Prosecution Insights
Last updated: April 19, 2026
Application No. 18/517,714

LASER TRANSFER OF MICROELECTRONIC DEVICE AND ASSOCIATED CONDUCTIVE PAD

Non-Final OA §102§103
Filed
Nov 22, 2023
Examiner
OJEH, NDUKA E
Art Unit
2892
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Coherent Lasersystems GmbH & Co. Kg
OA Round
1 (Non-Final)
89%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
87%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allow Rate
686 granted / 769 resolved
+21.2% vs TC avg
Minimal -2% lift
Without
With
+-2.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
25 currently pending
Career history
794
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
50.5%
+10.5% vs TC avg
§102
28.9%
-11.1% vs TC avg
§112
12.7%
-27.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 769 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 3/18/2025 was filed. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Specification The abstract and title are consistent with the requirements set forth in the MPEP 608.01(b) and 606, respectively. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-2, 4-5, 8 and 13-20 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Noda et al. US PGPub. 2024/0162405. Regarding claim 1, Noda teaches a laser transfer method (fig. 5-10), comprising steps of: transferring (fig. 8) a pad (61, 62, fig. 8) [0078] of conductive paste from a conductive-paste layer (curable resin/anisotropic conductive film with conductive particles, 60, fig. 5-8) [0069]-[0070] on a first donor substrate (50, fig. 8) [0060] to a receiver substrate (30, fig. 9) [0089] by laser-induced forward transfer (LIFT, [0078]); and transferring (fig. 9-10) a microelectronic device (20, fig. 9) [0093] from a second donor substrate (70, fig. 9) [0096] to the pad of conductive paste (62) on the receiver substrate (30) by laser-induced forward transfer (LIFT, fig. 10, [0098) (Noda et al., fig. 8-10). Regarding claim 2, Noda teaches the method of claim 1, wherein the step of transferring the microelectronic device (20) includes: arranging the second donor substrate (70) such that (a) the microelectronic device (20) faces the pad of conductive paste (62) on the receiver substrate (30) and (b) a first gap (D, fig. 9) [0097] exists between the microelectronic device (20) and the pad of conductive paste (62) prior to the laser-induced forward transfer (fig. 10); and directing a first laser beam (80, fig. 9) [0098] through the second donor substrate (70) onto the microelectronic device (20), to release the microelectronic device (20) from the second donor substrate (70) and propel (lift, [0098]) the microelectronic device (20) across the gap (D) onto the pad of conductive paste (62) on the receiver substrate (30), thereby effecting the laser-induced forward transfer (LIFT, [0098]) (Noda et al., fig. 9-10). Regarding claim 4, Noda teaches the method of claim 1, wherein the microelectronic device (20) is a micro-light-emitting-diode [0002], [0034] (Noda et al., [0002], [0034]). Regarding claim 5, Noda teaches the method of claim 4, wherein the receiver substrate (30) is a display backplane (base substrate of display device 10, fig. 1) [0032] (Noda et al., fig. 1, [0032]). Regarding claim 8, Noda teaches the method of claim 1, wherein the pad of conductive paste (61, 62) is not subjected to reflow between the steps of transferring (fig. 8) the pad (61, 62) and transferring (fig. 9-10) the microelectronic device (20) (Noda et al., [0063], [0069], [0099]). Since solder bump is not provided [0069], then reflow is not needed [0099]. No curing occurs during laser application and only occurs during thermocompression [0063]. Regarding claim 13, Noda teaches the method of claim 1, wherein the same laser source [0107] is used to perform the laser-induced forward transfers of both transferring steps [0078], [0098] (Noda et al., [0107]). Regarding claim 14, Noda teaches the method of claim 1, further comprising a step of heating (thermocompression at 150-260˚C, [0099]) the pad of conductive paste (62), after the step of transferring the microelectronic device (20), so as to cure the pad of conductive paste (62) (Noda et al., fig. 10, [0099]). Regarding claim 15, Noda teaches the method of claim 1, wherein the receiver substrate (30) includes an electrical contact (32, fig. 10) [0104], and the step of transferring the pad (62) deposits the pad of conductive paste (62) in physical contact with the electrical contact (32) (Noda et al., fig. 10). Regarding claim 16, Noda teaches the method of claim 1, wherein the microelectronic device (20) has a smaller footprint [0076] than the pad of conductive paste (62) on the receiver substrate (30) and is located entirely inside a perimeter of the pad of conductive paste (62) (Noda et al., fig. 9 [0076]). Noda teaches that the ratio of the surface area of the pad of conductive paste (62) to the surface area of the light emitting element (20) is 0.5 to 2.0 [0076]. Therefore, a ratio of 2.0 or 2.0:0 of area of 62: area of 20 means that the surface area of the pad of conductive paste (62) is larger than the surface area of the light emitting element (20) i.e., the microelectronic device (20) have a smaller footprint than the pad if the conductive paste (62) when the ratio is 2.0 or any ratio above 1. Regarding claim 17, Noda teaches the method of claim 1, wherein the pad of conductive paste (62), after the laser-induced forward transfer (fig. 8) to the receiver substrate (30), has a thickness (fig. 9, T62 is 2-10µm, [0097]) in the range between 2 and 20 micrometers (Noda et al., [0097]). Regarding claim 18, Noda teaches the method of claim 1, wherein the conductive-paste layer (62) on the first donor substrate (50) has a thickness (2-10µm, [0076]) in the range between 5 and 25 micrometers (Noda et al., [0076]). Regarding claim 19, Noda teaches the method of claim 1, wherein the laser-induced forward transfer (fig. 9-10) in the step of transferring the microelectronic device (20) propels the microelectronic device (20) across a gap (D, fig. 9) of at least 50 micrometers (D is 10-100µm, [0097) (Noda et al, fig. 9, [0097]). Regarding claim 20, Noda teaches a mass transfer method, comprising: (fig. 8) [0090] repeatedly performing the step of transferring a pad (61, 62, fig. 8), of claim 1, to transfer a plurality of pads of conductive paste (61, 62) from the conductive-paste layer (60) on the first donor substrate (50) to an array of respective locations on the receiver substrate (20); and (fig. 9-10) [0094] repeatedly performing the step of transferring a microelectronic device (20, fig. 9) [0093], of claim 1, to transfer each of a plurality of microelectronic devices (20) from the second donor substrate (70) to a respective one of the pads of conductive paste (62) on the receiver substrate (30) (Noda et al., fig. 8-10). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 3 and 9-12 are rejected under 35 U.S.C. 103 as being unpatentable over Noda et al. US PGPub. 2024/0162405. Regarding claim 3, Noda teaches the method of claim 2, wherein the step (fig. 8) of transferring the pad (62) includes: arranging (aligning, [0090]) the first donor substrate such that (a) the conductive-paste layer (60) faces a receiving (top) surface of the receiver substrate (30) and using LIFT process [0078] to transfer a portion of the conductive-paste layer (60) from the first donor substrate (50) to the receiving surface (30) (Noda et al., fig. 8). But Noda fails to explicitly disclose wherein (b) a second gap exists between the conductive-paste layer (60) and the receiving surface (30); and directing a second laser beam through the first donor substrate (50) onto the conductive-paste layer (60), to release a portion of the conductive-paste layer (60) from the first donor substrate (50) and force the portion of the conductive-paste layer (60) across the gap onto the receiving surface to form the pad of conductive paste (61, 62, fig. 8-9) thereon. However, since Noda discloses that the same [0107] LIFT process [0078] is used for transferring the conductive-paste layer (60) to the receiver substrate (30) as the LIFT process [0098] used for transferring the microelectronic device (20) to the receiver substrate (30), then at the time before the effective filing of the claimed invention, it would have been obvious to one of ordinary skill in the art to use the same LIFT process because using the same LIFT process is well known in the art and such process/material/structure is/are art recognized and suitable for the intended purpose of shortening the tact time in the manufacturing process (Noda et al., [0107]) (see MPEP 2144.07). Therefore it would be obvious that (b) a second gap (similar to D in fig. 9) exists between the conductive-paste layer (60) and the receiving surface (30); and directing a second laser beam (similar to 80, fig. 9) through the first donor substrate (50) onto the conductive-paste layer (60), to release a portion of the conductive-paste layer (60) from the first donor substrate (50) and force the portion of the conductive-paste layer (60) across the gap onto the receiving surface to form the pad of conductive paste (61, 62, fig. 8-9) thereon. Regarding claim 9, Noda does not explicitly teach the method of claim 1, further comprising keeping a temperature of the pad of conductive paste (62) below a reflow temperature thereof between the transferring steps (fig. 8-9). However, since Noda discloses that no curing [0063] occurs during laser application and only occurs during thermocompression [0099], then at the time before the effective filing of the claimed invention, it would have been obvious to one of ordinary skill in the art that the temperature of the pad of conductive paste is kept below a reflow temperature between transferring steps because such process is well known in the art and such process is art recognized and suitable for the intended purpose of preventing the occurrence of defects, suppress detachment of the light emitting elements and provide transfer with high precision and shortened tact time (shortening the tact time in the manufacturing process (Noda et al., [0098]) (see MPEP 2144.07). Regarding claim 10, Noda teaches the method of claim 9, wherein the same laser apparatus [0107] is used to perform the laser-induced forward transfers of both transferring steps [0078], [0098] (Noda et al., [0107]). Regarding claim 11, Noda teaches the method of claim 10, the laser-induced forward transfers [0078], [0098] of each transferring step (fig. 8-9) being performed in a chamber (same apparatus, hence same chamber to reduce tact time) of the laser apparatus [0107], the method further comprising keeping the receiver substrate (30) in the chamber between the two transferring steps (fig. 8-10) (Noda et al., [0107]). Regarding claim 12, Noda does not explicitly teach the method of claim 1, further comprising keeping the pad of conductive paste (62) at a temperature below 100 degrees Celsius between the transferring steps (fig. 8-9). However, since Noda discloses that no curing [0063] occurs during laser application and only occurs during thermocompression [0099] which occurs at 150˚-260˚C [0099], then at the time before the effective filing of the claimed invention, it would have been obvious to one of ordinary skill in the art that the temperature of the pad of conductive paste is kept below 100˚C between transferring steps because such process is well known in the art and such process is art recognized and suitable for the intended purpose of preventing the occurrence of defects, suppress detachment of the light emitting elements and provide transfer with high precision and shortened tact time (shortening the tact time in the manufacturing process (Noda et al., [0098]) (see MPEP 2144.07). Claims 6-7 are rejected under 35 U.S.C. 103 as being unpatentable over Noda et al. US PGPub. 2024/0162405 as applied to claim 1 above, and further in view of Komatsu et al. US PGPub. 2020/0187803. Regarding claim 6, Noda teaches the method of claim 1, wherein the conductive paste (curable resin film, anisotropic conductive film, 62) [0069] includes metal particles [0069] but fails to teach that the conductive paste (62) includes metal particles [0069] and a solvent. However, Komatsu teaches a methods wherein the conductive paste [0140] includes metal particles [0140] and a solvent [0140] (Komatsu et al., [0140]). At the time before the effective filing of the claimed invention, it would have been obvious to one of ordinary skill in the art to make a simple substitution of the conductive paste of Noida for the conductive paste of Komatsu because conductive pastes with metal particles and a solvent are well known in the art and such material/structure is art recognized and suitable for the intended purpose of providing a stretchable conductor paste with excellent electrical conductivity (Komatsu et al., [0147]) (see MPEP 2144.07). Regarding claim 7, Noda in view of Komatsu teaches the method of claim 6, wherein the metal particles include silver [0141] (Komatsu et al., [0141]). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Mizuno et al. US PGPub. 2010/0258543 and Sterken et al. US PGPub. 2023/0290664 both teach a laser-induced forward transfer process with a gap between the LED and the receiving substate. Any inquiry concerning this communication or earlier communications from the examiner should be directed to NDUKA E OJEH whose telephone number is (571)270-0291. The examiner can normally be reached M-F; 9am - 5pm.. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, DREW N RICHARDS can be reached at (571) 272-1736. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /NDUKA E OJEH/Primary Examiner, Art Unit 2892
Read full office action

Prosecution Timeline

Nov 22, 2023
Application Filed
Feb 18, 2026
Non-Final Rejection — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
89%
Grant Probability
87%
With Interview (-2.3%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 769 resolved cases by this examiner. Grant probability derived from career allow rate.

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