Prosecution Insights
Last updated: May 29, 2026
Application No. 18/498,836

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Non-Final OA §103
Filed
Oct 31, 2023
Priority
Jan 27, 2023 — JP 2023-010742
Examiner
ISAAC, STANETTA D
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Mitsubishi Electric Corporation
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
48%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
816 granted / 955 resolved
+17.4% vs TC avg
Minimal -38% lift
Without
With
+-37.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
26 currently pending
Career history
1010
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
63.5%
+23.5% vs TC avg
§102
34.7%
-5.3% vs TC avg
§112
1.5%
-38.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 955 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-6 in the reply filed on 2/24/26 is acknowledged. Claims 7-14 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected Invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 2/24/26. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Information Disclosure Statement The information disclosure statements (IDS) were submitted on 10/31/23 and 3/03/26. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Specification The specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant’s cooperation is requested in correcting any errors of which applicant may become aware in the specification. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1, 2, 5 and 6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kawashiro (US PGPub 2021/0035893, hereinafter referred to as “Kawashiro”) in view of Shearer et al. (WO 2016/174584 hereinafter referred to as “Shearer”). Kawashiro discloses the semiconductor method substantially as claimed. See figures 1-10 and corresponding text, where Inaba teaches, in claim 1, a method of manufacturing a semiconductor device, the method comprising: (figure 1; [0021-0046]) a step (a) of manufacturing a semiconductor module (100) by sealing, with a mold resin (86), a first metal plate (16), an insulating layer (12) bonded to a lower surface of the first metal plate (16), a second metal plate (20) bonded to a lower surface of the insulating layer (12), and a semiconductor element (24) mounted on an upper surface of the first metal plate (16) with a first bonding member (30) between the semiconductor element (24) and the first metal plate (16) in a state in which a lower surface of the second metal plate (20) is exposed; and a step (b) of mounting the semiconductor module (100) on a metal base plate (2) ([0025], metal) by bonding the lower surface of the second metal plate (20) to an upper surface of the metal base plate (2) by a second bonding member (32) having a melting point lower than a melting point of the first bonding member (30), ([0040], melting points) wherein the step (b) includes steps of disposing the semiconductor module (100) on the upper surface of the metal base plate (2) with the second bonding member (32) between the semiconductor module (100) and the metal base plate (2), heating the metal base plate (2), the second bonding member (32), and the semiconductor module (100) to melt the second bonding member (32), and then cooling the metal base plate (2), the second bonding member (32), and the semiconductor module (100) to cure the second bonding member (32), and during the cooling of the metal base plate, the second bonding member (32), and the semiconductor module (100), a difference between an upper surface temperature of the metal base plate (2) and a lower surface temperature of the first metal plate (16) (figure 2; [0047-0058]). However, Kawashiro fails to show, in claim 1, during cooling of the metal base a difference between the upper surface temperature of the metal base plate and a lower temperature of the first metal plate at a solid phase line of the second bonding member is 5° C. or less. Shearer teaches, claim 1, teaches a similar device that includes a eutectic solder that includes bismuth-based alloys to attach (20) an electronic component (40) to a substrate (70) (figure 1; [0089-0090]). In addition, Shearer teaches the cooling rate temperature to be less than 6oC per second between about 2.17 and about 3.25 oC per minute ([0053]). Also, Shearer teaches selecting the cooling rate from the peak temperature of the profile to room temperature to prevent damage to the semiconductor chip as a result of thermal shock ([0053]). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention, to incorporate during cooling of the metal base a difference between the upper surface temperature of the metal base plate and a lower temperature of the first metal plate at a solid phase line of the second bonding member is 5° C. or less, in the method of Kawashiro, according to the teachings Shearer, with the motivation of preventing damage to the semiconductor chip from thermal shock. Kawashiro in view of Shearer shows, in claim 2, wherein the second bonding member is tin solder containing bismuth, and during the cooling of the metal base plate, the second bonding member, and the semiconductor module, a difference between an upper surface temperature of the metal base plate and a lower surface temperature of the first metal plate at a eutectic point of the second bonding member in a case of containing the bismuth at 58% is 2° C. or less ([0053], taught by Shearer). Kawashiro in view of Shearer shows, in claim 5, wherein a plurality of pin fins protruding downward are provided on a lower surface of the metal base plate, and in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by bringing a cooling block into contact with tips of the plurality of pin fins (figure 1, [0022-0025], taught by Kawashiro). Kawashiro in view of Shearer shows, in claim 6, wherein a plurality of pin fins protruding downward are provided on a lower surface of the metal base plate, and in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by bringing a cooling block into contact with tips of the plurality of pin fins (figure 1, [0022-0025], taught by Kawashiro). Claim(s) 3 and 4 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kawashiro (US PGPub 2021/0035893, hereinafter referred to as “Kawashiro”) in view of Shearer et al. (WO 2016/174584 hereinafter referred to as “Shearer”) as applied to claim 1 above, and further in view of Mohamed et al. (US PGPub 2017/0365544, hereinafter referred to as “Mohamed”). Kawashiro in view of Shearer discloses the semiconductor method substantially as claimed. See the rejection above. However, Kawashiro in view of Shearer fails to show, in claim 3, wherein in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by blowing a cooled reducing gas from above the semiconductor module. Mohamed teaches, in claim 3, an attaching apparatus that includes a cooling zone that controls the temperature in a nitrogen gas environment (figures 1 and 3C; [0023], [0036-0037]). In addition, Mohamed provides the advantages of providing high reliability connections ([0003]). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention filed, to incorporate wherein in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by blowing a cooled reducing gas from above the semiconductor module, in the method of the Kawashiro in view of Shearer, according to the teachings of Mohamed, with the motivation of providing high reliability connections. Kawashiro in view of Shearer fails to show, in claim 4, wherein in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by blowing a cooled reducing gas from above the semiconductor module. Mohamed teaches, in claim 4, an attaching apparatus that includes a cooling zone that controls the temperature in a nitrogen gas environment (figures 1 and 3C; [0023], [0036-0037]). In addition, Mohamed provides the advantages of providing high reliability connections ([0003]). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention filed, to incorporate wherein in the step (b), the metal base plate, the second bonding member, and the semiconductor module are cooled by blowing a cooled reducing gas from above the semiconductor module, in the method of the Kawashiro in view of Shearer, according to the teachings of Mohamed, with the motivation of providing high reliability connections. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to STANETTA D ISAAC whose telephone number is (571)272-1671. The examiner can normally be reached M-F 10-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Leonard Chang can be reached at 571-270-3691. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STANETTA D ISAAC/Examiner, Art Unit 2898 April 4, 2026
Read full office action

Prosecution Timeline

Oct 31, 2023
Application Filed
Apr 08, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
48%
With Interview (-37.6%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 955 resolved cases by this examiner. Grant probability derived from career allowance rate.

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