Prosecution Insights
Last updated: April 19, 2026
Application No. 18/492,170

SEMICONDUCTOR PACKAGE

Non-Final OA §103
Filed
Oct 23, 2023
Examiner
LEBENTRITT, MICHAEL
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
92%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
98%
With Interview

Examiner Intelligence

Grants 92% — above average
92%
Career Allow Rate
916 granted / 992 resolved
+24.3% vs TC avg
Moderate +6% lift
Without
With
+6.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
25 currently pending
Career history
1017
Total Applications
across all art units

Statute-Specific Performance

§101
3.3%
-36.7% vs TC avg
§103
40.8%
+0.8% vs TC avg
§102
30.2%
-9.8% vs TC avg
§112
10.1%
-29.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 992 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 10/23/2023 was filed after the mailing date of the first action on the merits. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-12, and 14-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over KR 20140041970 A, in view of NAKAMURA et al, US 20130313689 A1 and further in view of Brandenburg et al, US 20040113281 A1. ‘970 teaches: a first semiconductor chip (100) comprising a substrate having a front surface (FS) and an opposite rear surface (BS), a rear protective layer (315) on the rear surface of the substrate, a plurality of first rear through-vias (400) penetrating through the rear protective layer and extending into the substrate, a plurality of second rear through-vias penetrating through the rear protective layer and extending into the substrate [In regards to the “plurality”, examiner only needs to demonstrate at least one (see In re Harza)] , a plurality of front through-vias (200) extending from the front surface of the substrate and connected to the plurality of first rear through-vias, and a plurality of rear pads (420) on the rear protective layer (315), wherein the plurality of rear pads (420) are connected to the plurality of first and second rear through-vias (200, 400); a second semiconductor chip (140) on the first semiconductor chip (100), the second semiconductor chip comprising a plurality of front pads (155, 152, 162) electrically connected to the plurality of rear pads (420); and wherein each of the plurality of first and second rear through-vias (200) has a width greater than a width of each of the plurality of front through-vias (151) (see figure 1g) ‘970 fails to teach: a plurality of bump structures between the plurality of rear pads of the first semiconductor chip and the plurality of front pads of the second semiconductor chip; and an adhesive layer surrounding the plurality of bump structures between the first semiconductor chip and the second semiconductor chip. Nakamura teaches: As shown in FIG. 2B, second seed film 27 formed by successively stacking titanium (Ti) and copper (Cu) is provided on the lower surface of front bump 28, and the upper surface of front bump 28 is covered by front plating layer 29 which is an alloy containing tin (Sn) as a main component. (para 28) Brandenburg teaches: For this purpose, the package 10 is equipped with a gate 46 and vent 48 through which a suitable polymeric material can be injected into the cavity 42 to form the compound 44. (figures 3-5), para 21 Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the above references, because it is conventionally done in the art to electrically connect substrates through bump structures and fill the cavities to avoid voids or defects within the package. Nakumara further teaches: 2. The semiconductor package of claim 1, wherein the first semiconductor chip comprises a center region and a peripheral region around the center region, wherein the plurality of first rear through-vias are in the center region and the plurality of second rear through-vias are in the peripheral region. See figures 2a and 2b, 5a and 5b ‘0970 further teaches: 3. The semiconductor package of claim 2, wherein the plurality of second rear through-vias are electrically insulated from the plurality of front through-vias. See figure 1g. 4. The semiconductor package of claim 2, wherein the width of each of the plurality of second rear through-vias is different from the width of each of the plurality of first rear through-vias. See figure 1g 5. The semiconductor package of claim 4, wherein the width of each of the plurality of second rear through-vias is greater than the width of each of the plurality of first rear through-vias. See figure 1g 6. The semiconductor package of claim 1, wherein the first semiconductor chip further comprises a barrier insulating layer (210) extending between at least a portion of the plurality of first and second rear through-vias and the substrate. Figure 1g 7. The semiconductor package of claim 6, wherein the barrier insulating layer comprises at least one of silicon oxide and silicon nitride. (para 12) 8. The semiconductor package of claim 6, wherein the barrier insulating layer is. only between the plurality of first rear through-vias and the substrate. Figure 1g 9. The semiconductor package of claim 1, wherein the width of each of the plurality of first and second rear through-vias is in a range of about 5 µm to about 15 µm, and wherein the width of each of the plurality of front through-vias is in a range of about 2 µm to about 8 µm. In regards to the specific range of values, these range would have been determined through routine experimentation and would not lend themselves to patentability, in the instant application without displaying unexpected results. (in Re Aller) 10. The semiconductor package of claim 1, wherein each of the plurality of first and second rear through-vias has a height smaller than a height of each of the plurality of front through-vias. See Figure 1 g 11. The semiconductor package of claim 10, wherein the height of each of the plurality of first and second rear through-vias is in a range of about 2 µm to about 10 µm. In regards to the specific range of values, these range would have been determined through routine experimentation and would not lend themselves to patentability, in the instant application without displaying unexpected results. (in Re Aller) 12. The semiconductor package of claim 1, wherein the rear protective layer comprises at least one of silicon oxide and silicon nitride. (para 16) 14. A semiconductor package, comprising: ‘970 teaches: a plurality of semiconductor chips (100, 140) stacked in a first direction; and wherein at least one of the plurality of semiconductor chips comprises: a substrate (100) having a front surface (FS) and an opposite rear surface (BS); a rear protective layer (315) on the rear surface of the substrate (100); a plurality of rear pads (420) [In regards to the “plurality”, examiner only needs to demonstrate at least one (see In re Harza)] on the rear protective layer; a plurality of rear through-vias (200) penetrating through the rear protective layer and connected to the plurality of rear pads; Figure 1g a front circuit layer (130) on the front surface of the substrate; a plurality of front pads (155) on the front circuit layer, and a plurality of front through-vias (151) extending from the front surface of the substrate to at least some of the plurality of rear through-vias, and electrically connected to at least some of the plurality of front pads. (figure 1g) ‘0970 fails to teach: a plurality of bump structures between and electrically connecting adjacent ones of the plurality of semiconductor chips; and at least one adhesive layer surrounding the plurality of bump structures. Nakamura teaches: As shown in FIG. 2B, second seed film 27 formed by successively stacking titanium (Ti) and copper (Cu) is provided on the lower surface of front bump 28, and the upper surface of front bump 28 is covered by front plating layer 29 which is an alloy containing tin (Sn) as a main component. (para 28) Brandenburg teaches: For this purpose, the package 10 is equipped with a gate 46 and vent 48 through which a suitable polymeric material can be injected into the cavity 42 to form the compound 44. (figures 3-5), para 21 Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the above references, because it is conventionally done in the art to electrically connect substrates through bump structures and fill the cavities to avoid voids or defects within the package. Nakamura teaches: 15. The semiconductor package of claim 14, wherein the plurality of rear pads and the plurality of front pads that are adjacent to each other in the first direction are electrically connected to each other by the plurality of bump structures. [In regards to the “plurality”, examiner only needs to demonstrate at least one (see In re Harza)] 16. The semiconductor package of claim 14, wherein, in the first direction, a height of each of the plurality of rear through-vias is smaller than a height of each of the plurality of front through-vias. (see figure 1g ‘970) 17. The semiconductor package of claim 14, wherein in a second direction that is transverse to the first direction, a width of each of the plurality of rear through-vias is greater than a width of each of the plurality of front through-vias. (see figure 1g ‘970) Brandenburg teaches: 18. The semiconductor package of claim 14, further comprising: a molding member encapsulating at least a portion of each of the plurality of semiconductor chips. (see figure 3) ‘0970 teaches: 19. A semiconductor package, comprising: a first semiconductor chip (100) comprising a substrate having a front surface and an opposite rear surface, a rear protective layer (315) on the rear surface of the substrate, a plurality of rear through-vias (400) penetrating through the rear protective layer and extending into the substrate, [In regards to the “plurality”, examiner only needs to demonstrate at least one (see In re Harza)] a plurality of front through-vias (200) extending from the front surface of the substrate and connected to the plurality of rear through-vias (400), and a plurality of rear pads (420) on the rear protective layer and connected to the plurality of rear through-vias (400); a second semiconductor chip (140) on the first semiconductor chip, the second semiconductor chip comprising a plurality of front pads (155, 152, 162) electrically connected to the plurality of rear pads; wherein the plurality of rear through-vias comprise a plurality of first rear through- vias electrically connected to the plurality of front through-vias, and a plurality of second rear through-vias electrically insulated from the plurality of front through-vias. (see figure 1g) ‘0970 fails to teach: a plurality of bump structures between the plurality of rear pads of the first semiconductor chip and the plurality of front pads of the second semiconductor chip; an adhesive layer surrounding the plurality of bump structures between the first semiconductor chip and the second semiconductor chip. Nakamura teaches: As shown in FIG. 2B, second seed film 27 formed by successively stacking titanium (Ti) and copper (Cu) is provided on the lower surface of front bump 28, and the upper surface of front bump 28 is covered by front plating layer 29 which is an alloy containing tin (Sn) as a main component. (para 28) Brandenburg teaches: For this purpose, the package 10 is equipped with a gate 46 and vent 48 through which a suitable polymeric material can be injected into the cavity 42 to form the compound 44. (figures 3-5), para 21 Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to combine the above references, because it is conventionally done in the art to electrically connect substrates through bump structures and fill the cavities to avoid voids or defects within the package. ‘0970 further teaches 20. The semiconductor package of claim 19, wherein a lower surface of each of the plurality of first rear through-vias comprises a recess portion in contact with an upper surface of a respective one of the plurality of front through-vias. See figure 1g Claim(s) 13 is/are rejected under 35 U.S.C. 103 as being unpatentable over KR 20140041970 A, in view of NAKAMURA et al, US 20130313689 A1 and further in view of Brandenburg et al, US 20040113281 A1. The above references fail to teach: 13. The semiconductor package of claim 1, wherein the substrate comprises at least one of a silicon and germanium. Examiner takes official notice that it is well known in the art to form a substrate that comprises at least one of a silicon and germanium. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MICHAEL LEBENTRITT whose telephone number is (571)272-1873. The examiner can normally be reached IFP Mon- Fri 8:30 am- 6 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached at (571)272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. MICHAEL . LEBENTRITT Primary Examiner Art Unit 2893 /MICHAEL LEBENTRITT/Primary Examiner, Art Unit 2893
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Prosecution Timeline

Oct 23, 2023
Application Filed
Jan 27, 2026
Non-Final Rejection — §103
Mar 11, 2026
Examiner Interview Summary
Mar 11, 2026
Applicant Interview (Telephonic)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
92%
Grant Probability
98%
With Interview (+6.0%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 992 resolved cases by this examiner. Grant probability derived from career allow rate.

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