% vs TC avg

§102

12.8%

-27.2% vs TC avg

§112

6.3%

-33.7% vs TC avg

Black line = Tech Center average estimate • Based on career data from 971 resolved cases

Prosecution Timeline

Oct 12, 2023

Application Filed

Apr 15, 2026

Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

17/867,443

Patent 12681385

PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME

3y 12m to grant Granted Jul 14, 2026

18/226,436

Patent 12663714

RESIST COMPOSITION AND PATTERN FORMING PROCESS

2y 11m to grant Granted Jun 23, 2026

18/590,304

Patent 12663715

PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF

2y 3m to grant Granted Jun 23, 2026

17/255,286

Patent 12645142

A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST COATING, ETCHED PHOTORESIST COATING, AND ETCHED SI CONTAINING LAYER(S), AND MANUFACTURING A DEVICE USING THEREOF

5y 5m to grant Granted Jun 02, 2026

18/269,780

Patent 12625427

NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION EACH COMPRISING SAME

2y 10m to grant Granted May 12, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2

Expected OA Rounds

77%

Grant Probability

83%

With Interview (+5.6%)

2y 11m (~2m remaining)

Median Time to Grant

Low

PTA Risk

Based on 971 resolved cases by this examiner. Grant probability derived from career allowance rate.