Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1721 1724 1737 1795
This examiner grants 86% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18271109 | Pouch-Shaped Battery Cell with Improved Safety and Battery Module Including the Same | Non-Final OA | LG Energy Solution, Ltd. |
| 18033498 | Method for Manufacturing Electrode Assembly, Sealing Unit Used for the Same, and Electrode Assembly Manufactured by Sealing Unit | Non-Final OA | LG Energy Solution, Ltd. |
| 18260441 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | Non-Final OA | SONY GROUP CORPORATION |
| 18260345 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | Non-Final OA | SONY GROUP CORPORATION |
| 18773019 | Asymmetric Battery Having a Semi-Solid Cathode and High Energy Density Anode | Non-Final OA | 24M Technologies, Inc. |
| 19271066 | SCAFFOLDING MATRIX WITH INTERNAL NANOPARTICLES | Final Rejection | Sila Nanotechnologies, Inc. |
| 18337428 | ANODE FOR SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | Non-Final OA | SK On Co., Ltd. |
| 18274183 | MASK BLANK AND REFLECTIVE MASK | Non-Final OA | HOYA CORPORATION |
| 18355269 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18355053 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18225343 | RESIN CURRENT COLLECTOR AND LAMINATED BATTERY | Non-Final OA | TOYOTA JIDOSHA KABUSHIKI KAISHA |
| 18026432 | ENERGY STORAGE CELL | Final Rejection | Tesla, Inc. |
| 18354593 | MASK FOR STITCHING EXPOSURE | Non-Final OA | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
| 18354889 | SUBSTRATE TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18338379 | 4H/FCC HETEROPHASE PLATINUM BASED NANOMATERIAL ON NANOROD FOR ELECTROCATALYTIC ALCOHOL OXIDATION | Non-Final OA | City University of Hong Kong |
| 18254124 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18252720 | PASTE FOR ELECTROCHEMICAL DEVICE, SLURRY FOR ELECTROCHEMICAL DEVICE ELECTRODE, ELECTRODE FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE | Non-Final OA | ZEON CORPORATION |
| 18252719 | ELECTRODE FOR ELECTROCHEMICAL DEVICE AND ELECTROCHEMICAL DEVICE | Non-Final OA | ZEON CORPORATION |
| 18189389 | CELL FORMATION SYSTEM INCLUDING COMPRESSION FIXTURE FOR LITHIUM CONTAINING SECONDARY BATTERIES | Non-Final OA | Enovix Corporation |
| 18517882 | LITHIUM ALL-SOLID-STATE BATTERY | Non-Final OA | The Regents of the Univerity of Colorado, a body corporate |
| 18316977 | REDOX FLOW BATTERY AND BATTERY SYSTEM | Non-Final OA | ESS TECH, INC. |
| 18276789 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 18024958 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | Non-Final OA | TEKSCEND PHOTOMASK CORP. |
| 18358561 | PELLICLE FOR EUV LITHOGRAPHY | Non-Final OA | S&S TECH Co., Ltd. |
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