Prosecution Insights
Last updated: July 17, 2026
Application No. 18/521,864

NANOMOLDING OF ELECTRICAL INTERCONNECTS

Non-Final OA §102
Filed
Nov 28, 2023
Priority
Nov 28, 2022 — provisional 63/428,280
Examiner
HO, ANTHONY
Art Unit
2817
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Cornell University
OA Round
1 (Non-Final)
91%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 91% — above average
91%
Career Allowance Rate
1043 granted / 1147 resolved
+22.9% vs TC avg
Minimal +2% lift
Without
With
+2.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
22 currently pending
Career history
1166
Total Applications
across all art units

Statute-Specific Performance

§101
1.9%
-38.1% vs TC avg
§103
51.8%
+11.8% vs TC avg
§102
23.1%
-16.9% vs TC avg
§112
10.7%
-29.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1147 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election of Group I, claims 1-18, in the reply filed on March 23, 2026 is acknowledged. Because applicant did not distinctly and specifically point out the supposed errors in the restriction requirement, the election has been treated as an election without traverse (MPEP § 818.01(a)). Accordingly, claims 19 and 20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on March 23, 2026. Information Disclosure Statement The information disclosure statement (IDS) submitted on December 2, 2024 is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1, 2, and 5 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by deVilliers et al (US Pub 2021/0104609). In re claim 1, deVilliers et al discloses a method for forming semiconductor interconnects, the method comprising: establishing a nanostructure in a substrate, wherein the nanostructure extends from a first semiconductor structure of the substrate to a second semiconductor structure of the substrate (i.e. 200); establishing an electrically conductive material on the substrate over the nanostructure to form a semiconductor assembly (i.e. 202); and performing a thermal process on the semiconductor assembly that causes the electrically conductive material to mold into the nanostructure established in the substrate to form an electrical interconnect that electrically connects the first semiconductor structure to the second semiconductor structure (i.e. 204 and 206; see at least paragraphs 0046-0047). In re claim 2, deVilliers et al discloses wherein the nanostructure comprises a trench formed in the substrate (i.e. see at least paragraph 0027; Example 5). In re claim 5, deVilliers et al discloses wherein establishing the nanostructure in the substrate comprises establishing the nanostructure in a silicon substrate, an oxide layer, or a dielectric layer (i.e. see at least paragraph 0023). Allowable Subject Matter Claims 3, 4, and 6-18 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ANTHONY HO whose telephone number is (571)270-1432. The examiner can normally be reached 9AM - 5PM, Monday-Friday. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Marlon Fletcher can be reached at 571-272-2063. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ANTHONY HO/Primary Examiner, Art Unit 2817
Read full office action

Prosecution Timeline

Nov 28, 2023
Application Filed
Mar 04, 2024
Response after Non-Final Action
May 29, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Patent 12685005
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2y 3m to grant Granted Jul 14, 2026
Patent 12672416
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Patent 12666801
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
91%
Grant Probability
93%
With Interview (+2.4%)
2y 3m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1147 resolved cases by this examiner. Grant probability derived from career allowance rate.

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