Prosecution Insights
Last updated: October 02, 2026
Application No. 18/522,409

DISPLAY DEVICE

Final Rejection §102§103
Filed
Nov 29, 2023
Priority
Dec 02, 2022 — RE 10-2022-0166356 +1 more
Examiner
RAHMAN, MOIN M
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
LG Display Co., Ltd.
OA Round
2 (Final)
87%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
658 granted / 756 resolved
+19.0% vs TC avg
Moderate +14% lift
Without
With
+14.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
43 currently pending
Career history
812
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
56.1%
+16.1% vs TC avg
§102
27.0%
-13.0% vs TC avg
§112
16.0%
-24.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 756 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Status of the application This office Action is in response to Applicant's Application filled on 08/07/2026. Claims 1-21 are pending for this examination. Response to Arguments Applicant's arguments filed on 08/07/2026 have been fully considered but they are not persuasive for at least the following reasons: Regarding claim 1: Applicant arguments: Applicants respectfully submit that Baek does not disclose “etch stop pattern disposed in the non-display area” and insulating layer 125 is merely an organic via layer, and layer 126 is a pixel defining layer (bank), neither of which serves as an etch stop layer for controlling substrate etching. The Examiner disagrees. PNG media_image1.png 564 492 media_image1.png Greyscale In response: Beak discloses “A fifth insulating layer 125 is located on the anti-reflection layer RL. The fifth insulating layer 125 covers the fourth conductive layer 160 and the anti-reflection layer RL. The fifth insulation layer 125 may be a via layer”, Para [ 0133]) and Para [ 0136] discloses “The bank 126 may include inorganic insulating materials such as silicon oxide, silicon nitride, silicon oxynitride, hafnium oxide, aluminum oxide, titanium oxide, tantalum oxide, and/or zinc oxide, or an organic insulating material such as polyacrylates resin, epoxy resin, phenolic resin, polyamides resin, polyimides resin, unsaturated polyesters resin, poly phenylenethers resin, polyphenylenesulfides resin, and/or benzocyclobutene (BCB). The bank 126 may be made up of a single layer or multiple layers of different materials stacked on one another”. Based on the insulating property layers [ 125, 126], Examiner interpreted as etch stop layer. In addition, applicant’s arguments “an etch stop layer for controlling substrate etching” is not required for claim limitation. Regarding claim 16: Applicant arguments: Applicants respectfully submit that Han does not disclose “sensing insulating layers 43 and 45 to the claimed first and second etch stop layers” and “Han's layers 43 and 45 are neither configured nor positioned to function as etch stop layers for controlling or stopping etching during a substrate etching process”. In addition, “providing etch stop layers adjacent to a substrate opening”. The Examiner disagrees. PNG media_image2.png 271 697 media_image2.png Greyscale Han discloses first etch stop layer (sensing layer 40 includes insulating layer 43, construed as first etch stop layer) on the substrate (Fig [1-2,8], substrate 10), the first etch stop layer (insulating layer 43, construed as first etch stop layer) adjacent to the opening (Fig [1-2], “opening area OA, Para [ 0075]); and a second etch stop layer (third insulating layer 45, Para [ 0104]) on the first etch stop layer (insulating layer 43, construed as first etch stop layer), Based on the insulating property layers [ 43,45], Examiner interpreted as etch stop layer. In addition, applicant’s arguments “an etch stop layer for controlling substrate etching” is not required for claim limitation. Thus, the well-made rejection included in the 05/07/2026 Non-Final Office Action is proper and hereby made FINAL. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-4 and 11 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Back et al (US 2022/0085123 A1; hereafter Back). PNG media_image1.png 564 492 media_image1.png Greyscale Regarding claim 1. Baek discloses a display device comprising: a substrate (Fig. [1-2, 6]) transistor areas TRAT: TRAT_R, construed as substrate, Para [ 0096]) including a display area (Fig. [1-2, 6], display area DPA_D, Para [ 0070-0073]), a light-transmitting area (Fig. [1-2, 6], transmission area DPA_T, Para [ 0070-0073]), and a non-display area (Fig. [1-2, 6], non-display area NDA, Para [ 0070-0073]) adjacent to the light-transmitting area (Fig. [1-2, 6], transmission area DPA_T, Para [ 0070-0073]); a circuit portion (Fig. [1-2, 6], pixel circuit may include transistors TR, Para [ 0107]) and a light-emitting element portion (emissive layer 190, Para [ 0137]) disposed in the display area (Fig. [1-2, 6], display area DPA, Para [ 0070-0073]); and an etch stop pattern (layers [125-126]) disposed in the non-display area (Fig. [1-2, 6], non-display area NDA, Para [ 0070-0073]), wherein the substrate (Fig. [1-2, 6]) transistor areas TRAT: TRAT_R, construed as substrate, Para [ 0096]) includes a first opening ( opening in the insulating layer 125, through hole CNT7T, Para [ 0148]) disposed at a position corresponding to the light-transmitting area (Fig. [1-2, 6], transmission area DPA_T, Para [ 0070-0073]), wherein the etch stop pattern (layers [125-126]) includes a first etch stop layer ( insulating layer 125, Para [ 0126]) adjacent to the first opening ( opening in the insulating layer 125, through hole CNT7T, Para [ 0148]) and a second etch stop layer ( layer 126, Para [ 0136]) disposed on the first etch stop layer ( insulating layer 125), and wherein the second etch stop layer (layer 126, Para [ 0136]) includes a protrusion extending further toward the light-transmitting area (Fig. [1-2, 6], transmission area DPA_T, Para [ 0070-0073]) than the first etch stop layer (opening in the insulating layer 125, through hole CNT7T, Para [ 0148]). Regarding claim 2. Baek discloses the display device of claim 1, Baek further discloses wherein the first etch stop layer (Para [0133] discloses “The fifth insulating layer 125 may include the same material as the fourth insulating layer 124, or may include one or more materials selected from the materials listed above as the materials of the fourth insulating layer 124. Para [ 0126] discloses “The fourth insulating layer 124 may include an organic insulating material such as polyacrylate resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyesters resin, poly phenylene ether resin, poly phenylene sulfide resin, and benzocyclobutene (BCB) and the second etch stop layer are made of different materials (Para [ 0136]). Regarding claim 3. Baek discloses the display device of claim 1, Baek further discloses wherein the first etch stop layer (insulating layer 125, Para [ 0126]) is thinner than the second etch stop layer (at least a portion of layer 126, Para [ 0136]). Regarding claim 4. Baek discloses the display device of claim 1, Baek further discloses wherein a side surface of the first opening protrudes (opening in the insulating layer 125, through hole CNT7T, Para [ 0148]) further toward the light-transmitting area (Fig. [1-2, 6], transmission area DPA_T, Para [ 0070-0073]) than the first etch stop layer (insulating layer 125, Para [ 0126]). Regarding claim 11. Baek discloses the display device of claim 1, Baek further discloses wherein a lower surface of the protrusion has a curvature (layer 126, Para [ 0136]). Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 16 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Han et al (US 2025/0355518 A1; hereafter Han). PNG media_image2.png 271 697 media_image2.png Greyscale Regarding claim 16. Han discloses a display device comprising: a substrate (Fig [1-2,8], substrate 10) having an opening, the substrate ( Fig [1-2], substrate 10) having thereon a display area ( display area DA), a light-transmitting area (“opening area OA may be understood as a transmission area”, Para [ 0075]), and a non-display area Non display area NDA), the opening (Fig [1-2],“opening area OA , Para [ 0075]) of the substrate ( Fig [1-2], substrate 10) overlapping the light-transmitting area from a plan view ( Fig [1-2],“opening area OA , Para [ 0075]); a first etch stop layer (sensing layer 40 includes insulating layer 43, construed as first etch stop layer) on the substrate (Fig [1-2,8], substrate 10), the first etch stop layer (insulating layer 43, construed as first etch stop layer) adjacent to the opening (Fig [1-2], “opening area OA, Para [ 0075]); and a second etch stop layer (third insulating layer 45, Para [ 0104]) on the first etch stop layer (insulating layer 43, construed as first etch stop layer), the second etch stop layer (third insulating layer 45, Para [ 0104]) having a first protrusion (bottom surface), wherein the first protrusion of the second etch stop layer (bottom surface of the insulating layer 45) does not overlap the first etch stop layer from a plan view (Fig [1-2,8], insulating layer 43, construed as first etch stop layer and bottom surface of the insulating layer 45, construed as protrusion portion, which has similar arrangement like instant application. Therefore, protrusion (bottom surface) of insulating film 45 can have no overlap with insulating layer 43 in plan view). Claim Rejection- 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 21 is rejected under 35 U.S.C. 103 as being unpatentable over Han et al (US 2025/0355518 A1; hereafter Han) as applied claims above and further in view of Kim et al (US 2023/0232669 A1; hereafter Kim). Regarding claim 21. Han discloses the display device of claim 16, But, Han does not disclose explicitly wherein the substrate includes a glass substrate. In a similar field of endeavor, Kim discloses wherein the substrate includes a glass substrate (Para [0074]). Therefore, it would have been obvious to one of the ordinary skilled in the art before the effective filing date of the invention to combine Han in light of Kim teaching “wherein the substrate includes a glass substrate (Para [0074])” for further advantage such as high transparency, and uniform optical properties. Allowable Subject Matter Claims 5 and 18-19 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is the Examiner's Reasons for Allowance: The prior art fails to disclose and would not have rendered obvious: Regarding claim 5. The display device of claim 1, wherein the first opening includes: a first opening area having a diameter that decreases toward the etch stop pattern; a second opening area having a diameter that increases toward the etch stop pattern; and a third opening area disposed between the first opening area and the second opening area, wherein the diameter of the second opening area is less than the diameter of the first opening area, and wherein a maximum diameter of the third opening area is less than a maximum diameter of the second opening area. Regarding claim 18. The display device of claim 16, wherein the opening of the substrate defines one or more side surfaces of the substrate, wherein the one or more side surfaces include a first side surface and a second side surface adjacent to the first side surface at a first side of the opening, wherein the one or more side surfaces include a third side surface and a fourth side surface adjacent to the third side surface at a second side of the opening that is opposite and facing the first side of the opening, wherein the first side surface is opposite to and facing the third side surface, wherein the second side surface is opposite to and facing the fourth side surface, wherein a first diameter of the opening is defined by a distance between the first side surface and third side surface, wherein a second diameter is defined by a distance between the second side surface and fourth side surface, and wherein the first diameter and the second diameter are different from each other. Claim 19 is objected based on the dependency of claim 18. Claims 12-15 are allowed. The following is the Examiner's Reasons for Allowance: The prior art fails to disclose and would not have rendered obvious: an etch stop pattern disposed in the non-display area, wherein the substrate includes a first opening disposed at a position corresponding to the light-transmitting area, wherein the substrate includes one surface on which the etch stop pattern is disposed and the other surface opposite to the one surface, wherein the first opening includes a first opening area connected to a lower surface of the substrate and having a diameter decreasing toward the etch stop pattern, and a second opening area connected to an upper surface of the substrate, and wherein a maximum diameter of the first opening area is greater than a maximum diameter of the second opening area, as recited in claim 12. Claims 13-15 are allowed based on the dependency of claim 12. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to MOIN M RAHMAN whose telephone number is (571)272-5002. The examiner can normally be reached 8:30-5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Julio Maldonado can be reached at 571-272-1864. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MOIN M RAHMAN/Primary Examiner, Art Unit 2898
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Prosecution Timeline

Nov 29, 2023
Application Filed
May 07, 2026
Non-Final Rejection mailed — §102, §103
Aug 07, 2026
Response Filed
Aug 20, 2026
Final Rejection mailed — §102, §103
Sep 14, 2026
Applicant Interview (Telephonic)
Sep 14, 2026
Examiner Interview Summary

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
87%
Grant Probability
99%
With Interview (+14.2%)
2y 5m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 756 resolved cases by this examiner. Grant probability derived from career allowance rate.

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