Tech Center 1700 • Art Units: 1721 1724 1737 1795
This examiner grants 86% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18328395 | METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18252649 | CATHODE ACTIVE MATERIAL, CATHODE AND LITHIUM SECONDARY BATTERY COMPRISING SAME, AND PREPARATION METHOD THEREFOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18302375 | CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18181597 | SPIRALLY WOUND ELECTRODE ASSEMBLY, BATTERY CELL, BATTERY AND ELECTRIC APPARATUS | Non-Final OA | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED |
| 18260441 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | Non-Final OA | SONY GROUP CORPORATION |
| 18260345 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | Non-Final OA | SONY GROUP CORPORATION |
| 18773019 | Asymmetric Battery Having a Semi-Solid Cathode and High Energy Density Anode | Non-Final OA | 24M Technologies, Inc. |
| 18271109 | Pouch-Shaped Battery Cell with Improved Safety and Battery Module Including the Same | Non-Final OA | LG Energy Solution, Ltd. |
| 18033498 | Method for Manufacturing Electrode Assembly, Sealing Unit Used for the Same, and Electrode Assembly Manufactured by Sealing Unit | Non-Final OA | LG Energy Solution, Ltd. |
| 18457908 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18355269 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18355053 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18337428 | ANODE FOR SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME | Non-Final OA | SK On Co., Ltd. |
| 18274183 | MASK BLANK AND REFLECTIVE MASK | Non-Final OA | HOYA CORPORATION |
| 18251776 | POSITIVE ELECTRODE ACTIVE MATERIAL, LITHIUM-ION SECONDARY BATTERY, AND VEHICLE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18225343 | RESIN CURRENT COLLECTOR AND LAMINATED BATTERY | Non-Final OA | TOYOTA JIDOSHA KABUSHIKI KAISHA |
| 18214743 | VEHICLE | Non-Final OA | TOYOTA JIDOSHA KABUSHIKI KAISHA |
| 18276704 | Energy Storage Cell and Method for the Production Thereof | Non-Final OA | Bayerische Motoren Werke Aktiengesellschaft |
| 18360853 | EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASK | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18354593 | MASK FOR STITCHING EXPOSURE | Non-Final OA | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
| 18026432 | ENERGY STORAGE CELL | Final Rejection | Tesla, Inc. |
| 18354889 | SUBSTRATE TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18321596 | METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18254124 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18252720 | PASTE FOR ELECTROCHEMICAL DEVICE, SLURRY FOR ELECTROCHEMICAL DEVICE ELECTRODE, ELECTRODE FOR ELECTROCHEMICAL DEVICE, AND ELECTROCHEMICAL DEVICE | Non-Final OA | ZEON CORPORATION |
| 18252719 | ELECTRODE FOR ELECTROCHEMICAL DEVICE AND ELECTROCHEMICAL DEVICE | Non-Final OA | ZEON CORPORATION |
| 18338379 | 4H/FCC HETEROPHASE PLATINUM BASED NANOMATERIAL ON NANOROD FOR ELECTROCATALYTIC ALCOHOL OXIDATION | Non-Final OA | City University of Hong Kong |
| 18450932 | PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS | Non-Final OA | The Aerospace Corporation |
| 18254744 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 18262035 | METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA | Non-Final OA | INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES |
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