Prosecution Insights
Last updated: July 17, 2026
Application No. 18/510,814

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Non-Final OA §102
Filed
Nov 16, 2023
Priority
Nov 18, 2022 — JP 2022-184749
Examiner
FRASER, STEWART A
Art Unit
Tech Center
Assignee
SUMITOMO CHEMICAL Company, Limited
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
1164 granted / 1352 resolved
+26.1% vs TC avg
Moderate +14% lift
Without
With
+14.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
26 currently pending
Career history
1368
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
77.7%
+37.7% vs TC avg
§102
11.7%
-28.3% vs TC avg
§112
4.2%
-35.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1352 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . This is the initial office action for US Patent Application No. 18/510814 by Terahigashi et al. Claims 1-12 are currently pending and have been fully considered. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-12 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Uehara (US 2024/0377734 A1). Regarding claims 1, 7 and 8, Uehara teaches [0015, 0042-0045] a resist composition that generates an acid upon exposure and exhibits changed solubility in a developing solution under an action of the acid, the resist composition containing a base material component (A) that exhibits changed solubility in a developing solution under the action of the acid and an acid diffusion control agent component (D) that controls the diffusion of the acid generated upon exposure, in which the acid diffusion control agent component (D) contains a compound (D0) represented by General Formula (d0): PNG media_image1.png 114 426 media_image1.png Greyscale Uehara further teaches [0042-0045] component (A) may generate acid and another acid generator (B) may be included in the resist composition and may also generated acid. With regard to the carboxylate chemical compound in formulas (I) and (5a) recited in claim 1, Uehara teaches ([0410] and Chemical Structure (d0-an-3) listed on page 44) a carboxylate composition that satisfies the compositional limitations recited in claim 1: PNG media_image2.png 236 446 media_image2.png Greyscale Therefore claims 1, 7 and 8 are anticipated by Uehara. Regarding claims 2-6, Uehara teaches ([0410] and Chemical Structure (d0-an-3) listed on page 44) the carboxylate composition shown above that satisfies the compositional limitations recited in claims 2-6. Therefore, claims 2-6 are anticipated by Uehara. Regarding claim 9, Uehara teaches [0121-0122] the resist composition may further include a compound comprising an acid dissociable group (acid-labile group) having the following chemical formula: PNG media_image3.png 136 408 media_image3.png Greyscale The acid dissociable group shown above anticipates chemical formula (a1-0) recited in claim 9. Regarding claim 10, Uehara teaches [0172] the resist composition may further include an aromatic hydrocarbon containing compound having the following chemical formula: PNG media_image4.png 226 396 media_image4.png Greyscale The aromatic hydrocarbon containing compound shown above anticipates chemical formula (a2-A) recited in claim 10. Regarding claim 11, Uehara teaches [0192] the resist composition may further include a compound comprising an acid dissociable group (acid-labile group) having the following chemical formula: PNG media_image5.png 172 388 media_image5.png Greyscale The acid dissociable group shown above anticipates chemical formula (a3-2) recited in claim 11. Regarding claim 12, Uehara teaches [0017,0641 and 0755] a resist pattern forming method, including a step of forming a resist film on a wafer comprising the resist composition above, drying the resist film, subsequently exposing the resist film, performing a post exposure bake (step of heating) and then performing a step of developing the exposed resist film to form a resist pattern. Any inquiry concerning this communication or earlier communications from the examiner should be directed to STEWART A FRASER whose telephone number is (571)270-5126. The examiner can normally be reached M-F, 7am-4pm, EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Miriam Stagg can be reached at 571-270-5256. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STEWART A FRASER/Primary Examiner, Art Unit 1724
Read full office action

Prosecution Timeline

Nov 16, 2023
Application Filed
Jun 17, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
99%
With Interview (+14.2%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1352 resolved cases by this examiner. Grant probability derived from career allowance rate.

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