CTFR 18/486,526 CTFR 97904 DETAILED ACTION General Remarks 07-03-aia AIA 15-10-aia The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA. Response to Amendment The Amendment filed on 04/22/2026 has been entered. Applicant's amendment have overcome the objections to the Drawings and to the Claims previously set forth in the Non-Final Office Action dated on 02/26/2026. Claims 4, 8 and 11 are canceled. Response to Arguments Applicant’s arguments "Applicant Arguments/Remarks Made in an Amendment" with the "Amendment/Req. Reconsideration-After Non-Final Reject" filed on 04/22/2026, have been fully considered, the Applicant’s arguments describe “…Whitney and Li do not together or individually teach all features of amended claim 1. Therefore, claim 1 should be allowed. Independent claim 7, as amended, includes similar features and should be allowed for the same reason…”. However, the Applicant’s arguments are not persuasive because the Whitney ’s device (US 5726621 A) describes an electrical fuse having substantially all limitations of claim 1 and 7, (Fig. 2a), but it does not disclose “the fuse element has a second vertical height that is less than the first vertical height”, then, the Li ’s device (US 20150097266 A1) describe a fuse element 72 having a second vertical height that is less than the first vertical height (Fig. 2B), see rejection below. Drawings 06-36 AIA The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, the limitation “…a first dielectric material substrate and a second dielectric material substrate … …a second line of conducting material located between the second layer of dielectric material and the second dielectric material substrate … and the fuse element is fully embedded between the second layer of dielectric material and the second dielectric material substrate ” must be shown or the feature(s) canceled from the claim(s). No new matter should be entered. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. 07-34-01 Claims 5, 7, 9-10 and 12-13 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Regarding claim 5 , it recites the limitation “… a layer of dielectric material surrounding the first conductive connection…” is not explained. The limitation has an antecedent issue of “a layer”. Therefore, it is indefinite. For the examination purpose and according to claim 1, the limitation “… a layer of dielectric material surrounding the first conductive connection…” is interpreted as “… the layer of dielectric material surrounding the first conductive connection…”. Regarding claim 7 , it recites the limitations “…a first fuse element extending horizontally between the first and second conductive structures… … and the fuse element is fully embedded…” and “a second fuse element… … the fuse element is fully embedded…” are not explained. The limitation has an antecedent issue of “ the fuse element ”. Therefore, it is indefinite. For the examination purpose and according to claim 7, the limitation “…a first fuse element extending horizontally between the first and second conductive structures… … and the fuse element is fully embedded… and “a second fuse element… … the fuse element is fully embedded…” is interpreted as “…a first fuse element extending horizontally between the first and second conductive structures… … and the first fuse element is fully embedded…” and “a second fuse element… …the second fuse element is fully embedded…”. Regarding claim 7 , it recites the limitation “…a first dielectric material substrate and a second dielectric material substrate … …a second line of conducting material located between the second layer of dielectric material and the second dielectric material substrate … and the fuse element is fully embedded between the second layer of dielectric material and the second dielectric material substrate ” is not explained. The “ second dielectric material substrate ” is not explained and it does not show in the drawings. Therefore, it is indefinite. For the examination purpose and according to Fig. 7, the limitation “…a first dielectric material substrate and a second dielectric material substrate … …a second line of conducting material located between the second layer of dielectric material and the second dielectric material substrate …” and the fuse element is fully embedded between the second layer of dielectric material and the second dielectric material substrate …” are interpreted as “…a first dielectric material substrate… …a second line of conducting material located between the second layer of dielectric material and the first layer of dielectric material …” and the fuse element is fully embedded between the second layer of dielectric material and the first layer of dielectric material . Regarding claims 9-10 and 12-13, those are rejected under 35 U.S.C. 112 (b), because of their dependency status from claim 7. Claim Rejections - 35 USC § 103 07-20-aia AIA The following is a quotation of AIA 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-3, 5-7, 9-10 and 12-13 are rejected under AIA 35 U.S.C. 103 as being unpatentable over Whitney et al. (US 5726621 A, hereinafter Whitney, of the record) in view of Li (US 20150097266 A1, hereinafter Li, of the record). Re: Independent Claim 1 , Whitney discloses an electrical fuse for an integrated circuit, the electrical fuse ( Fig. 2a ) comprising: PNG media_image1.png 690 1238 media_image1.png Greyscale Whitney ’s Figure 2a-Annotated. a dielectric material substrate ( 26a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a ); a layer of dielectric material ( 24a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a, Whitney ); at least one line of conducting material ( 44a fusible element in Col. 3, lines 51-52, Fig. 2a ) located between the layer of dielectric material ( 24a ) and the dielectric material substrate ( 26a ), wherein each of the at least one line of conducting material ( 44a ) includes: a first conductive structure ( 44a-left a portion of 44a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having a first vertical height ( Fig. 2a ); a second conductive structure ( 44a-right a portion of 44a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having the first vertical height ( Fig. 2a ); and a fuse element ( 48a-1 fuse element, a middle portion of 44a in Col. 4, lines 17-18, Fig. 2a-Annotated ) extending horizontally between ( Fig. 2a-Annotated ) the first ( 44a-left ) and second conductive ( 44a-right ) structures and the fuse element ( 48a-1 ) is fully embedded ( Fig. 2a-Annotated ) between the layer of dielectric material ( 24a ) and the dielectric material substrate ( 26a) ; and a first conductive connection ( 46a-left-1 pad 46a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated, Whitney ) and a second conductive connection ( 46a-right-1 pad 46a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated, Whitney ) , wherein the first conductive connection ( 46a-left-1 ) is located above and in direct contact with the first conductive structure ( 44a-left , Whitney ) and the second conductive connection ( 46a-right-1 ) is located above and in direct contact with the second conductive structure ( 44a-right ). Whitney does not expressly disclose wherein the fuse element ( 48a-1 ) has a second vertical height that is less than the first vertical height. However, in the same semiconductor device field of endeavor, Li discloses wherein the fuse element ( 72 fuse link in [0049], Fig. 2B-Annotated ) has a second vertical height ( HL the fuse link height H L is about 10% of the fuse contact height H c in [0049], Fig. 2B ) that is less than the first vertical height ( Hc in [0049], Fig. 2B ). PNG media_image2.png 208 484 media_image2.png Greyscale Li ’s Figure 2B-Annotated. It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to include the Li ’s feature of wherein the fuse element has a second vertical height that is less than the first vertical height to Whitney ’s device to increase the current density to facilitate blowing of the fuse ([0049], Li). Whitney modified by Li does not expressly disclose wherein the fuse element is defined by a residual lower portion of the at least one line of conducting material that remains after selective removal of an upper portion of a middle region of the at least one line of conducting material. However, the limitation of “…the fuse element is defined by a residual lower portion of the at least one line of conducting material that remains after selective removal of an upper portion of a middle region of the at least one line of conducting material...” is merely a product-by-process limitation that does not structurally distinguish the claimed invention over the prior art. The patentability of a product does not depend on its method of production. If the product in the product-by-process claim is the same as or obvious from a product of the prior art, the claim is unpatentable even though the prior product was made by a different process. In re Thorpe, 227 USPQ 964, 966. MPEP 2113 I. Re: Claim 2 , Whitney modified by Li discloses the electrical fuse of claim 1, wherein the fuse element ( Li applied to 48a-1 , Fig. 2a, Whitney ) extends horizontally ( Fig. 2a-Annotated, Whitney ) between a bottom portion of each of the first ( Li applied to 44a-left Fig. 2a-Annotated, Whitney ) and second conductive ( Li applied to 44a-right Fig. 2a-Annotated, Whitney ) structures. Re: Claim 3, Whitney modified by Li discloses the electrical fuse of claim 1, wherein the fuse element ( 72 fuse link in [0049], Fig. 2B-Annotated, Li ) is ten (10) to fifteen (15) times less ( the fuse link height H L is about 10% of the fuse contact height H c in [0049] , Li ) in height than the first ( 74-left fuse contact in [0049], Fig. 2B-Annotated, Li ) and second conductive ( 74-right fuse contact in [0049], Fig. 2B-Annotated, Li ) structures. Re: Claim 5 , Whitney modified by Li discloses the electrical fuse of claim 1 , further comprising: the layer of dielectric material ( 24a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a, Whitney ) surrounding the first conductive connection ( 46a-left-1 , Whitney ) and the second conductive connection ( 46a-right-1 , Whitney ). Re: Claim 6, Whitney modified by Li discloses the electrical fuse of claim 1, Whitney modified by Li does not expressly disclose wherein the conducting material is a metal. However, in the same semiconductor device field of endeavor, Li discloses the conducting material is a metal ( 70 a fuse structure made of tungsten in [0058], Fig. 2B ). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to include the Li ’s feature of wherein the conducting material is a metal to Whitney ’s device to increase the current density to facilitate blowing of the fuse ([0049], Li). Re: Independent Claim 7 , Whitney teaches an electrical fuse for an integrated circuit, the electrical fuse ( Fig. 2a ) comprising: a first dielectric material substrate ( 26a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a ); a first layer of dielectric material ( 24a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a ) and a second layer of dielectric material ( 22a a ceramic substrate such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a ) ; a first line of conducting material ( 44a fusible element in Col. 3, lines 51-52, Fig. 2a ) located between the first layer of dielectric material ( 24a ) and the first dielectric material substrate ( 26a ), wherein the first line of conducting material ( 44a ) includes: a first conductive structure ( 44a-left a portion of 44a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having a first vertical height ( Fig. 2a ); a second conductive structure ( 44a-right a portion of 44a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having the first vertical height ( Fig. 2a ); and a first fuse element ( 48a-1 fuse element, a middle portion of 44a in Col. 4, lines 17-18, Fig. 2a-Annotated ) extending horizontally between ( Fig. 2a-Annotated ) the first ( 44a-left ) and second conductive ( 44a-right ) structures, and first the fuse element ( 48a-1 ) is fully embedded ( Fig. 2a-Annotated ) between the layer of dielectric material ( 24a ) and the dielectric material substrate ( 26a) ; a first conductive connection ( 46a-left-1 pad 46a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated ) and a second conductive connection ( 46a-right-1 pad 46a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated ) , wherein the first conductive connection ( 46a-left-1 ) is located above and in direct contact with the first conductive structure ( 44a-left ) and the second conductive connection ( 46a-right-1 ) is located above and in direct contact with the second conductive structure ( 44a-right ); a second line of conducting material ( 42a fusible element in Col. 3, lines 51-52, Fig. 2a ) located between the second layer of dielectric material ( 22a ) and the first layer of dielectric material ( 26a ) and located above the first line of conducting material ( 44a ), wherein the second line of conducting material ( 42a ) includes: a third conductive structure ( 42a-left a portion of 42a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having a third vertical height ; a fourth conductive structure ( 42a-right a portion of 42a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated ) having the third vertical height ; and a second fuse element ( 48a-2 fuse element, a middle portion of 42a in Col. 4, lines 17-18, Fig. 2a-Annotated ) extending horizontally between the third ( 42a-left ) and fourth conductive ( 42a-right ) structures, the second fuse element ( 48a-2 ) is fully embedded between the second layer of dielectric material ( 22a ) and the first layer of dielectric material ( 26a ) ; and . a third conductive connection ( 46a-left-2 pad 46a at left side in Col. 4, lines 11-12, Fig. 2a-Annotated ) and a fourth conductive connection ( 46a-right-2 pad 46a at right side in Col. 4, lines 11-12, Fig. 2a-Annotated ) , wherein the third conductive connection ( 46a-left-2 ) is located above and in direct contact with the third conductive structure ( 42a-left ) , and the fourth conductive connection ( 46a-right-2 ) is located above and in direct contact with the fourth conductive structure ( 42a-right ) , wherein the first conductive connection ( 46a-left-1 ) is located below and in contact with the third conductive structure ( 42a-left ) , and the second conductive connection ( 46a-right-1 ) is located below and in contact with the fourth conductive structure ( 42a-right ) . Whitney does not expressly disclose wherein the first fuse element is defined by a first residual lower portion of the first line of conducting material that remains after selective removal of an upper portion of a middle region of the first line of conducting material, the first fuse element has a second vertical height that is less than the first vertical height and wherein the second fuse element is defined by a second residual lower portion of the second line of conducting material that remains after selective removal of an upper portion of a middle region of the second line of conducting material, the second fuse element has a fourth vertical height that is less than the third vertical height. However, in the same semiconductor device field of endeavor, Li discloses wherein the fuse element ( 72 fuse link in [0049], Fig. 2B-Annotated ) has a second vertical height ( HL the fuse link height H L is about 10% of the fuse contact height H c in [0049], Fig. 2B ) that is less than the first vertical height ( Hc in [0049], Fig. 2B ). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to include the Li ’s feature of wherein the fuse element has a second vertical height that is less than the first vertical height to Whitney ’s device to obtain the first fuse element has a second vertical height that is less than the first vertical height and the second fuse element has a fourth vertical height that is less than the third vertical height to increase the current density to facilitate blowing of the fuse ([0049], Li). Whitney modified by Li does not expressly disclose wherein the first fuse element is defined by a first residual lower portion of the first line of conducting material that remains after selective removal of an upper portion of a middle region of the first line of conducting material and wherein the second fuse element is defined by a second residual lower portion of the second line of conducting material that remains after selective removal of an upper portion of a middle region of the second line of conducting material. However, the limitation of “… wherein the first fuse element is defined by a first residual lower portion of the first line of conducting material that remains after selective removal of an upper portion of a middle region of the first line of conducting material and wherein the second fuse element is defined by a second residual lower portion of the second line of conducting material that remains after selective removal of an upper portion of a middle region of the second line of conducting material ...” is merely a product-by-process limitation that does not structurally distinguish the claimed invention over the prior art. The patentability of a product does not depend on its method of production. If the product in the product-by-process claim is the same as or obvious from a product of the prior art, the claim is unpatentable even though the prior product was made by a different process. In re Thorpe, 227 USPQ 964, 966. MPEP 2113 I. Re: Claim 9 , Whitney modified by Li discloses the electrical fuse of claim 7, wherein the first fuse element ( Li applied to 48a-1 , Fig. 2a, Whitney ) extends horizontally between ( Fig. 2a-Annotated, Whitney ) a bottom portion of each of the first ( Li applied to 44a-left Fig. 2a-Annotated, Whitney ) and second conductive ( Li applied to 44a-right Fig. 2a-Annotated, Whitney ) structures, and the second fuse element ( Li applied to 48a-2 , Fig. 2a, Whitney ) extends horizontally between a bottom portion of each of the third ( Li applied to 42a-left Fig. 2a-Annotated, Whitney ) and fourth conductive ( Li applied to 42a-right Fig. 2a-Annotated, Whitney ) structures. Re: Claim 10, Whitney modified by Li discloses the electrical fuse of claim 7, wherein the first fuse element ( 72 fuse link in [0049], Fig. 2B-Annotated, Li ) is ten (10) to fifteen (15) times less ( the fuse link height H L is about 10% of the fuse contact height H c in [0049] , Li ) in height than the first ( 74-left fuse contact in [0049], Fig. 2B-Annotated, Li ) and second conductive ( 74-right fuse contact in [0049], Fig. 2B-Annotated, Li ) structures, and the second fuse element ( Li applied to 48a-1 , Fig. 2a, Whitney ) is ten (10) to fifteen (15) times less in height than the third ( Li applied to 42a-left Fig. 2a-Annotated, Whitney ) and fourth ( Li applied to 42a-right Fig. 2a-Annotated, Whitney ) conductive structures. Re: Claim 12 , Whitney modified by Li discloses the electrical fuse of claim 7 , further comprising: the first layer of dielectric material ( 24a a ceramic material such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a, Whitney ) surrounding the first conductive connection ( 46a-left-1 , Whitney ) and the second conductive connection ( 46a-right-1 , Whitney ); and the second layer of dielectric material ( 22a a ceramic material such as dielectric material in Col. 1, lines 40-45, Col. 3, lines 51-52, Fig. 2a, Whitney ) surrounding the third conductive connection ( 46a-left-2 , Fig. 2a-Annotated, Whitney ) and the fourth consecutive connection ( 46a-right-2 , Fig. 2a-Annotated, Whitney ). Re: Claim 13, Whitney modified by Li discloses the electrical fuse of claim 7, Whitney modified by Li does not expressly disclose wherein the conducting material is a metal. However, in the same semiconductor device field of endeavor, Li discloses the conducting material is a metal ( 70 a fuse structure made of tungsten in [0058], Fig. 2B ). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to include the Li ’s feature of wherein the conducting material is a metal to Whitney ’s device to increase the current density to facilitate blowing of the fuse ([0049], Li). Conclusion 07-40 AIA Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL . See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SANDRA M RODRIGUEZ VILLANUEVA whose telephone number is (571)272-1936. The examiner can normally be reached Monday to Friday 8:00am-5:00pm (EST). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jessica Manno can be reached at (571) 272-2339. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SANDRA MILENA RODRIGUEZ VILLANUEVA/Examiner, Art Unit 2898 /JESSICA S MANNO/SPE, Art Unit 2898 Application/Control Number: 18/486,526 Page 2 Art Unit: 2898 Application/Control Number: 18/486,526 Page 3 Art Unit: 2898 Application/Control Number: 18/486,526 Page 4 Art Unit: 2898 Application/Control Number: 18/486,526 Page 5 Art Unit: 2898 Application/Control Number: 18/486,526 Page 6 Art Unit: 2898 Application/Control Number: 18/486,526 Page 7 Art Unit: 2898 Application/Control Number: 18/486,526 Page 8 Art Unit: 2898 Application/Control Number: 18/486,526 Page 9 Art Unit: 2898 Application/Control Number: 18/486,526 Page 10 Art Unit: 2898 Application/Control Number: 18/486,526 Page 11 Art Unit: 2898 Application/Control Number: 18/486,526 Page 12 Art Unit: 2898 Application/Control Number: 18/486,526 Page 13 Art Unit: 2898
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